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    Spin-coating apparatus and its temperature control method, as well as the optical disc manufacturing equipment and optical disc manufacturing method
    42.
    发明专利
    Spin-coating apparatus and its temperature control method, as well as the optical disc manufacturing equipment and optical disc manufacturing method 有权

    公开(公告)号：JP5262117B2

    公开(公告)日：2013-08-14

    申请号：JP2008002581

    申请日：2008-01-09

    Applicant: 株式会社リコー

    Inventor： 行利 田嶋

    IPC: G11B7/26 ,  G11B7/24

    CPC classification number: G11B7/266 ,  B05D1/005 ,  B05D3/0209 ,  B05D3/0254 ,  B05D3/067

    Abstract: The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes.

    Curable liquid and ink for toys and food packaging applications
    44.
    发明专利
    Curable liquid and ink for toys and food packaging applications 审中-公开

    公开(公告)号：JP2011502188A

    公开(公告)日：2011-01-20

    申请号：JP2010530405

    申请日：2008-10-16

    Applicant: アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ

    Inventor： クレ，ローラン ,  ロキユフイエ，ヨハン

    IPC: C09D11/00 ,  B41J2/01 ,  B41M5/00

    CPC classification number: C09D11/30 ,  B05D1/005 ,  B05D1/18 ,  B05D1/265 ,  B05D1/28 ,  B05D1/305 ,  B05D1/32 ,  B05D1/40 ,  B05D3/067 ,  C09D11/101 ,  C09D11/107 ,  C09D11/38 ,  Y10S522/904 ,  Y10S522/909

    Abstract: A free radical curable liquid for inkjet printing of food packaging materials comprising no initiator or otherwise one or more initiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric initiators, polymeric initiators and polymerizable initiators; wherein the polymerizable composition of said liquid consists essentially of: a) 25 - 100 wt% of one or more polymerizable compounds A having at least one acrylate group G1 and at least one second ethylenically unsaturated polymerizable functional group G2 different from the group G1; b) 0 - 55 wt% of one or more polymerizable compounds B selected from the group consisting of monofunctional acrylates and difunctional acrylates; and c) 0 - 55 wt% of one or more polymerizable compounds C selected from the group consisting of trifunctional acrylates, tetrafunctional acrylates, pentafunctional acrylates and hexafunctional acrylates, with the proviso that if the weight percentage of compounds B > 24 wt%, then the weight percentage of compounds C > 1 wt%; and wherein all weight percentages of A, B and C are based upon the total weight of the polymerizable composition; with the proviso that at least one polymerizable compound B or C is present in the polymerizable composition if the free radical curable liquid contains no initiator; wherein the polymerizable compound A has a copolymerization ratio of with r 1 and r 2 representing the copolymerization parameters of methyl-G1 respectively methyl-G2 determined according to the method of Kelen-Tudos.

    Coating treatment method, coating treatment apparatus, and computer readable storage medium
    47.
    发明专利
    Coating treatment method, coating treatment apparatus, and computer readable storage medium 有权
    涂层处理方法，涂层处理装置和计算机可读存储介质

    公开(公告)号：JP2010153907A

    公开(公告)日：2010-07-08

    申请号：JP2010053546

    申请日：2010-03-10

    Applicant: Tokyo Electron Ltd ,  東京エレクトロン株式会社

    Inventor： YOSHIHARA KOSUKE ,  IZEKI TOSHIHIRO ,  TAKAYANAGI KOJI

    IPC: H01L21/027 ,  B05C11/08 ,  B05D1/40

    CPC classification number: H01L21/02104 ,  B05D1/005 ,  G03F7/162 ,  H01L21/02282 ,  H01L21/6715

    Abstract: PROBLEM TO BE SOLVED: To uniformly apply a resist solution within a wafer surface while suppressing the supply amount of the resist liquid to a small amount.
    SOLUTION: A coating treatment method for a substrate includes, in order: a coating step S3-1 of rotating a wafer at low speed and in this state, discharging a resist solution from a first nozzle to the central portion of the wafer; a step S3-2 of rotating the wafer at high speed to apply the resist solution onto the wafer; a flattening step S4 of rotating the wafer at a low speed by decelerating the rotation of the wafer to flatten the resist solution on the wafer, wherein discharge of the resist solution by the first nozzle in the coating step S3-2 is continued till the middle of the flattening step S4 and the first nozzle is moved to shift the discharge position of the resist solution from the central portion of the wafer when the discharge of the resist solution is terminated in the flattening step S4; and a drying step S5 of accelerating the rotation of the wafer to dry the resist solution on the wafer.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：在将抗蚀剂液体的供给量抑制在少量的同时，将抗蚀剂溶液均匀地涂布在晶片表面内。 解决方案：基板的涂布处理方法依次包括：以低速旋转晶片的涂布步骤S3-1，在该状态下将抗蚀剂溶液从第一喷嘴排出到晶片的中心部分 ; 高速旋转晶片的步骤S3-2，将抗蚀剂溶液涂布在晶片上; 通过减速晶片的旋转使晶片上的抗蚀剂溶液平坦化而使晶片以低速旋转的平坦化步骤S4，其中在涂覆步骤S3-2中由第一喷嘴排出的抗蚀剂溶液继续直至中间 在平坦化步骤S4中，当抗蚀剂溶液的排出终止时，使平坦化步骤S4和第一喷嘴移动，从而从晶片的中心部移动抗蚀剂溶液的排出位置; 以及干燥步骤S5，其加速晶片的旋转以将抗蚀剂溶液干燥在晶片上。 版权所有（C）2010，JPO＆INPIT

