-
公开(公告)号：US09535013B2
公开(公告)日：2017-01-03
申请号：US13702696
申请日：2011-05-27
IPC分类号： G01N21/95 , G01B11/30 , G01N21/21 , G01N21/94 , G01N21/956
CPC分类号： G01N21/9501 , G01B11/303 , G01N21/21 , G01N21/94 , G01N21/956
摘要： In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer.
摘要翻译： 在通过使用安装激光源的暗场型检查装置来检查其表面上具有透明氧化物膜或金属膜的基板时，具有高相干性的照明光束会引起由于内部的多个干涉引起的反射强度的变化 发生透明氧化膜或由于金属膜的表面粗糙度而引起的散射光的干扰，并且导致缺陷检测的灵敏度的劣化。 本发明通过使用高度指示性的宽带光源提供低相干但高亮度照明来解决该问题，并且其中同时采用常规激光光源来选择性地使用光源的系统，从而使得能够高度敏感 根据晶片的状况进行检查。
-
公开(公告)号：US09255793B2
公开(公告)日：2016-02-09
申请号：US13521086
申请日：2011-02-09
IPC分类号： G01N21/55 , G06F19/00 , G01B11/30 , G01N21/956 , H01L21/67
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译： 缺陷检查装置包括：照射单元，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中所述图案将被形成为相同的形状; 检测单元，用于针对每个所述不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取单元，用于通过处理与检测到的反射光相对应的检测信号来提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取单元，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及缺陷分类单元，用于计算提取的缺陷的特征量，并根据所计算的特征量对缺陷进行分类。
-
公开(公告)号：US08660336B2
公开(公告)日：2014-02-25
申请号：US13593227
申请日：2012-08-23
申请人： Taketo Ueno , Yasuhiro Yoshitake
发明人： Taketo Ueno , Yasuhiro Yoshitake
CPC分类号： G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
摘要： A defect inspection system is disclosed for easily setting inspection conditions and providing an inspection condition and a defect signal intensity to an operator. The defect inspection system digitizes a defective image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image as a defect signal intensity and accumulates them in association with the inspection condition. The inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. A recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and provided to the operator.
摘要翻译： 公开了一种用于容易地设置检查条件并向操作者提供检查条件和缺陷信号强度的缺陷检查系统。 缺陷检查系统将缺陷图像，与其对应的参考图像和缺陷图像和参考图像的不匹配部分数字化为缺陷信号强度，并与检查条件相关联地累加它们。 更改检查条件以重复评估，同时重复累积工作，直到完成对设定范围内的所有检查条件的评估。 包括具有高缺陷信号强度的累积条件和作为检查条件配方的检查条件项目分配的配方文件被自动输出并提供给操作者。
-
公开(公告)号：US20130242294A1
公开(公告)日：2013-09-19
申请号：US13989835
申请日：2011-11-10
IPC分类号： G01N21/956
CPC分类号： G01N21/95623 , G01N21/9501 , G01N21/956 , G01N2021/8477
摘要： To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).
摘要翻译： 为了防止由于缺陷信号的减少而忽视缺陷，缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射，衍射和散射光，使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收，由此 获得第一幅图像; 从物体产生的反射，衍射和散射光被收集，使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收，由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。
-
公开(公告)号：US20130114880A1
公开(公告)日：2013-05-09
申请号：US13702696
申请日：2011-05-27
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01B11/303 , G01N21/21 , G01N21/94 , G01N21/956
摘要： In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer.
摘要翻译： 在通过使用安装激光源的暗场型检查装置来检查其表面上具有透明氧化物膜或金属膜的基板时，具有高相干性的照明光束会引起由于内部的多个干涉引起的反射强度的变化 发生透明氧化膜或由于金属膜的表面粗糙度而引起的散射光的干扰，并且导致缺陷检测的灵敏度的劣化。 本发明通过使用高度指示性的宽带光源提供低相干但高亮度照明来解决该问题，并且其中同时采用常规激光光源来选择性地使用光源的系统，从而使得能够高度敏感 根据晶片的状况进行检查。
-
公开(公告)号：US20120092657A1
公开(公告)日：2012-04-19
申请号：US13265935
申请日：2010-04-22
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译： 一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。 在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的 照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测 和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。
-
公开(公告)号：US20110032515A1
公开(公告)日：2011-02-10
申请号：US12907895
申请日：2010-10-19
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
-
公开(公告)号：US07881520B2
公开(公告)日：2011-02-01
申请号：US11501815
申请日：2006-08-10
申请人： Taketo Ueno , Yasuhiro Yoshitake
发明人： Taketo Ueno , Yasuhiro Yoshitake
CPC分类号： G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
摘要： The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
摘要翻译： 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
-
9.发明授权Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device 失效用于测量对准精度的装置和方法，以及用于制造半导体器件的方法和系统公开(公告)号：US06897956B2
公开(公告)日：2005-05-24
申请号：US10235656
申请日：2002-09-06
申请人： Minori Noguchi , Masahiko Nakada , Takahiko Suzuki , Taketo Ueno , Toshihiko Nakata , Shunji Maeda
发明人： Minori Noguchi , Masahiko Nakada , Takahiko Suzuki , Taketo Ueno , Toshihiko Nakata , Shunji Maeda
CPC分类号： G01B11/272 , H05K1/0269 , H05K3/4638
摘要： An apparatus for measuring an alignment accuracy between overlaid alignment marks formed to each of alignment mark portions on every plural chip units or exposure units arranged on a substrate to be measured, comprising: an XY stage running in a direction x and in a direction y while mounting the substrate; an illumination optical system for illuminating each of the alignment mark portions in a state where the XY stage runs in a direction x which is a direction of arranging the chips; a detecting optical system having an objective lens for collecting a reflection light in the running state obtained from the overlaid alignment marks, a focusing optical system for focusing the reflection light in the running state obtained from the objective lens, a scanning optical system for scanning reflection light image in the running state focused by the focusing optical system in a direction opposite to that of the running and a linear image sensor receiving reflection light image substantially in a static state being scanned in the opposite direction by the scanning optical system and converting them into image signal; and an alignment accuracy calculation device for measuring the alignment accuracy between the overlaid alignment marks at least for a direction perpendicular to the running direction based on the image signal converted by the linear image sensor.
摘要翻译： 一种用于测量在布置在待测量基板上的每个多个芯片单元或曝光单元上形成的每个对准标记部分上的重叠对准标记之间的对准精度的装置，包括：沿x方向和y方向运行的XY台， 安装基板; 照明光学系统，用于在XY台在作为排列芯片的方向的方向x上行进的状态下照亮每个对准标记部分; 一种检测光学系统，具有用于收集从重叠的对准标记获得的运行状态的反射光的物镜，用于将反射光聚焦在从物镜获得的运行状态的聚焦光学系统，用于扫描反射的扫描光学系统 聚焦光学系统以与行进方向相反的方向聚焦的运行状态的光图像和接收基本处于静止状态的反射光图像的线性图像传感器被扫描光学系统沿相反方向扫描并将其转换成 图像信号; 以及对准精度计算装置，用于根据由线性图像传感器转换的图像信号，至少对垂直于行进方向的方向测量重叠的对准标记之间的对准精度。
-
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译： 一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。
-
-
-
-
-
-
-
-
-
搜索结果
38 条记录 (耗时 0.026 秒)
