公开(公告)号：EP4430453A1

公开(公告)日：2024-09-18

申请号：EP22718208.6

申请日：2022-03-25

申请人： Brooks Automation (Germany) GmbH

发明人： REBSTOCK, Lutz ,  SCHWETZ, Michael Alexander

IPC分类号： G03F1/66 ,  G03F7/20 ,  H01L21/673

CPC分类号： G03F1/66 ,  G03F7/70741 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67393

公开(公告)号：EP4423571A1

公开(公告)日：2024-09-04

申请号：EP22888061.3

申请日：2022-10-25

申请人： Entegris, Inc.

发明人： RASCHKE, Russ V.

IPC分类号： G03F1/66 ,  G03F1/22 ,  H01L21/673

CPC分类号： G03F1/66

公开(公告)号：EP4356196A1

公开(公告)日：2024-04-24

申请号：EP22825815.8

申请日：2022-06-16

申请人： Entegris, Inc.

发明人： WANG, Huaping ,  KIRKLAND, Eric A. ,  RASCHKE, Russ V.

IPC分类号： G03F1/66 ,  G03F1/22 ,  H01L21/673

CPC分类号： H01L21/67359 ,  H01L21/67353 ,  H01L21/67366 ,  G03F1/66

公开(公告)号：EP4200669A1

公开(公告)日：2023-06-28

申请号：EP21865005.9

申请日：2021-09-01

申请人： KLA Corporation

发明人： SAFRANI, Avner ,  PAHIMA, Adi ,  RUDOI, Ron ,  MARK, Shai

IPC分类号： G03F1/84 ,  G03F1/66

公开(公告)号：EP3045973B1

公开(公告)日：2018-04-11

申请号：EP14844507.5

申请日：2014-07-24

申请人： Shin-Etsu Polymer Co. Ltd. ,  Shin-Etsu Chemical Co., Ltd.

发明人： SUZUKI, Tsutomu ,  OHORI, Shinichi ,  KOITABASHI, Ryuji ,  NAKAGAWA, Hideo ,  TAKASAKA, Takuro ,  KINOSHITA, Takahiro ,  FUKUDA, Hiroshi

IPC分类号： G03F1/66 ,  H01L21/673

CPC分类号： G03F1/66 ,  H01L21/67359 ,  H01L21/67393

摘要： The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40°C is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E + 13 ohms.

公开(公告)号：EP3254157A2

公开(公告)日：2017-12-13

申请号：EP16702142.7

申请日：2016-02-01

申请人： ASML Netherlands B.V.

发明人： BROUNS, Derk Servatius Gertruda ,  DE GRAAF, Dennis ,  DE KRUIF, Robertus Cornelis Martinus ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  NOTENBOOM, Arnoud Willem ,  SMITH, Daniel Andrew ,  VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien ,  WILEY, James Norman

IPC分类号： G03F1/00 ,  G03F1/62 ,  G03F1/84 ,  G03F1/66

CPC分类号： G03F1/62 ,  G03F1/66 ,  G03F1/84

摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

公开(公告)号：EP3018530A4

公开(公告)日：2017-01-25

申请号：EP14819677

申请日：2014-06-05

申请人： MURATA MACHINERY LTD

发明人： GAMBE MASAHIKO

IPC分类号： G03F1/66 ,  B65D85/86 ,  H01L21/027 ,  H01L21/673

CPC分类号： G03F1/66 ,  H01L21/67346 ,  H01L21/67359 ,  H01L21/67393

摘要： A storage container in which a uniform flow velocity of the purge gas can be achieved is provided. A storage container 1 is provided with a plurality of stages of storage units 5 each having an accommodating region S to accommodate an article and includes: a supply portion 10 configured to supply a purge gas; a duct portion 22 configured to communicate with one another throughout the plurality of storage units 5 and serve as a flow path for the purge gas supplied from the supply portion 10; and an introducing portion 24 configured to communicably connect the duct portion 22 with the accommodating region S and introduce the purge gas to the accommodating region S. In the flow path for the purge gas in the duct portion 22, a diffusion member 32 is arranged.

公开(公告)号：EP2453310A3

公开(公告)日：2014-09-17

申请号：EP12000081.5

申请日：2007-06-19

申请人： Entegris, Inc.

发明人： Kishkovich, Oleg ,  Gabarre, Xavier ,  Goodwin, William ,  Lo, James ,  Scoggins, Troy

IPC分类号： G03F7/20 ,  H01L21/673 ,  H01L21/687 ,  H01L21/67 ,  H01L21/677 ,  G03F1/66

CPC分类号： H01L21/67769 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70933 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67386 ,  H01L21/67389 ,  H01L21/67393 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing (54.1) having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter (54.8) when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be "recharged" during the substantially continual purging of the reticle, a reduced desireable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system (50,52). For example, the ionizer can be associated with at least one of the plurality of purge lines (54.9) of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves (80) that each include a plurality of reticle storage receptacles (58).

公开(公告)号：EP1535112A4

公开(公告)日：2008-01-16

申请号：EP03742205

申请日：2003-06-26

申请人： ENTEGRIS INC

发明人： WISEMAN BRIAN ,  STRIKE JUSTIN

IPC分类号： G03B21/62 ,  G03F1/66 ,  G03F7/20 ,  G03B27/62

CPC分类号： G03F7/70741 ,  G03B21/62 ,  G03F1/66 ,  G03F7/70983

摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

摘要翻译： 一种用于光刻半导体处理中的掩模版的载体，具有基部和覆盖部。 基座部分具有多个光罩支架和多个网格定位部件。 盖部适于密封地与基部配合，并且具有内表面，该内表面具有多个间隔开的掩模版约束装置和从其向内突出的一对掩模版定位片。 每个光罩定位翼片具有对角边缘部分，并且被定向为使得当罩盖部分与基部配合时，对角边缘部分促使搁置在光罩支架上的光罩与光罩约束件接合。

公开(公告)号：EP4457857A1

公开(公告)日：2024-11-06

申请号：EP22917344.8

申请日：2022-12-29

申请人： Entegris, Inc.

发明人： TIEBEN, Anthony Mathius ,  GLYNN, Philip Stuart ,  RASCHKE, Russ V.

IPC分类号： H01L21/673 ,  G03F1/66