公开(公告)号：US20130192761A1

公开(公告)日：2013-08-01

申请号：US13754733

申请日：2013-01-30

Applicant: Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

Inventor： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

IPC: C23C16/54 ,  B05C13/00

CPC classification number: C23C16/54 ,  B05C13/00 ,  C23C16/45551

Abstract: A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system.

Abstract translation: 提供了一种用于处理多个基板的基板处理系统，并且通常包括至少一个处理平台和至少一个分段平台。 每个衬底位于设置在衬底支撑组件上的衬底载体上。 多个衬底载体，每个被配置为在其上承载衬底，位于衬底支撑组件的表面上。 处理平台和分段平台各自包括单独的基板支撑组件，其可以通过单独的旋转轨道机构旋转。 每个旋转轨道机构能够支撑基板支撑组件并且连续旋转由基板载体承载并且设置在基板支撑组件上的多个基板。 因此，每个基板通过至少一个淋浴喷头站和至少一个缓冲站进行处理，所述至少一个缓冲站位于处理平台的旋转轨道机构上方的距离处。 每个基板可以在处理平台和分段平台之间传送并进出基板处理系统。

公开(公告)号：US20130192524A1

公开(公告)日：2013-08-01

申请号：US13755891

申请日：2013-01-31

Applicant: Banqiu Wu ,  Nag B. Patibandla ,  Toshiaki Fujita ,  Ralf Hofmann ,  Pravin K. Narwankar ,  Jeonghoon Oh ,  Srinivas Satya ,  Li-Qun Xia

Inventor： Banqiu Wu ,  Nag B. Patibandla ,  Toshiaki Fujita ,  Ralf Hofmann ,  Pravin K. Narwankar ,  Jeonghoon Oh ,  Srinivas Satya ,  Li-Qun Xia

IPC: H01L21/673

CPC classification number: H01L21/673 ,  C23C16/45546 ,  C23C16/4558 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67346 ,  H01L21/677

Abstract: A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system.

Abstract translation: 提供一种处理室，其具有堆叠在其中的多个可移动基板载体，用于连续处理多个基板。 可移动衬底载体能够从处理室的外部传送，例如从负载运送室转移到处理室中并且从处理室中输送，例如被转移到另一负载运送室中。 输送到处理室中的工艺气体在空间上分离成多个处理槽，和/或在时间上被控制。 处理室可以是多室衬底处理系统的一部分。

公开(公告)号：US08635034B2

公开(公告)日：2014-01-21

申请号：US12970544

申请日：2010-12-16

Applicant: Arijit Banerjee ,  Sunil Srinivasa Murthy ,  Srinivas Satya Sai Mallampalli ,  Ravindra Shyam Bhide

Inventor： Arijit Banerjee ,  Sunil Srinivasa Murthy ,  Srinivas Satya Sai Mallampalli ,  Ravindra Shyam Bhide

IPC: G01R31/00

CPC classification number: G01R31/027 ,  G01R29/20

Abstract: A method, system and computer program product for determining the health of a transformer are provided. The method includes computing an effective turns ratio based on a primary electrical parameter associated with a primary winding of the transformer and a secondary electrical parameter associated with a secondary winding of the transformer. The method further includes computing an operational magnetizing current based on the effective turns ratio and primary and secondary currents of the transformer or primary and secondary voltages of the transformer. Finally, the method includes determining an inter-turn winding health indicator based at least in part on the operational magnetizing current.

Abstract translation: 提供了一种用于确定变压器健康状况的方法，系统和计算机程序产品。 该方法包括基于与变压器的初级绕组相关联的主电参数和与变压器的次级绕组相关联的次级电参数来计算有效匝数比。 该方法还包括基于变压器的有效匝数比和初级和次级电流或变压器的一次和二次电压来计算操作磁化电流。 最后，该方法包括至少部分地基于操作磁化电流来确定匝间绕组健康状况指示器。

公开(公告)号：US20120158325A1

公开(公告)日：2012-06-21

申请号：US12970544

申请日：2010-12-16

Applicant: Arijit Banerjee ,  Sunil Srinivasa Murthy ,  Srinivas Satya Sai Mallampalli ,  Ravindra Shyam Bhide

Inventor： Arijit Banerjee ,  Sunil Srinivasa Murthy ,  Srinivas Satya Sai Mallampalli ,  Ravindra Shyam Bhide

IPC: G01R31/06 ,  G06F19/00

CPC classification number: G01R31/027 ,  G01R29/20

Abstract: A method, system and computer program product for determining the health of a transformer are provided. The method includes computing an effective turns ratio based on a primary electrical parameter associated with a primary winding of the transformer and a secondary electrical parameter associated with a secondary winding of the transformer. The method further includes computing an operational magnetizing current based on the effective turns ratio and primary and secondary currents of the transformer or primary and secondary voltages of the transformer. Finally, the method includes determining an inter-turn winding health indicator based at least in part on the operational magnetizing current.

