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    Conductive film and electrode
    53.
    发明专利
    Conductive film and electrode 有权
    导电膜和电极

    公开(公告)号：JP2013249546A

    公开(公告)日：2013-12-12

    申请号：JP2013182676

    申请日：2013-09-04

    申请人： Semiconductor Energy Lab Co Ltd ,  株式会社半導体エネルギー研究所

    发明人： SAKATA JUNICHIRO ,  MARUYAMA YOSHIKI ,  IMOTO YUKI ,  ASANO YUJI ,  HIZUKA JUNICHI

    IPC分类号： C23C14/06 ,  H01L21/28

    CPC分类号： C23C14/5846 ,  C04B35/58 ,  C04B2235/3284 ,  C04B2235/3286 ,  C23C14/0057 ,  C23C14/0676 ,  H01L27/1225 ,  H01L27/124 ,  H01L29/7869

    摘要： PROBLEM TO BE SOLVED: To provide a light-transmitting conductive oxynitride which is not crystallized even if subjected to heat treatment and a method for manufacturing the light-transmitting conductive oxynitride, in order to solve such a problem that an electrode formed of a transparent conductive oxide is likely to be crystallized by heat treatment applied in the manufacturing process of a semiconductor device, a short circuit is likely to occur in a thin film element using an electrode having a significantly uneven surface due to crystallization, and thus reliability of the element is degraded.SOLUTION: An oxynitride including indium, gallium, and zinc, to which hydrogen atoms are added as impurities, is a light-transmitting conductive film which is not crystallized even if heated at 350°C.

    摘要翻译： 要解决的问题：为了提供即使经受热处理也不结晶的透光导电氮氧化物以及制造透光性导电氮氧化物的方法，为了解决由透明导电性物质形成的电极 氧化物可能通过在半导体器件的制造工艺中应用的热处理而结晶，在使用由于结晶而具有显着不平坦表面的电极的薄膜元件中容易发生短路，因此元件的可靠性为 降解。解决方案：作为杂质加入氢原子的包括铟，镓和锌的氧氮化物是即使在350℃下加热也不会结晶的透光导电膜。

    In-line film forming apparatus and method for manufacturing magnetic recording medium
    57.
    发明专利
    In-line film forming apparatus and method for manufacturing magnetic recording medium 审中-公开
    在线成膜装置和制造磁记录介质的方法

    公开(公告)号：JP2010020841A

    公开(公告)日：2010-01-28

    申请号：JP2008180494

    申请日：2008-07-10

    申请人： Showa Denko Kk ,  昭和電工株式会社

    发明人： FUKUSHIMA MASATO ,  SAKAWAKI AKIRA ,  SHIGERU TOMOO

    IPC分类号： G11B5/851 ,  C23C16/26

    CPC分类号： G11B5/855 ,  C03C10/00 ,  C03C17/002 ,  C03C2218/34 ,  C23C14/0688 ,  C23C14/568 ,  C23C14/5826 ,  C23C14/5846 ,  C23C14/5873

    摘要： PROBLEM TO BE SOLVED: To provide an in-line film forming apparatus wherein processing irregularity is prevented from being caused when reactive plasma processing or ion radiation processing is applied to a substrate held on a carrier.
    SOLUTION: A carrier 25 includes a holder 28 provided with a hole part 29 with the substrate arranged on the inner side thereof and a plurality of supporting members 30 attached to the peripheral part of the hole part 29 of the holder 28 so as to be elastically deformed, wherein the substrate inserted in the inner side of the supporting members 30 is freely attachably and detachably held while an outer peripheral part of the substrate is abutted on the plurality of supporting members 30. In a chamber performing reactive plasma processing or ion radiation processing to the substrate held on the carrier 25, ring members 32 having aperture parts 32a in a position corresponding to the substrate are disposed oppositely to at least one surface or both surfaces of the substrate held on the carrier 25 and a negative potential is applied to the ring members 32 and the holder 28 is grounded.
    COPYRIGHT: (C)2010,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种在线成膜装置，其中当对保持在载体上的基板施加反应等离子体处理或离子辐射处理时，防止其产生处理不规则。 解决方案：载体25包括保持器28，该保持器28设置有孔部分29，基底布置在其内侧，多个支撑构件30附接到保持器28的孔部分29的周边部分，以便 弹性变形，其中插入在支撑构件30的内侧中的基板在基板的外周部分抵靠在多个支撑构件30上时可自由地安装和可拆卸地保持。在执行反应等离子体处理的室中 对保持在载体25上的基板进行离子辐射处理，具有与基板对应的位置的开口部32a的环状部件32与保持在载体25上的基板的至少一个面或两个表面相对配置，负电位为 施加到环构件32并且保持器28接地。 版权所有（C）2010，JPO＆INPIT

    Processing method for bond coat having low deposited aluminum level and gas turbine engine component part
    60.
    发明专利
    Processing method for bond coat having low deposited aluminum level and gas turbine engine component part 有权
    具有低沉积铝水平和燃气涡轮发动机部件的粘结层的加工方法

    公开(公告)号：JP2007154314A

    公开(公告)日：2007-06-21

    申请号：JP2006328055

    申请日：2006-12-05

    申请人： General Electric Co ,  ゼネラル・エレクトリック・カンパニイGeneral Electric Company

    发明人： GORMAN MARK D ,  BOUTWELL BRETT A ,  ZIMMERMAN ROBERT GEORGE JR

    IPC分类号： C23C28/02 ,  C23C10/08 ,  C23C14/14 ,  F01D5/28 ,  F02C7/00

    CPC分类号： C23C14/16 ,  C23C10/02 ,  C23C10/08 ,  C23C14/5806 ,  C23C14/5846 ,  C23C30/00 ,  Y10T428/12764 ,  Y10T428/12944

    摘要： PROBLEM TO BE SOLVED: To provide a method for applying a NiAl based bond coat and a diffusion aluminide coating to a metal substrate. SOLUTION: This method contains a step for preparing a super alloy substrate having an external surface (38) and a step (140) for optionally and selectively cleaning the external surface (38) of the super alloy substrate. Further, this method contains a step for forming the coated external surface portion by coating (160) with the NiAl based alloy layer, on a part of the external surface of the super alloy substrate, in which the deposited NiAl based alloy is controlled so that the aluminum having about 6-25 wt.% controlled quantity is contained and further, the deposited aluminum level in this NiAl based alloy is about 50-100% of the aluminum finished level after aluminizing treatment, and thereafter, a step (180) for simultaneously aluminizing the coated external portion and a different surface on the super alloy substrate. COPYRIGHT: (C)2007,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种将NiAl基结合涂层和扩散铝化物涂层施加到金属基底上的方法。 解决方案：该方法包括用于制备具有外表面（38）和用于可选地和选择性地清洁超级合金基底的外表面（38）的步骤（140）的超级合金基底的步骤。 此外，该方法包括通过在NiAl基合金层的外表面上涂覆（160）上形成涂覆的外表面部分的步骤，在超合金基体的外表面上，其中控制沉积的NiAl基合金，使得 含有约6-25重量％的控制量的铝，此外，该NiAl基合金中的沉积铝含量为镀铝处理后的铝成品水平的约50-100％，之后为 同时将涂覆的外部部分和超合金基板上的不同表面进行镀铝。 版权所有（C）2007，JPO＆INPIT