公开(公告)号：US08062834B2

公开(公告)日：2011-11-22

申请号：US12344488

申请日：2008-12-27

申请人： Hyung Sup Lee ,  Kyoo Hwan Lee ,  Young Ho Kwon

发明人： Hyung Sup Lee ,  Kyoo Hwan Lee ,  Young Ho Kwon

IPC分类号： G03F7/00 ,  G03F7/20

CPC分类号： H01L51/0021 ,  H01L51/0023 ,  H01L51/5203

摘要： Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.

摘要翻译： 提供一种制造透明电极图案的方法和用于制造具有透明电极图案的电光器件的方法。 透明电极图案的制造方法包括在透光性基板上形成透明电极，通过除去透明电极的一部分来对透明电极进行图案化，并且在图案化透明电极的边缘区域中形成绝缘保护层，通过 打印过程。 根据该方法，通过印刷工艺在图案化的透明电极的边缘区域中形成绝缘保护层，从而可以简化制造绝缘保护层的装置和方法，导致制造成本的降低。

公开(公告)号：US20090165718A1

公开(公告)日：2009-07-02

申请号：US12344489

申请日：2008-12-27

申请人： Hyung Sup Lee ,  Sung Tae Nam Goong ,  Kyoo Hwan Lee ,  Young Ho Kwon ,  Chang Jae Lee

发明人： Hyung Sup Lee ,  Sung Tae Nam Goong ,  Kyoo Hwan Lee ,  Young Ho Kwon ,  Chang Jae Lee

IPC分类号： C23C16/00

CPC分类号： C23C14/12 ,  C23C14/243 ,  C23C14/246 ,  C23C14/26

摘要： Provided are a gas injector and a film deposition apparatus having the same. The gas injector includes a body, a supply hole, an injection hole, and a distribution plate. The body is configured to provide an inner space therein. The supply hole is formed in an upper surface of the body to communicate with the inner space and receive a raw material. The injection hole is formed in a lower surface of the body to communicate with the inner space and inject the raw material. The distribution plate is disposed in the inner space of the body. A through hole is formed in the distribution plate. The distribution plate is disposed to be inclined at a predetermined angle with respect to a horizontal plane. The gas injector can uniformly inject the raw material and improve vaporization efficiency of the raw material having a powder form.

摘要翻译： 提供了一种气体注入器和具有该气体注入器的成膜装置。 气体喷射器包括主体，供给孔，喷射孔和分配板。 身体构造成在其中提供内部空间。 供应孔形成在主体的上表面中以与内部空间连通并且接收原料。 注入孔形成在主体的下表面中，与内部空间连通并注入原料。 分配板设置在主体的内部空间中。 在分配板上形成通孔。 分配板相对于水平面倾斜预定角度。 气体喷射器可以均匀地注入原料并提高具有粉末形式的原料的蒸发效率。

公开(公告)号：US20130051957A1

公开(公告)日：2013-02-28

申请号：US13578237

申请日：2011-02-17

申请人： Kyoo Hwan Lee ,  Deck Won Moon ,  Jae Hwan Jang

发明人： Kyoo Hwan Lee ,  Deck Won Moon ,  Jae Hwan Jang

IPC分类号： H01L21/677

CPC分类号： H01L21/67173 ,  B65G49/061 ,  B65G49/067 ,  B65G2249/02 ,  F16H25/20 ,  F16H2025/2043 ,  F16H2025/2075 ,  H01L21/67742

摘要： A substrate processing system and substrate transferring method is capable of improving substrate-transferring efficiency by transferring a substrate bi-directionally through a substrate transferring device between two rows of processing chambers, and transferring the substrate to a precise position by rotating the substrate transferring device. The processing system includes a transfer chamber, a bi-directional substrate transferring device; and processing chambers which apply a semiconductor-manufacturing process to the substrate. The processing chambers are linearly arranged along two confronting rows, and the transfer chamber is between the two rows of processing chambers. The substrate transferring device includes a moving unit inside the transfer chamber; a bi-directional substrate transferring unit in the moving unit, that transfers the substrate to the processing chamber through a bi-directional sliding movement; and a rotating unit between the moving unit and the bi-directional substrate transferring unit, that rotates the bi-directional substrate transferring unit at a predetermined angle.

