Small lot size lithography bays
    5.
    发明授权
    Small lot size lithography bays 有权
    小批量尺寸光刻托架

    公开(公告)号:US07778721B2

    公开(公告)日:2010-08-17

    申请号:US11148956

    申请日:2005-06-09

    IPC分类号: G06F19/00

    摘要: In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate carrier is adapted to hold fewer than 13 substrates. Numerous other aspects are provided.

    摘要翻译: 在第一方面,提供了小批量尺寸的光刻托架。 小尺寸光刻托架包括(1)多个光刻工具; 和(2)适用于将小批量尺寸基板载体运送到光刻工具的小批量输送系统。 每个小批量尺寸的衬底载体适于容纳少于13个衬底。 提供了许多其他方面。