Display device, display control method, program, and computer readable recording medium
    2.
    发明授权
    Display device, display control method, program, and computer readable recording medium 有权
    显示装置,显示控制方法,程序和计算机可读记录介质

    公开(公告)号:US09182756B2

    公开(公告)日:2015-11-10

    申请号:US13579673

    申请日:2011-01-27

    IPC分类号: G05B19/4068 B25J9/16

    摘要: To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type. A PC (10), which is a display device, includes a command value acquiring section (1131) configured to acquire command values of a series of positions, which is an execution result of the control program; a position calculating section (1132) configured to obtain a series of positions of the specific portion for every control period or in a plurality of specified control periods corresponding to the acquired command values of the series of positions; a trajectory data creating section (1133) configured to create trajectory data showing a trajectory that passes each of the series of positions of the specific portion in order of elapse of time; an image data creating section (1134) configured to create image data for displaying a spatial mode of the trajectory on the screen as an image using the trajectory data; and a display control section (1011) configured to display the image on the screen using the image data.

    摘要翻译: 提供能够显示程序控制的控制目标设备的特定部分的轨迹的显示设备,而不管控制程序是简单的顺序执行类型还是情境自适应类型。 作为显示装置的PC(10)包括命令值取得部(1131),其被配置为获取作为所述控制程序的执行结果的一系列位置的指令值; 位置计算部分,被配置为获得针对每个控制周期的特定部分的一系列位置或者与所获取的一系列位置的命令值相对应的多个指定的控制周期; 轨迹数据生成部(1133),其被配置为创建轨迹数据,所述轨迹数据表示以经过时间顺序通过所述特定部分的所述一系列位置的每一个的轨迹; 图像数据创建部件,被配置为使用所述轨迹数据创建用于在所述屏幕上显示所述轨迹的空间模式作为图像的图像数据; 以及显示控制部(1011),被配置为使用所述图像数据在所述屏幕上显示所述图像。

    DISPLAY DEVICE, DISPLAY CONTROL METHOD, PROGRAM, AND COMPUTER READABLE RECORDING MEDIUM
    3.
    发明申请
    DISPLAY DEVICE, DISPLAY CONTROL METHOD, PROGRAM, AND COMPUTER READABLE RECORDING MEDIUM 有权
    显示设备,显示控制方法,程序和计算机可读记录介质

    公开(公告)号:US20130044115A1

    公开(公告)日:2013-02-21

    申请号:US13579673

    申请日:2011-01-27

    IPC分类号: G06T13/00

    摘要: To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type. A PC (10), which is a display device, includes a command value acquiring section (1131) configured to acquire command values of a series of positions, which is an execution result of the control program; a position calculating section (1132) configured to obtain a series of positions of the specific portion for every control period or in a plurality of specified control periods corresponding to the acquired command values of the series of positions; a trajectory data creating section (1133) configured to create trajectory data showing a trajectory that passes each of the series of positions of the specific portion in order of elapse of time; an image data creating section (1134) configured to create image data for displaying a spatial mode of the trajectory on the screen as an image using the trajectory data; and a display control section (1011) configured to display the image on the screen using the image data.

    摘要翻译: 提供能够显示程序控制的控制目标设备的特定部分的轨迹的显示设备,而不管控制程序是简单的顺序执行类型还是情境自适应类型。 作为显示装置的PC(10)包括命令值取得部(1131),其被配置为获取作为所述控制程序的执行结果的一系列位置的指令值; 位置计算部分,被配置为获得针对每个控制周期的特定部分的一系列位置或者与所获取的一系列位置的命令值相对应的多个指定的控制周期; 轨迹数据生成部(1133),其被配置为创建轨迹数据,所述轨迹数据表示以经过时间顺序通过所述特定部分的所述一系列位置的每一个的轨迹; 图像数据创建部件,被配置为使用所述轨迹数据创建用于在所述屏幕上显示所述轨迹的空间模式作为图像的图像数据; 以及显示控制部(1011),被配置为使用所述图像数据在所述屏幕上显示所述图像。

    LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING ARTICLE

    公开(公告)号:US20110267595A1

    公开(公告)日:2011-11-03

    申请号:US13093309

    申请日:2011-04-25

    申请人: Kenichiro MORI

    发明人: Kenichiro MORI

    IPC分类号: G03B27/54

    CPC分类号: G03F7/70066 G03F7/70091

    摘要: A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis.