摘要翻译： 基板处理系统和基板转印方法能够通过将基板双向转印通过基板转印装置在两行处理室之间来提高基板转印效率，并且通过旋转基板转印装置将基板转印到精确位置。 处理系统包括传送室，双向基板传送装置; 以及将半导体制造工艺应用于基板的处理室。 处理室沿着两个相对的行线性排列，并且传送室位于两排处理室之间。 基片传送装置包括传送室内的移动单元; 移动单元中的双向基板传送单元，其通过双向滑动运动将基板传送到处理室; 以及在所述移动单元和所述双向基板传送单元之间的旋转单元，其使所述双向基板传送单元以预定角度旋转。

公开(公告)号：US09252034B2

公开(公告)日：2016-02-02

申请号：US13578237

申请日：2011-02-17

申请人： Kyoo Hwan Lee ,  Deck Won Moon ,  Jae Hwan Jang

发明人： Kyoo Hwan Lee ,  Deck Won Moon ,  Jae Hwan Jang

IPC分类号： F16H25/20 ,  H01L21/67 ,  H01L21/677 ,  B65G49/06

CPC分类号： H01L21/67173 ,  B65G49/061 ,  B65G49/067 ,  B65G2249/02 ,  F16H25/20 ,  F16H2025/2043 ,  F16H2025/2075 ,  H01L21/67742

摘要： A substrate processing system and substrate transferring method is capable of improving substrate-transferring efficiency by transferring a substrate bi-directionally through a substrate transferring device between two rows of processing chambers, and transferring the substrate to a precise position by rotating the substrate transferring device. The processing system includes a transfer chamber, a bi-directional substrate transferring device; and processing chambers which apply a semiconductor-manufacturing process to the substrate. The processing chambers are linearly arranged along two confronting rows, and the transfer chamber is between the two rows of processing chambers. The substrate transferring device includes a moving unit inside the transfer chamber; a bi-directional substrate transferring unit in the moving unit, that transfers the substrate to the processing chamber through a bi-directional sliding movement; and a rotating unit between the moving unit and the bi-directional substrate transferring unit, that rotates the bi-directional substrate transferring unit at a predetermined angle.

摘要翻译： 基板处理系统和基板转印方法能够通过将基板双向转印通过基板转印装置在两行处理室之间来提高基板转印效率，并且通过旋转基板转印装置将基板转印到精确位置。 处理系统包括传送室，双向基板传送装置; 以及将半导体制造工艺应用于基板的处理室。 处理室沿着两个相对的行线性排列，并且传送室位于两排处理室之间。 基片传送装置包括传送室内的移动单元; 移动单元中的双向基板传送单元，其通过双向滑动运动将基板传送到处理室; 以及在所述移动单元和所述双向基板传送单元之间的旋转单元，其使所述双向基板传送单元以预定角度旋转。

公开(公告)号：US20110262252A1

公开(公告)日：2011-10-27

申请号：US13141055

申请日：2010-01-12

申请人： Kyoo Hwan Lee ,  Duck Won Moon ,  Jae Wook Choi

发明人： Kyoo Hwan Lee ,  Duck Won Moon ,  Jae Wook Choi

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67748 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S901/14 ,  Y10S901/19 ,  Y10S901/25

摘要： A substrate processing system and substrate transferring method is disclosed, which is capable of transferring a substrate bi-directionally through the use of substrate transferring device provided between two rows of processing chambers arranged linearly, thereby improving the substrate-transferring efficiency, the substrate processing system comprising a transfer chamber having at least one bi-directional substrate transferring device for bi-directionally transferring a substrate; and a plurality of processing chambers for applying a semiconductor-manufacturing process to the substrate, wherein the plurality of processing chambers are linearly arranged along two rows confronting each other, and the transfer chamber is interposed between the two rows of the processing chambers, wherein the at least one bi-directional substrate transferring device comprises a moving unit provided inside the transfer chamber, and horizontally moved by a linear motor; and a bi-directional substrate transferring unit provided in the moving unit, the bi-directional substrate transferring unit for transferring the substrate to the processing chamber through a bi-directional sliding movement.

