公开(公告)号：US08580353B2

公开(公告)日：2013-11-12

申请号：US12832738

申请日：2010-07-08

Applicant: Chien-Min Weng ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang

Inventor： Chien-Min Weng ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang

IPC: H05H1/00 ,  C23C14/02

CPC classification number: C03C17/23 ,  C03C23/0075 ,  C03C2218/31

Abstract: A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.

Abstract translation: 根据本发明的用于处理玻璃基板的表面的方法具有以下步骤：将玻璃基板放置在真空处理室中，将气体引入真空处理室，提供电力以产生离子源并使用离子源 以处理玻璃基板的表面。 这样，本发明可以实现表面清洁的效果，并且在随后的阶段中进一步使导电膜涂覆在玻璃基板上，从而具有降低的表面电阻，从而提高玻璃基板的导电性。 在后续阶段涂覆在玻璃基板上的薄膜也将具有更高的晶体水平。

公开(公告)号：US20120247953A1

公开(公告)日：2012-10-04

申请号：US13073337

申请日：2011-03-28

Applicant: CHIEN-MIN WENG ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang ,  Feng-Shiang Yao

Inventor： CHIEN-MIN WENG ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang ,  Feng-Shiang Yao

IPC: C23C16/52 ,  C23C14/34 ,  C23C16/02 ,  C23C16/455 ,  B05C11/00 ,  B05C13/00

CPC classification number: C23C14/022 ,  C23C14/54 ,  C23C14/562

Abstract: The invention relates to a film coating system. The system includes serially arranged working zones including a rough vacuum feeding section, a high vacuum feeding section, an optical layer coating zone, a pretreatment zone, a transparent conductive layer coating zone and a pressure balanced exhausting zone. The system further includes a conveyor device for carrying a substrate which has been provided on its periphery with an ink frame layer and for delivering the substrate to the respective working zones, and a controlling device that controls the times for the substrate to be retained in the respective working zones based upon a time interval between the entry of two successive conveyor devices into the rough vacuum feeding section. The invention ensures a smooth operation of the production line, and the transparent conductive film coated thereby does not easily exfoliate and exhibits the advantageous properties of high optical performance and low surface resistance.

Abstract translation: 本发明涉及一种薄膜包衣系统。 该系统包括串联布置的工作区，包括粗抽真空部分，高真空供给部分，光层涂层区，预处理区，透明导电层涂层区和压力平衡排气区。 该系统还包括用于承载已经在其周边上设置有油墨框架层并用于将基板输送到各个工作区域的基板的输送装置，以及控制装置，其将基板的时间保持在 基于两个连续输送装置进入粗真空供给部分之间的时间间隔的相应工作区。 本发明确保生产线的平稳运行，并且由此涂覆的透明导电膜不易剥离，并且具有高光学性能和低表面电阻的有利特性。

公开(公告)号：US08245535B2

公开(公告)日：2012-08-21

申请号：US12575471

申请日：2009-10-08

Applicant: Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  Fu-Jen Wang ,  Shih-Liang Chou ,  I-Wen Lee ,  Ching-Hsiu Cheng

Inventor： Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  Fu-Jen Wang ,  Shih-Liang Chou ,  I-Wen Lee ,  Ching-Hsiu Cheng

IPC: C03C15/00 ,  C03C21/00

CPC classification number: C03C23/006 ,  C03C21/002

Abstract: A method of strengthening glass plate is provided. A plasma treating process is performed on a glass plate so that a surface pore variation of the glass plate after the plasma treating process is reduced relative to the surface pore variation of the glass plate before the plasma treating process, wherein the surface pore variation is a variation degree of surface pores in different unit areas of the glass plate. In the mean time, a melted network crosslinking structure is formed on the surface of the glass plate. Based on the above-mentioned mechanisms, the glass plate is strengthened. The plasma treating process is conducive to strengthen the glass plate whether the plasma treating process is performed before or after the conventional chemical strengthening process.

Abstract translation: 提供一种强化玻璃板的方法。 在玻璃板上进行等离子体处理，使等离子体处理后的玻璃板的表面孔隙变化相对于等离子体处理工序前的玻璃板的表面孔隙变化量减小，其中表面孔隙变化为 玻璃板不同单位面积的表面孔隙变化程度。 同时，在玻璃板的表面上形成熔融的网状交联结构。 基于上述机理，玻璃板被加强。 等离子体处理方法有利于加强玻璃板，无论是否在常规化学强化过程之前或之后进行等离子体处理工艺。

公开(公告)号：US20110056244A1

公开(公告)日：2011-03-10

申请号：US12575471

申请日：2009-10-08

Applicant: Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  Fu-Jen Wang ,  Shih-Liang Chou ,  I-Wen Lee ,  Ching-Hsiu Cheng

Inventor： Chien-Min Weng ,  Tzu-Wen Chu ,  Chiao-Ning Huang ,  Fu-Jen Wang ,  Shih-Liang Chou ,  I-Wen Lee ,  Ching-Hsiu Cheng

IPC: C03C21/00 ,  C03C23/00

CPC classification number: C03C23/006 ,  C03C21/002

Abstract: A method of strengthening glass plate is provided. A plasma treating process is performed on a glass plate so that a surface pore variation of the glass plate after the plasma treating process is reduced relative to the surface pore variation of the glass plate before the plasma treating process, wherein the surface pore variation is a variation degree of surface pores in different unit areas of the glass plate. In the mean time, a melted network crosslinking structure is formed on the surface of the glass plate. Based on the above-mentioned mechanisms, the glass plate is strengthened. The plasma treating process is conducive to strengthen the glass plate whether the plasma treating process is performed before or after the conventional chemical strengthening process.