    摘要翻译: 光刻设备包括:遮光板,在其边缘上包括与圆形边界线重叠的圆弧,该圆形边界线限定图案被转印到其上的区域,并且位于基板的外周边内, 光以防止光入射到位于圆形边界线外部的外周区域; 围绕与所述照射系统的光轴平行的轴旋转所述遮光板的第一驱动单元; 以及第二驱动单元,其在与所述光轴垂直的平面内直线驱动所述遮光板。

    Exposure apparatus
    5.
    发明授权
    Exposure apparatus 有权
    曝光装置

    公开(公告)号:US07130024B2

    公开(公告)日:2006-10-31

    申请号:US10851851

    申请日:2004-05-21

    IPC分类号: G03B27/32 G03B27/54 G03B27/72

    摘要: An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

    摘要翻译: 曝光装置包括使用来自光源的光照射标线片的照明光学系统,用于将掩模版图案投影到基板上的投影光学系统,以及具有用于调节基板上的照明区域的开口的可变挡块, 所述可变挡块设置在与所述基板共轭的位置附近,其中所述可变挡块的位置沿着所述照明光学系统的光轴或所述投影光学系统的光轴是可变的。

    Illumination optical system and exposure apparatus having the same
    6.
    发明授权
    Illumination optical system and exposure apparatus having the same 失效
    照明光学系统和具有该光学系统的曝光装置

    公开(公告)号:US07126673B2

    公开(公告)日:2006-10-24

    申请号:US11095889

    申请日:2005-03-31

    申请人: Kenichiro Mori

    发明人: Kenichiro Mori

    IPC分类号: G03B27/72 G03B27/42

    摘要: An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.

    摘要翻译: 一种用于使用来自光源的光照射目标表面的照明光学系统,包括用于检测光的光强的传感器,用于分离光的一部分的光分离器和布置在光源和光源之间的光学元件 光分路器,用于透射光,并用于将已被光分离器分裂的光的一部分反射到传感器。

    Three-dimensional structure forming method
    7.
    发明授权
    Three-dimensional structure forming method 失效
    三维结构成型方法

    公开(公告)号:US07027227B2

    公开(公告)日:2006-04-11

    申请号:US10761293

    申请日:2004-01-22

    IPC分类号: G02B27/10

    摘要: A method for forming a three-dimensional structure made of a photosensitive material on a substrate includes the steps of determining a film thickness of the photosensitive material necessary to form the desired three-dimensional structure, comparing a predetermined maximum film thickness with the film thickness determined by the determining step, and applying, when the film thickness determined by the determining step is greater than the predetermined maximum film thickness, the photosensitive material within the maximum film thickness plural times until the photosensitive material has the film thickness on the substrate.

    摘要翻译: 用于在基板上形成由感光材料制成的三维结构的方法包括以下步骤:确定形成所需三维结构所需的感光材料的膜厚度,将预定最大膜厚与确定的膜厚进行比较 通过确定步骤,并且当由确定步骤确定的膜厚度大于预定最大膜厚度时,将最大膜厚度内的感光材料多次施加,直到感光材料在基板上具有膜厚度为止。

    Illumination optical system, exposure apparatus and device fabrication method
    8.
    发明申请
    Illumination optical system, exposure apparatus and device fabrication method 失效
    照明光学系统,曝光装置和装置制造方法

    公开(公告)号:US20050237527A1

    公开(公告)日:2005-10-27

    申请号:US11112989

    申请日:2005-04-22

    申请人: Kenichiro Mori

    发明人: Kenichiro Mori

    摘要: An illumination optical system for illuminating a target surface using light from a light source, said illumination optical system includes a polarizing element that is arranged in an optical path from the light source to the target surface, and adjusts a polarization ratio of the light, and an optical element that is arranged in an optical path from the polarizing element to the target surface, wherein the total birefringence of the optical element is m+2σ

