中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

83 records (took 0.026 seconds)

    Sulfobetaine group-comprising reactive compound, polymer thereof, and method of producing the polymer
    2.
    发明授权
    Sulfobetaine group-comprising reactive compound, polymer thereof, and method of producing the polymer 有权

    公开(公告)号：US11434322B2

    公开(公告)日：2022-09-06

    申请号：US16493426

    申请日：2018-03-21

    Applicant: Nagase ChemteX Corporation

    Inventor： Daisuke Nakamura ,  Tatsuya Inoue

    IPC: C07C309/14 ,  C08G18/38 ,  A61L31/06 ,  C08G18/44 ,  C08G18/65 ,  C08G18/76 ,  C08J5/18

    Abstract: A polymer comprising at least 1% by mole of a structural unit represented by Formula (2); in Formula (2), two R1s are the same or different from each other and are each a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; X is a single bond, an oxygen atom, or a group represented by —COO—, —OOC—, —CONH—, —NH—, —NHCO—, —NR3—, or —CH2O—; Y is a single bond or an oligooxyalkylene group; two R2s are the same or different from each other and are each an alkyl group having 1 to 6 carbon atoms; R3 is an alkyl group having 1 to 6 carbon atoms; m is an integer of 1 to 10; and n is an integer of 2 to 10; and having a number average molecular weight of 5,000 or more has various characteristics suitable for use in contact with a living organism and can be easily produced.

    RESIN COMPOSITION FOR IMPRINTING
    3.
    发明申请
    RESIN COMPOSITION FOR IMPRINTING 有权

    公开(公告)号：US20220267638A1

    公开(公告)日：2022-08-25

    申请号：US17627051

    申请日：2020-07-13

    Applicant: NAGASE CHEMTEX CORPORATION

    Inventor： Yuki SUGIURA ,  Yohei UETSUKI

    IPC: C09D183/04 ,  C08L83/04 ,  C08K5/5419 ,  C08K3/22

    Abstract: Provided is a resin composition for imprinting excellent in imprint properties and optical properties such as high refractive index and low haze. The invention relates to a resin composition for imprinting containing: (A) a polysiloxane resin represented by the following formula (1): (R1SiO3/2)a(R22SiO2/2)b(R33SiO1/2)c(SiO4/2)d wherein R1, R2, and R3 are each independently a hydrogen atom, a hydroxy group, an alkoxy group, a C1-C12 hydrocarbon group, or a C1-C12 substituent having one or more crosslinkable functional groups, with at least one of R1, R2, or R3 being a C1-C12 substituent having one or more crosslinkable functional groups, and when a plurality of R1s, R2s, or R3s are present, they may be different from one another; and a, b, c, and d are numbers satisfying the following conditions: 0.001≤a≤1.00, 0≤b≤0.999, 0≤c≤0.30, 0≤d≤0.30, and a+b+c+d=1.0; and (B) a fine particulate inorganic oxide, wherein the ratio by weight of the sum of the polysiloxane resin (A) and optionally an alkoxysilane compound and a curable resin to the fine particulate inorganic oxide (B) is 0.2 to 2.5.

    MANUFACTURING METHOD OF MOUNTING STRUCTURE, AND SHEET THEREFOR
    5.
    发明申请
    MANUFACTURING METHOD OF MOUNTING STRUCTURE, AND SHEET THEREFOR 有权

    公开(公告)号：US20210084775A1

    公开(公告)日：2021-03-18

    申请号：US16772643

    申请日：2018-12-13

    Applicant: NAGASE CHEMTEX CORPORATION

    Inventor： Eiichi NOMURA ,  Yutaka MIYAMOTO ,  Takayuki HASHIMOTO

    IPC: H05K3/46 ,  H05K1/14

    Abstract: A manufacturing method of a mounting structure includes: a step of preparing a mounting member including a first circuit member and a plurality of second circuit members placed on the first circuit member; a disposing step of disposing a thermosetting sheet and a thermoplastic sheet on the mounting member, with the thermosetting sheet interposed between the thermoplastic sheet and the first circuit member; a first sealing step of pressing a stack of the thermosetting sheet and the thermoplastic sheet against the first circuit member, and heating the stack, to seal the second circuit members and to cure the thermosetting sheet into a cured layer; and a removal step of removing the thermoplastic sheet from the cured layer. At least one of the second circuit members is a hollow member having a space from the first circuit member, and in the first sealing step, the second circuit members are sealed so as to maintain the space.