    Coating treatment method, program, computer storage medium, and coating treatment apparatus
    49.
    发明专利
    Coating treatment method, program, computer storage medium, and coating treatment apparatus 有权
    涂层处理方法，程序，计算机存储介质和涂层处理设备

    公开(公告)号：JP2009207984A

    公开(公告)日：2009-09-17

    申请号：JP2008052881

    申请日：2008-03-04

    Applicant: Tokyo Electron Ltd ,  東京エレクトロン株式会社

    Inventor： YAMASHITA MITSUO ,  IZEKI TOSHIHIRO

    IPC: B05D1/40 ,  B05C11/08 ,  B05C11/10 ,  H01L21/027

    CPC classification number: H01L21/6715 ,  B05D1/005 ,  H01L21/67051

    Abstract: PROBLEM TO BE SOLVED: To decrease the supply amount of a coating solution while evenly applying the coating solution in a substrate plane.
    SOLUTION: A wafer is rotated at a first rotating speed and pure water is supplied to the center part of the wafer in a manner that the pure water does not diffuse on the wafer (step S1). The rotation of the wafer is accelerated to a second rotating speed and the coating solution is supplied to the center part of the pure water on the wafer to form a mixed layer of the coating solution and pure water under the layer of the coating solution (step S2). The rotation of the wafer is accelerated to a third rotating speed and the coating solution is diffused on the entire surface of the wafer (step S3). The rotation of the wafer is decelerated to a fourth rotating speed to adjust the thickness of the coating solution on the wafer (step S4). The rotation of the wafer is accelerated to a fifth rotating speed to dry the coating solution on the wafer (step S5).
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：在将涂布溶液均匀地施加到基板平面中的同时，减少涂布溶液的供给量。 解决方案：晶片以第一旋转速度旋转，纯水以纯水不在晶片上扩散的方式供应到晶片的中心部分（步骤S1）。 将晶片的旋转加速至第二转速，并将涂布液供给到晶片上的纯水的中心部分，以在涂层溶液层之下形成涂布溶液和纯水的混合层（步骤 S2）。 将晶片的旋转加速到第三转速，并将涂布液扩散到晶片的整个表面上（步骤S3）。 将晶片的旋转减速至第四转速，以调节晶片上的涂布液的厚度（步骤S4）。 将晶片的旋转加速至第五转速以干燥晶片上的涂布溶液（步骤S5）。 版权所有（C）2009，JPO＆INPIT

    Spin coater, temperature controlling method of same, optical disc production apparatus, and optical disc production method
    50.
    发明专利
    Spin coater, temperature controlling method of same, optical disc production apparatus, and optical disc production method 有权
    旋转涂布机，温度控制方法，光盘生产设备和光盘生产方法

    公开(公告)号：JP2008282513A

    公开(公告)日：2008-11-20

    申请号：JP2008002581

    申请日：2008-01-09

    Applicant: Ricoh Co Ltd ,  株式会社リコー

    Inventor： TAJIMA YUKITOSHI

    IPC: G11B7/26 ,  G11B7/24

    CPC classification number: G11B7/266 ,  B05D1/005 ,  B05D3/0209 ,  B05D3/0254 ,  B05D3/067

    Abstract: PROBLEM TO BE SOLVED: To provide a spin coater that is capable of stabilizing the temperature of an ultraviolet-curable resin composition upon spreading in each spin coating process in a short time, and of spreading the ultraviolet-curable resin composition over the surface of a disc substrate in a uniform thickness over multiple spin coating processes without performing large numbers of unproductive spin coating processes and to provide a temperature controlling method of the spin coater. SOLUTION: The spin coater includes a rotation table, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dropping unit, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup so as to be constant over multiple spin coating processes while the temperature is increased by the heating unit each time the ultraviolet-curable resin composition is spread. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种旋涂机，其能够在短时间内在各旋涂工序中扩展时稳定紫外线固化性树脂组合物的温度，并且将紫外线固化型树脂组合物涂布在 在不进行大量非生产性旋涂工艺的情况下，以均匀的厚度在多个旋涂工艺中的盘基片的表面，并提供旋转涂布机的温度控制方法。 旋转涂布机包括旋转台，围绕保持在旋转台上的盘基板的外周的旋转杯，下落单元，旋转单元，其经由旋转台将盘基板旋转到 将紫外线固化树脂组合物涂覆在盘基片的表面上，加热单元，其被配置为加热盘基片上的紫外线固化树脂组合物，以及温度控制单元，其配置为控制旋转杯的到达温度，以便 每次紫外线固化树脂组合物扩散时，通过加热单元增加温度，在多次旋涂工序中保持恒定。 版权所有（C）2009，JPO＆INPIT

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