摘要翻译： 公开了一种基板处理系统和基板转印方法，其能够通过使用设置在线性布置的两行处理室之间的基板转印装置双向转印基板，从而提高基板转印效率，基板处理系统 包括具有用于双向转印衬底的至少一个双向衬底转移装置的传送室; 以及多个处理室，用于对基板施加半导体制造工艺，其中所述多个处理室沿着彼此面对的两列线性排列，并且所述传送室插入在所述两行处理室之间，其中， 至少一个双向基板传送装置包括设置在传送室内部并由线性马达水平移动的移动单元; 以及设置在所述移动单元中的双向基板传送单元，所述双向基板传送单元用于通过双向滑动运动将所述基板传送到所述处理室。

公开(公告)号：US20090288600A1

公开(公告)日：2009-11-26

申请号：US12467217

申请日：2009-05-15

申请人： Kyoo Hwan Lee ,  Hyung Sup Lee

发明人： Kyoo Hwan Lee ,  Hyung Sup Lee

IPC分类号： C23C16/44

CPC分类号： C23C14/12 ,  C23C14/246 ,  C23C16/4481

摘要： The present invention provides an apparatus for supplying a source and an apparatus for depositing a thin film having the same. The apparatus for supplying a source includes a horizontal channel extending in one direction; pumping and transfer ports extending to pass through the horizontal channel, the pumping and transfer ports being spaced apart from each other; a transfer shaft inserted into the horizontal channel to reciprocate therein; and a storage room connected to one side of the pumping port, the storage room storing and supplying a powder source, wherein the transfer shaft comprises at least one transfer hole for allowing the powder source supplied through the pumping port to be filled therein and to be transferred to an external apparatus through the transfer port. As described above, according to the present invention, a powder source filled in a transfer hole is supplied to an external apparatus by reciprocating a transfer shaft, so that the amount of the powder source supplied to the external apparatus can be quantitatively controlled as much as a fixed quantity corresponding to the internal volume of the transfer hole.

摘要翻译： 本发明提供一种用于提供源的装置和用于沉积具有该源的薄膜的装置。 用于供应源的设备包括沿一个方向延伸的水平通道; 泵送和传送端口延伸穿过水平通道，泵送和传送端口彼此间隔开; 插入水平通道中的传送轴在其中往复运动; 以及连接到所述抽吸口的一侧的储藏室，所述储存室存储和供应粉末源，其中所述传送轴包括至少一个传送孔，用于允许通过所述泵送口供应的粉末源被填充在其中，并且为 通过传输端口传输到外部设备。 如上所述，根据本发明，通过使传送轴往复运动而将填充在传送孔中的粉末源供给到外部设备，从而可以将供给到外部设备的粉末源的量定量控制为 对应于传送孔的内部容积的固定量。

公开(公告)号：US09022714B2

公开(公告)日：2015-05-05

申请号：US13141055

申请日：2010-01-12

申请人： Kyoo Hwan Lee ,  Duck Won Moon ,  Jae Wook Choi

发明人： Kyoo Hwan Lee ,  Duck Won Moon ,  Jae Wook Choi

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67742 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67748 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S901/14 ,  Y10S901/19 ,  Y10S901/25

摘要： A substrate processing system and substrate transferring method capable of transferring a substrate bi-directionally through the use of substrate transferring device provided between two rows of processing chambers arranged linearly, thereby improving the substrate-transferring efficiency, the substrate processing system includes a transfer chamber having at least one bi-directional substrate transferring device for bi-directionally transferring a substrate; and a plurality of processing chambers for applying a semiconductor-manufacturing process to the substrate, wherein the plurality of processing chambers are linearly arranged along two rows confronting each other, and the transfer chamber is interposed between the two rows of the processing chambers, wherein the bi-directional substrate transferring device have a moving unit inside the transfer chamber, and horizontally moved by a linear motor; and a bi-directional substrate transferring unit in the moving unit, the bi-directional substrate transferring unit transferring the substrate to the processing chamber through a bi-directional sliding movement.

摘要翻译： 一种基板处理系统和基板转印方法，其能够通过使用设置在线性布置的两行处理室之间的基板转印装置双向转印基板，从而提高基板转印效率，所述基板处理系统包括：转印室，具有 至少一个用于双向转印衬底的双向衬底转移装置; 以及多个处理室，用于对基板施加半导体制造工艺，其中所述多个处理室沿着彼此面对的两列线性排列，并且所述传送室插入在所述两行处理室之间，其中， 双向基板转印装置在传送室内具有移动单元，并通过线性电动机水平移动; 以及移动单元中的双向基板传送单元，双向基板传送单元通过双向滑动运动将基板传送到处理室。

公开(公告)号：US08628621B2

公开(公告)日：2014-01-14

申请号：US12344489

申请日：2008-12-27

申请人： Hyung Sup Lee ,  Sung Tae Nam Goong ,  Kyoo Hwan Lee ,  Young Ho Kwon ,  Chang Jae Lee

发明人： Hyung Sup Lee ,  Sung Tae Nam Goong ,  Kyoo Hwan Lee ,  Young Ho Kwon ,  Chang Jae Lee