Abstract translation: 提供一种强化玻璃板的方法。 在玻璃板上进行等离子体处理，使等离子体处理后的玻璃板的表面孔隙变化相对于等离子体处理前的玻璃板的表面孔隙变化量减小，其中表面孔隙变化为 玻璃板不同单位面积的表面孔隙变化程度。 同时，在玻璃板的表面上形成熔融的网状交联结构。 基于上述机理，玻璃板被加强。 等离子体处理方法有利于加强玻璃板，无论是否在常规化学强化过程之前或之后进行等离子体处理工艺。

公开(公告)号：US20120213949A1

公开(公告)日：2012-08-23

申请号：US13030223

申请日：2011-02-18

Applicant: CHIEN-MIN WENG ,  SHIH-LIANG CHOU ,  TZU-WEN CHU ,  FU-JEN WANG ,  FENG-SHIANG YAO

Inventor： CHIEN-MIN WENG ,  SHIH-LIANG CHOU ,  TZU-WEN CHU ,  FU-JEN WANG ,  FENG-SHIANG YAO

IPC: H05H1/24

CPC classification number: C23C14/086 ,  C23C14/0036 ,  C23C14/5806

Abstract: The invention relates to a method for producing a transparent indium tin oxide conductive layer on a substrate. The method involves using a target having a low indium-to-tin ratio in a low temperature manufacturing process (less than 200° C.), and introducing a plasma gas and a reaction gas into the reaction chamber to allow sputtering of an indium tin oxide layer on the substrate under a low oxygen environment, followed by subjecting the sputtered substrate to a heat treatment at 150˜200° C. for 60˜90 minutes. The indium tin oxide layer thus produced will crystallize completely and have the advantageous properties of low surface resistance and high uniformity.

Abstract translation: 本发明涉及在基板上制造透明铟锡氧化物导电层的方法。 该方法包括在低温制造工艺（小于200℃）中使用具有低铟 - 锡比的靶，并将等离子体气体和反应气体引入反应室以允许溅射铟锡 在低氧环境下在基板上形成氧化物层，接着在150〜200℃下对溅射基板进行60〜90分钟的热处理。 由此制造的氧化铟锡层将完全结晶，具有低表面电阻和高均匀性的有利特性。

公开(公告)号：US20120009354A1

公开(公告)日：2012-01-12

申请号：US12832738

申请日：2010-07-08

Applicant: CHIEN-MIN WENG ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang

Inventor： CHIEN-MIN WENG ,  Shih-Liang Chou ,  Tzu-Wen Chu ,  Fu-Jen Wang

IPC: C03C17/23 ,  B08B7/00 ,  C03C17/00 ,  C03C15/00 ,  B05D3/10 ,  B05D5/12

CPC classification number: C03C17/23 ,  C03C23/0075 ,  C03C2218/31

Abstract: A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.

Abstract translation: 根据本发明的用于处理玻璃基板的表面的方法具有以下步骤：将玻璃基板放置在真空处理室中，将气体引入真空处理室，提供电力以产生离子源并使用离子源 以处理玻璃基板的表面。 这样，本发明可以实现表面清洁的效果，并且在随后的阶段中进一步使导电膜涂覆在玻璃基板上，从而具有降低的表面电阻，从而提高玻璃基板的导电性。 在后续阶段涂覆在玻璃基板上的薄膜也将具有更高的晶体水平。

公开(公告)号：US20110234507A1

公开(公告)日：2011-09-29

申请号：US12847327

申请日：2010-07-30

Applicant: SHIH-LIANG CHOU ,  HSUEH-CHIH CHIANG ,  CHIEN-MIN WENG ,  TZU-WEN CHU ,  FU-JEN WANG ,  I-WEN LEE ,  HSING-YEH CHEN

Inventor： SHIH-LIANG CHOU ,  HSUEH-CHIH CHIANG ,  CHIEN-MIN WENG ,  TZU-WEN CHU ,  FU-JEN WANG ,  I-WEN LEE ,  HSING-YEH CHEN

IPC: G06F3/041 ,  C23C14/34

CPC classification number: G06F3/044 ,  G06F2203/04103

Abstract: The present invention provides an integrated touch panel comprising a transparent substrate, one of an icon or artwork layer, a first layer of optical film, and a first sensing layer. The icon layer or artwork layer is coated on the periphery of one side face of the transparent substrate, and the inner periphery of the icon layer or artwork layer is not perpendicular to the adjacent line of the transparent substrate. The first layer of optical film is stacked on icon layer or artwork layer and the areas on the transparent substrate uncovered with icon layer. The first sensing layer is stacked on the first layer of optical film by sputtering. The interchangeability is included in the patent claim of the present invention. As icon layer or artwork layer is not perpendicular to the transparent substrate, the subsequent cladding of the structures may be completed by sputtering or other methods.

Abstract translation: 本发明提供了一种集成触摸面板，其包括透明基板，图标或图案层之一，第一层光学膜和第一感测层。 图标层或艺术品层涂覆在透明基板的一个侧面的周边上，图标层或艺术品层的内周不垂直于透明基板的相邻线。 第一层光学膜层叠在图标层或艺术品层上，透明基板上的区域被图标层覆盖。 第一感测层通过溅射堆叠在第一层光学膜上。 互换性包括在本发明的专利权利要求中。 由于图标层或艺术品层不垂直于透明基底，因此可以通过溅射或其它方法来完成随后的结构包层。