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31 条记录 (耗时 0.013 秒)

    Lamella creation method and device using fixed-angle beam and rotating sample stage
    3.
    发明公开
    Lamella creation method and device using fixed-angle beam and rotating sample stage 审中-公开
    板条利用角度稳定的支撑成形方法和装置以及旋转样品台

    公开(公告)号：EP2674742A2

    公开(公告)日：2013-12-18

    申请号：EP13171169.9

    申请日：2013-06-10

    申请人： FEI COMPANY

    发明人： Wells, Andrew ,  Parker, N. William ,  Chandler, Clive ,  Utlaut, Mark

    IPC分类号： G01N1/32

    CPC分类号： G01N1/32 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/31745

    摘要： A method and system for creating a substantially planar face in a substrate, the method including directing one or more beams at a first surface of a substrate to remove material from a first location in the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the first nonzero curtaining angle; and scanning the one or more beams in a pattern across the second surface to mill one or more finishing cuts in the substrate.

    摘要翻译： 一种用于在基片创建基本上平坦的面，所述方法包括在一衬底以从衬底的第一位置移除材料的第一表面引导一个或多个波束的方法和系统中，光束被从正常偏移到所述第一 表面由一个非零垂落角; 在一个平面席卷一个或多个波束并垂直于所述第一表面到磨机中的一个或更多衬底初始切口，初始切口暴露的第二表面所做的是基本上垂直于所述第一表面上; 通过围绕轴线上以外于轴线即垂直于第一光束或平行于所述第一光束非零旋转角度旋转所述基片; 在第二表面引导所述第一光束，以除去从基板附加材料，而不改变第一个非零垂落角; 并扫描一个或多个光束在穿过所述第二表面的图案，以磨中的一个或更多衬底精加工切削。

    Charged particle beam system aperture
    4.
    发明公开
    Charged particle beam system aperture 有权
    FOR PRODUCING限定面板A A METHOD光束聚焦的聚焦离子束的离子束梁和定义与这种PANEL

    公开(公告)号：EP2590203A2

    公开(公告)日：2013-05-08

    申请号：EP12191348.7

    申请日：2012-11-06

    申请人： FEI COMPANY

    发明人： Parker, William ,  Utlaut, Mark ,  Tuggle, David ,  Graham, Jeremy

    IPC分类号： H01J37/09

    CPC分类号： G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

    摘要： An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening (432) is made in a thin conductive film (420) positioned over a cavity (430) in a support substrate (410), where the aperture size and shape is determined by the opening in the conductive film and not determined by the cavity in the substrate.

    摘要翻译： 用于制造改进的射束定义孔结构和方法得以实现。 的孔开口（432）是在导电性薄膜（420）在支撑基底定位在腔（430）（410），其中所述孔的尺寸和形状是确定通过在导电膜中的开口所开采和不取决于由 在基片上的空腔中。

    INTEGRATED LIGHT OPTICS AND GAS DELIVERY IN A CHARGED PARTICLE LENS
    5.
    发明公开
    INTEGRATED LIGHT OPTICS AND GAS DELIVERY IN A CHARGED PARTICLE LENS 审中-公开
    加拿大富士康集团在伊朗LADUNGSTEILCHENLINSE集团

    公开(公告)号：EP3113207A1

    公开(公告)日：2017-01-04

    申请号：EP15174195.6

    申请日：2015-06-29

    申请人： FEI Company

    发明人： Parker, N. William ,  Straw, Marcus ,  Filevich, Jorge ,  Botman, Aurélien ,  Utlaut, Mark ,  Randolph, Steven ,  Chandler, Clive

    IPC分类号： H01J37/22

    CPC分类号： H01J37/228 ,  H01J2237/31744

    摘要： A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.

    摘要翻译： 一种用于将光或气体或两者引导到位于距带电粒子束柱的下端约2mm内的样本的方法和装置。 带电粒子束列组件包括限定样品保持位置的平台，并具有一组静电透镜，每组包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。

    FUNCTIONALIZED GRIDS FOR LOCATING AND IMAGING BIOLOGICAL SPECIMENS AND METHOD OF USING THE SAME
    7.
    发明公开
    FUNCTIONALIZED GRIDS FOR LOCATING AND IMAGING BIOLOGICAL SPECIMENS AND METHOD OF USING THE SAME 审中-公开
    功能化的GRID为使用隔离和生物样本成像及其方法

    公开(公告)号：EP2980223A2

    公开(公告)日：2016-02-03

    申请号：EP15178875.9

    申请日：2015-07-29

    申请人： FEI Company

    发明人： Utlaut, Mark ,  Parker, N. William

    IPC分类号： C12Q1/68 ,  H01J37/20 ,  G01N33/58

    CPC分类号： C12N15/1065 ,  B01J2219/00605 ,  B01J2219/00623 ,  B01J2219/00722 ,  C12Q1/6806 ,  H01J37/20 ,  H01J2237/2004 ,  H01J2237/2802

    摘要： A functionalized specimen support for use in charged particle microscopy is provided that includes a specimen support surface configured to support specimens (e.g. DNA strands 1051) during an interrogation of the specimens with a charged particle microscope, the specimen support surface having functionalized sites 1031, each functionalized site configured to maintain position of a portion of one of the specimens at the functionalized site by way of attachment, attraction, or a combination thereof.

    摘要翻译： 提供了一种用于在带电粒子显微镜使用的官能化的样品支持并包括被配置为与带电粒子显微镜试样的询问期间，支持样品（例如DNA链1051）的样品支承表面，试样支撑表面具有官能化位点1031，每个 官能化位点被配置成维持所述样本中的一个的一部分的位置处通过附着，吸附，或它们的组合的方式官能化的位点。

    Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer
    8.
    发明公开
    Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer 审中-公开
    方法和装置用于监测活性感应耦合等离子体离子源与光学光谱仪

    公开(公告)号：EP2642507A2

    公开(公告)日：2013-09-25

    申请号：EP13159842.7

    申请日：2013-03-19

    申请人： FEI COMPANY

    发明人： Utlaut, Mark ,  Kellogg, Sean ,  Parker, N. William ,  Graupera, Anthony ,  Zhang, Shouyin ,  Brundage, Philip ,  Kinion, Doug

    IPC分类号： H01J37/08 ,  H01J37/304 ,  H01J37/305

    CPC分类号： H01J37/08 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/022 ,  H01J2237/0225 ,  H01J2237/31749

    摘要： A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber (220). Preferred embodiments include a spectrometer (252) used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides end pointing means based on spectral analysis to determine when cleaning of the plasma source is completed.

    摘要翻译： 一种用于主动监控用于源的调整和控制等离子体源的条件，并检测在等离子体反应室（220）不想要的污染物种类的存在的方法和装置。 优选实施方案包括用于量化所述等离子体的部件的光谱仪（252）。 本发明提供一种系统控制器那样采用基于等离子体的光谱分析反馈回路以调节等离子体源的离子组合物。 因此，该系统提供基于频谱分析来确定矿在清洁等离子源的完成结束指示装置。