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公开(公告)号：US12287583B2
公开(公告)日：2025-04-29
申请号：US18001869
申请日：2021-05-18
Applicant: ASML Netherlands B.V.
Inventor： Edo Maria Hulsebos
Abstract: Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining measurement data relating to a first layout; modeling a second model based on said first layout; evaluating the second model on a second layout, the second layout being more dense than said first layout; and fitting a first model to this second model according to the second layout.
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公开(公告)号：US12278081B2
公开(公告)日：2025-04-15
申请号：US17598841
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： Qingpo Xi , Xuerang Hu , Xuedong Liu , Weiming Ren , Zhong-Wei Chen
IPC: H01J37/05 , H01J37/147
Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
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公开(公告)号：US12271114B2
公开(公告)日：2025-04-08
申请号：US17441729
申请日：2020-03-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson Middlebrooks , Adrianus Cornelis Matheus Koopman , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco , Stefan Hunsche
Abstract: A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.
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公开(公告)号：US20250112023A1
公开(公告)日：2025-04-03
申请号：US18829217
申请日：2024-09-09
Applicant: ASML Netherlands B.V.
Inventor： Weiming REN , Shuai LI , Xuedong LIU , Zhongwei CHEN
IPC: H01J37/28 , H01J37/12 , H01J37/147
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号：US20250103855A1
公开(公告)日：2025-03-27
申请号：US18723265
申请日：2022-12-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Wenjie JIN
IPC: G06N3/045 , G03F7/00 , G06N3/044 , G06N3/0464 , G06N3/0499 , G06N3/092
Abstract: A method of generating control actions for controlling a production system, such as by transmitting the control actions to a control system of the production system. The method includes receiving, by a memory unit, a set of observation data characterizing a current state of the production system; processing, by a first neural network module of the memory unit, an input based on at least part of the observation data to generate encoded observation data; updating, by a second neural network module of the memory unit, history information stored in an internal memory of the second module using an input based on at least part of the observation data; obtaining, based on the encoded observation data and the updated history information, state data; and generating, based on the state data, one or more control actions.
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Patent Agency Ranking
公开(公告)号：US20250102902A1
公开(公告)日：2025-03-27
申请号：US18727598
申请日：2023-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Tim Willem Johan VAN DE GOOR , Ernst GALUTSCHEK , Andrei Mikhailovich YAKUNIN , Paul JANSEN , Abraham Jan WOLF , Paul Alexander VERMEULEN , Zomer Silvester HOUWELING , Lucas Christiaan Johan HEIJMANS , Andrey NIKIPELOV
Abstract: An assembly for a lithographic apparatus, wherein the assembly is configured to heat a pellicle membrane by one of or a combination selected from: i) provision of heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm. Also a method of extending the operative lifespan of a pellicle membrane, the method including heating at least a portion of a pellicle membrane when illuminated by EUV by one of or a combination selected from: i) providing heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating to effect heating of the at least one portion of the pellicle membrane, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm.
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公开(公告)号：US12259664B2
公开(公告)日：2025-03-25
申请号：US17640899
申请日：2020-08-17
Applicant: ASML NETHERLANDS B.V.
IPC: H01L23/544 , G03F9/00
Abstract: A method of configuring a mark having a trench to be etched into a substrate, the method including: obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench of a probationary depth and a thickness of the probationary layer; determining an extent of height variation across the surface of a layer deposited on the mark allowing a metrology system to determine a position of the mark; and configuring the mark by determining a depth of the trench based on the relation, the extent of height variation and the thickness of a process layer to be deposited on the mark.
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公开(公告)号：US12259546B2
公开(公告)日：2025-03-25
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre Halbach , Nitesh Pandey , Sebastianus Adrianus Goorden , Veronique Rochus , Luc Roger Simonne Haspeslagh , Guilherme Brondani Torri
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US12247883B2
公开(公告)日：2025-03-11
申请号：US18048119
申请日：2022-10-20
Applicant: ASML Netherlands B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Suzanne Johanna Antonetta Geertruda Cosijns , Koen Govert Olivier Van De Meerakker , Ivo Widdershoven
IPC: G01J9/02 , G01B9/02001 , G01B9/02002 , G01B9/02015 , G01B11/00 , G03F7/00
Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
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公开(公告)号：US12245350B2
公开(公告)日：2025-03-04
申请号：US18075589
申请日：2022-12-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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