Abstract translation: 提供了一种用于确定变压器健康状况的方法，系统和计算机程序产品。 该方法包括基于与变压器的初级绕组相关联的主电参数和与变压器的次级绕组相关联的次级电参数来计算有效匝数比。 该方法还包括基于变压器的有效匝数比和初级和次级电流或变压器的一次和二次电压来计算操作磁化电流。 最后，该方法包括至少部分地基于操作磁化电流来确定匝间绕组健康状况指示器。

公开(公告)号：US20130030742A1

公开(公告)日：2013-01-31

申请号：US13558890

申请日：2012-07-26

Applicant: Arijit Banerjee ,  Somakumar Ramachandrapanicker ,  Haiyan Sun ,  Subhra Samanta ,  Srinivas Satya Sai Mallampalli

Inventor： Arijit Banerjee ,  Somakumar Ramachandrapanicker ,  Haiyan Sun ,  Subhra Samanta ,  Srinivas Satya Sai Mallampalli

IPC: G01R23/02 ,  G01R23/14 ,  G06F19/00

CPC classification number: G01R31/343

Abstract: A method for monitoring a synchronous machine is described. The method includes injecting a narrowband sinusoidal signal at a first end of a field winding of the synchronous machine. The method further includes monitoring a voltage at a second end of the field winding with respect to ground. The method then identifies a resonant frequency based on the monitored voltage, and generates a winding health indicator based on the identified resonant frequency and an expected resonant frequency.

Abstract translation: 描述了一种监视同步电机的方法。 该方法包括在同步电机的励磁绕组的第一端处注入窄带正弦信号。 该方法还包括监测场绕组相对于地的第二端的电压。 该方法然后基于所监视的电压识别谐振频率，并且基于所识别的谐振频率和期望的谐振频率来生成绕组健康指示器。

公开(公告)号：US09748125B2

公开(公告)日：2017-08-29

申请号：US13755891

申请日：2013-01-31

Applicant: Banqiu Wu ,  Nag B. Patibandla ,  Toshiaki Fujita ,  Ralf Hofmann ,  Pravin K. Narwankar ,  Jeonghoon Oh ,  Srinivas Satya ,  Li-Qun Xia

Inventor： Banqiu Wu ,  Nag B. Patibandla ,  Toshiaki Fujita ,  Ralf Hofmann ,  Pravin K. Narwankar ,  Jeonghoon Oh ,  Srinivas Satya ,  Li-Qun Xia

IPC: C23C16/00 ,  H01L21/00 ,  H01L21/673 ,  H01L21/677 ,  C23C16/455 ,  C23C16/458 ,  C23C16/54

CPC classification number: H01L21/673 ,  C23C16/45546 ,  C23C16/4558 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67346 ,  H01L21/677

Abstract: A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system.

公开(公告)号：US20130196078A1

公开(公告)日：2013-08-01

申请号：US13754771

申请日：2013-01-30

Applicant: Joseph Yudovsky ,  Nag B. Patibandla ,  Pravin K. Narwankar ,  Li-Qun Xia ,  Toshiaki Fujita ,  Ralf Hofmann ,  Jeonghoon Oh ,  Srinivas Satya ,  Banqiu Wu

Inventor： Joseph Yudovsky ,  Nag B. Patibandla ,  Pravin K. Narwankar ,  Li-Qun Xia ,  Toshiaki Fujita ,  Ralf Hofmann ,  Jeonghoon Oh ,  Srinivas Satya ,  Banqiu Wu

IPC: C23C16/458

CPC classification number: C23C16/4584 ,  C23C16/45519 ,  C23C16/45551 ,  C23C16/54 ,  H01L21/67742

Abstract: A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon.

Abstract translation: 提供了用于处理多个基板的基板处理系统，并且通常包括至少一个基板处理平台和至少一个基板分段平台。 基板处理平台包括能够支撑多个基板支撑组件并且连续旋转基板支撑组件的旋转轨道系统，每个基板支撑组件在其上承载基板。 每个基板定位在设置在旋转轨道系统上的基板支撑组件上，并且通过位于基板处理平台的旋转轨道系统顶部的至少一个喷头站和至少一个缓冲站进行处理。 设置在基板支撑组件上的多个基板在基板处理平台内进出处理。 衬底分级平台包括至少一个双衬底处理站，每个双衬底处理站包括用于在其上支撑两个衬底的两个衬底支撑组件。