    摘要翻译: 一种照明光学系统,其使用来自光源的光来照射目标表面,所述照明光学系统包括偏振元件,所述偏振元件布置在从所述光源到所述目标表面的光路中,并且调节所述光的偏振比,以及 布置在从偏振元件到目标表面的光路中的光学元件,其中光学元件的总双折射为m + 2sigma <1.0nm / cm,其中光学玻璃的玻璃材料的双折射率的平均值 元素为m,光学元件的玻璃材料的标准变化双折射量为σ。

    Exposure amount control method in exposure apparatus
    9.
    发明授权
    Exposure amount control method in exposure apparatus 失效
    曝光量控制方法

    公开(公告)号:US06803991B2

    公开(公告)日:2004-10-12

    申请号:US09790866

    申请日:2001-02-23

    申请人: Kenichiro Mori

    发明人: Kenichiro Mori

    IPC分类号: G03B2742

    CPC分类号: G03F7/70558

    摘要: An exposure amount control method includes steps of illuminating an original with exposure light, emitted from a light source, through one or more light intensity uniforming optical systems, so that a pattern of the original illuminated is projected and printed on a substrate, measuring, by use of a first illuminance sensor, and illuminance of the exposure light as branched at a light source of the or one of the light intensity uniforming optical systems which is closest to the original, controlling an exposure amount of the substrate on the basis of a measurement output of the first illuminance sensor, measuring, by use of a second illuminance sensor, an illuminance at a position substantially conjugate with the substrate, and calibrating an output of the first illuminance sensor on the basis of a measurement output of the second illuminance sensor.

    摘要翻译: 曝光量控制方法包括以下步骤:通过一个或多个光强均匀化光学系统从光源发射的曝光光照射原稿,使原始照明的图案投影并印刷在基板上,通过 使用第一照度传感器,以及在最靠近原稿的光强均匀化光学系统的光源处分支的曝光光的照度,基于测量来控制基板的曝光量 第一照度传感器的输出,通过使用第二照度传感器测量与基板大致共轭的位置处的照度,并且基于第二照度传感器的测量输出来校准第一照度传感器的输出。

    Illumination system for use in exposure apparatus
    10.
    发明授权
    Illumination system for use in exposure apparatus 失效
    用于曝光设备的照明系统

    公开(公告)号:US06639652B1

    公开(公告)日:2003-10-28

    申请号:US09587907

    申请日:2000-06-06

    IPC分类号: G03B2754

    CPC分类号: G03F7/70175

    摘要: An illumination system includes an optical system, an optical integrator and a condenser. The optical system collects light from a light source and includes a mirror for reflecting the light. The mirror has an ellipsoidal reflection surface of a shape being out of axial symmetry for defining an aperture of rectangular or semicircular shape as seen in an optical axis direction. The optical integrator produces plural light beams by use of light from the optical system and includes an array of condensing elements having a light entrance surface of rectangular shape as seen in the optical axis direction. A lengthwise direction of the rectangular-shaped or semicircular-shaped aperture of the ellipsoidal reflection surface corresponds to a lengthwise direction of the rectangular-shape light entrance surface of the condensing elements. The condenser illuminates a surface to be illuminated by use of the plural light beams.

    摘要翻译: 照明系统包括光学系统,光学积分器和冷凝器。 光学系统从光源收集光并且包括用于反射光的反射镜。 反射镜具有椭圆形的反射表面,其形状不在轴向对称状态,用于限定在光轴方向上看到的矩形或半圆形的孔。 光学积分器通过使用来自光学系统的光产生多个光束,并且包括具有在光轴方向上看到的矩形形状的光入射表面的聚光元件阵列。 椭圆面反射面的矩形或半圆形孔的长度方向对应于聚光元件的矩形光入射面的长度方向。 聚光器通过使用多个光束照亮要照明的表面。