    ETCHANT
    6.
    发明申请
    ETCHANT 审中-公开

    公开(公告)号：US20180305616A1

    公开(公告)日：2018-10-25

    申请号：US16017563

    申请日：2018-06-25

    Applicant: Nagase ChemteX Corporation

    Inventor： Satoru YOSHIZAKI ,  Yoshihiro MUKAI

    IPC: C09K13/00 ,  C08K5/092 ,  C08K5/42

    CPC classification number: C09K13/00 ,  C08K5/092 ,  C08K5/42 ,  C09K13/06 ,  H01L31/18

    Abstract: The present invention provides an etchant which is usable for a long period of time owing to its high indium solubility and reduced precipitation of a salt of oxalic acid and indium, and further has excellent residue removal and antifoaming properties, thereby being suitable for etching indium oxide-based films. An etchant for etching an indium oxide-based film, the etchant containing: (A) oxalic acid; (B) polyvinylpyrrolidone; and (C) water.

    Composition for ink and transparent electrode
    8.
    发明授权
    Composition for ink and transparent electrode 有权

    公开(公告)号：US09944812B2

    公开(公告)日：2018-04-17

    申请号：US14616260

    申请日：2015-02-06

    Applicant: Nagase ChemteX Corporation

    Inventor： Tatsuya Ohori ,  Yasunori Kurushima ,  Takahiro Sakurai

    IPC: H01G9/00 ,  C09D11/52 ,  H01B1/12 ,  C09D11/10

    CPC classification number: C09D11/52 ,  C09D11/10 ,  H01B1/124

    Abstract: Provided is an ink composition having excellent printing properties and capable of forming a thick transparent conductive film with low surface resistivity even when it is used in gravure offset printing or pad printing. The ink composition contains (A) a conductive polymer, (B) a binder, and (C) a conductivity enhancer, wherein the composition has a viscosity at 25° C. of 5 to 500 dPa·s and a solids content of 10% to 80% by weight, and the composition exhibits a surface resistivity of 2000 Ω/sq or lower and a total light transmittance of 70% or higher when applied at a wet film thickness of 15 μm.

    CROSSLINKING AGENT COMPOSITION FOR WATER-ABSORBING RESIN
    9.
    发明申请
    CROSSLINKING AGENT COMPOSITION FOR WATER-ABSORBING RESIN 审中-公开
    用于吸水树脂的交联剂组合物

    公开(公告)号：US20170014802A1

    公开(公告)日：2017-01-19

    申请号：US15124241

    申请日：2015-03-19

    Applicant: Nagase ChemteX Corporation

    Inventor： Tetsuya HOSOMI ,  Masato FUSHIKI ,  Toyohiro NAGANO

    IPC: B01J20/26 ,  C08J3/24 ,  C08K5/06

    CPC classification number: B01J20/267 ,  B01J2220/68 ,  C08J3/245 ,  C08J2300/105 ,  C08J2300/14 ,  C08J2333/02 ,  C08K5/05 ,  C08K5/06 ,  C08L101/08 ,  C08L101/14 ,  C08K5/053

    Abstract: The present invention aims to provide a crosslinking agent composition for water-absorbing resins with which it is possible to produce a water-absorbing agent having a high water absorption capacity. The present invention also aims to provide a water-absorbing agent produced by crosslinking a water-absorbing resin with the crosslinking agent composition for water-absorbing resins. The present invention may include a crosslinking agent composition for water-absorbing resins containing a crosslinking agent (A) and a water absorption improver (B), wherein the water absorption improver (B) is a halohydrin compound (b1) represented by the formula (1) below or a compound (b2) containing at least one selected from the group consisting of carbonate, carbamide, carbamate, and ureide groups: wherein X represents a chlorine atom or a bromine atom; and Y represents a hydroxyl group, a chlorine atom, or a bromine atom.

    Abstract translation: 其中X表示氯原子或溴原子; Y表示羟基，氯原子或溴原子。

Patent Agency Ranking