IPC分类号： C23C16/00 ,  B05B1/24 ,  B05B1/00

CPC分类号： C23C14/12 ,  C23C14/243 ,  C23C14/246 ,  C23C14/26

摘要： Provided are a gas injector and a film deposition apparatus having the same. The gas injector includes a body, a supply hole, an injection hole, and a distribution plate. The body is configured to provide an inner space therein. The supply hole is formed in an upper surface of the body to communicate with the inner space and receive a raw material. The injection hole is formed in a lower surface of the body to communicate with the inner space and inject the raw material. The distribution plate is disposed in the inner space of the body. A through hole is formed in the distribution plate. The distribution plate is disposed to be inclined at a predetermined angle with respect to a horizontal plane. The gas injector can uniformly inject the raw material and improve vaporization efficiency of the raw material having a powder form.

摘要翻译： 提供了一种气体注入器和具有该气体注入器的成膜装置。 气体喷射器包括主体，供给孔，喷射孔和分配板。 身体构造成在其中提供内部空间。 供应孔形成在主体的上表面中以与内部空间连通并且接收原料。 注入孔形成在主体的下表面中，与内部空间连通并注入原料。 分配板设置在主体的内部空间中。 在分配板上形成通孔。 分配板相对于水平面倾斜预定角度。 气体喷射器可以均匀地注入原料并提高具有粉末形式的原料的蒸发效率。

公开(公告)号：US08440018B2

公开(公告)日：2013-05-14

申请号：US12467217

申请日：2009-05-15

申请人： Kyoo Hwan Lee ,  Hyung Sup Lee

发明人： Kyoo Hwan Lee ,  Hyung Sup Lee

IPC分类号： C23C16/00

CPC分类号： C23C14/12 ,  C23C14/246 ,  C23C16/4481

摘要： The present invention provides an apparatus for supplying a source and an apparatus for depositing a thin film having the same. The apparatus for supplying a source includes a horizontal channel extending in one direction; pumping and transfer ports extending to pass through the horizontal channel, the pumping and transfer ports being spaced apart from each other; a transfer shaft inserted into the horizontal channel to reciprocate therein; and a storage room connected to one side of the pumping port, the storage room storing and supplying a powder source, wherein the transfer shaft comprises at least one transfer hole for allowing the powder source supplied through the pumping port to be filled therein and to be transferred to an external apparatus through the transfer port. As described above, according to the present invention, a powder source filled in a transfer hole is supplied to an external apparatus by reciprocating a transfer shaft, so that the amount of the powder source supplied to the external apparatus can be quantitatively controlled as much as a fixed quantity corresponding to the internal volume of the transfer hole.

摘要翻译： 本发明提供一种用于提供源的装置和用于沉积具有该源的薄膜的装置。 用于供应源的设备包括沿一个方向延伸的水平通道; 泵送和传送端口延伸穿过水平通道，泵送和传送端口彼此间隔开; 插入水平通道中的传送轴在其中往复运动; 以及连接到所述抽吸口的一侧的储藏室，所述储存室存储和供应粉末源，其中所述传送轴包括至少一个传送孔，用于允许通过所述泵送口供应的粉末源被填充在其中，并且为 通过传输端口传输到外部设备。 如上所述，根据本发明，通过使传送轴往复运动而将填充在传送孔中的粉末源供给到外部设备，从而可以将供给到外部设备的粉末源的量定量控制为 对应于传送孔的内部容积的固定量。

公开(公告)号：US20110315432A1

公开(公告)日：2011-12-29

申请号：US13225525

申请日：2011-09-05

申请人： Hyung Sup LEE ,  Kyoo Hwan LEE ,  Young Ho KWON

发明人： Hyung Sup LEE ,  Kyoo Hwan LEE ,  Young Ho KWON

IPC分类号： H05K1/09 ,  B29C35/08 ,  B05D5/12 ,  C08J7/18

CPC分类号： H01L51/0021 ,  H01L51/0023 ,  H01L51/5203

摘要： Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.

摘要翻译： 提供一种制造透明电极图案的方法和用于制造具有透明电极图案的电光器件的方法。 透明电极图案的制造方法包括在透光性基板上形成透明电极，通过除去透明电极的一部分来对透明电极进行图案化，并且在图案化透明电极的边缘区域中形成绝缘保护层，通过 打印过程。 根据该方法，通过印刷工艺在图案化的透明电极的边缘区域中形成绝缘保护层，从而可以简化制造绝缘保护层的装置和方法，导致制造成本的降低。