公开(公告)号：US09206402B2

公开(公告)日：2015-12-08

申请号：US14128918

申请日：2012-06-15

申请人： Thong-Gyu Jin ,  Yo Kyung Chung ,  Sang Hoon Paik ,  Yoo Chang Park ,  Jinwook Seo ,  Yong Woon Choi ,  Jong Mun Son ,  Yong-Chul Kim

发明人： Thong-Gyu Jin ,  Yo Kyung Chung ,  Sang Hoon Paik ,  Yoo Chang Park ,  Jinwook Seo ,  Yong Woon Choi ,  Jong Mun Son ,  Yong-Chul Kim

IPC分类号： C12N9/16 ,  A61K38/46

CPC分类号： C12N9/16 ,  A61K38/465 ,  C12Y301/06013

摘要： Disclosed is a composition comprising recombinant iduronate-2-sulfatase (IDS). The glycosylation pattern and formylglycine content of the IDS composition are different from those of Elaprase and have superior pharmaceutical efficacy and are safer than the conventional agent and thus can be effectively used for the therapy of Hunter syndrome.

摘要翻译： 公开了包含重组异丙肾上腺素-2-硫酸酯酶（IDS）的组合物。 IDS组合物的糖基化模式和甲酰甘氨酸含量与Elaprase不同，具有优异的药物功效，比常规药物更安全，因此可有效用于Hunter综合征的治疗。

公开(公告)号：US08699241B2

公开(公告)日：2014-04-15

申请号：US13246361

申请日：2011-09-27

申请人： Byoung Woo Ryu ,  Young Woon Choi ,  Seong Wook Choi

发明人： Byoung Woo Ryu ,  Young Woon Choi ,  Seong Wook Choi

IPC分类号： H02M3/335

CPC分类号： H02J9/061 ,  H02M3/33576 ,  H02M2001/0006 ,  H02M2001/0032 ,  Y02B70/16 ,  Y10T307/615

摘要： There is provided a switching mode power supply including: a direct current (DC)/DC converting unit converting a DC power level; an auxiliary power supply unit discharged in a no load mode in which a load is not connected to an output terminal of the DC/DC converting unit; and a controlling unit sensing a change in impedance according to whether or not the load is connected to the output terminal to thereby determine whether or not the switching mode power supply is in the no load mode, and driving a pulse width modulation integrated chip (PWM IC) when a voltage level of the auxiliary power supply unit is at a preset level or less in the no load mode.

摘要翻译： 提供了一种开关模式电源，包括：直流（DC）/ DC转换单元，其转换DC功率电平; 辅助电源单元，其在负载未连接到DC / DC转换单元的输出端子的空载模式下放电; 以及控制单元，根据负载是否连接到输出端子来感测阻抗的变化，从而确定开关模式电源是否处于空载模式，以及驱动脉宽调制集成芯片（PWM IC）当辅助电源单元的电压电平在空载模式下处于预设电平以下时。

公开(公告)号：US08484584B2

公开(公告)日：2013-07-09

申请号：US13281787

申请日：2011-10-26

申请人： Mi-kyeong Lee ,  Seong-woon Choi

发明人： Mi-kyeong Lee ,  Seong-woon Choi

IPC分类号： G06F17/50 ,  G03F1/00 ,  G03C5/00

CPC分类号： G03F1/70

摘要： At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.

摘要翻译： 由于在微电子器件的制造期间由于施加到特征的溶液的表面张力，识别出具有导致由光掩模形成的微电子器件特征崩溃的可能性的至少一个光掩模图案。 然后修改光掩模的图案以减少崩溃的可能性。 可以形成光掩模，并且可以使用光掩模来制造微电子器件。 描述相关方法，系统，设备和计算机程序产品。

公开(公告)号：US20130034750A1

公开(公告)日：2013-02-07

申请号：US13440813

申请日：2012-04-05

申请人： Jong Woon CHOI ,  Dongcheol LEE ,  Eun Pyo HONG

发明人： Jong Woon CHOI ,  Dongcheol LEE ,  Eun Pyo HONG

IPC分类号： H01M2/00 ,  H01M4/82

CPC分类号： H01M2/22 ,  H01M2/0404 ,  H01M2/0473 ,  H01M10/0436 ,  H01M10/052 ,  H01M10/058 ,  H01M10/425 ,  H01M10/4257 ,  H01M2010/4278 ,  H01M2200/00 ,  H01M2220/30 ,  Y02E60/122 ,  Y02P70/54 ,  Y10T29/49108

摘要： Disclosed is a secondary battery pack including an anode terminal and a cathode terminal of a battery cell, and being made of a plate-shaped conductive member, the anode terminal and the cathode terminal being electrically connected to a protection circuit module (PCM), a battery cell having the anode terminal and the cathode terminal formed at one end thereof, the battery cell being provided at the end thereof with a thermally welded surplus portion, and a PCM including a printed circuit board (PCB) having a protection circuit formed thereon, the PCB being provided at one side thereof with a cathode terminal connection portion and an anode terminal connection portion and at the other side thereof with an external input and output terminal connection portion, an external input and output terminal electrically connected to the protection circuit of the PCB via the external input and output terminal connection portion of the PCB.

摘要翻译： 公开了一种二次电池组，其包括电池单元的阳极端子和阴极端子，并且由板状导电构件制成，阳极端子和阴极端子电连接到保护电路模块（PCM）， 在其一端形成有阳极端子和阴极端子的电池单体，电池单元的端部设置有热焊剩余部分，以及包括其上形成有保护电路的印刷电路板（PCB）的PCM， PCB的一侧设置有阴极端子连接部分和阳极端子连接部分，在另一侧设置有外部输入和输出端子连接部分，外部输入和输出端子电连接到 PCB通过PCB的外部输入和输出端子连接部分。

公开(公告)号：US20120256491A1

公开(公告)日：2012-10-11

申请号：US13246361

申请日：2011-09-27

申请人： Byoung Woo RYU ,  Young Woon Choi ,  Seong Wook Choi

发明人： Byoung Woo RYU ,  Young Woon Choi ,  Seong Wook Choi

IPC分类号： H02J9/00

CPC分类号： H02J9/061 ,  H02M3/33576 ,  H02M2001/0006 ,  H02M2001/0032 ,  Y02B70/16 ,  Y10T307/615

摘要： There is provided a switching mode power supply including: a direct current (DC)/DC converting unit converting a DC power level; an auxiliary power supply unit discharged in a no load mode in which a load is not connected to an output terminal of the DC/DC converting unit; and a controlling unit sensing a change in impedance according to whether or not the load is connected to the output terminal to thereby determine whether or not the switching mode power supply is in the no load mode, and driving a pulse width modulation integrated chip (PWM IC) when a voltage level of the auxiliary power supply unit is at a preset level or less in the no load mode.

摘要翻译： 提供了一种开关模式电源，包括：直流（DC）/ DC转换单元，其转换DC功率电平; 辅助电源单元，其在负载未连接到DC / DC转换单元的输出端子的空载模式下放电; 以及控制单元，根据负载是否连接到输出端子来感测阻抗的变化，从而确定开关模式电源是否处于空载模式，以及驱动脉宽调制集成芯片（PWM IC）当辅助电源单元的电压电平在空载模式下处于预设电平以下时。

公开(公告)号：US20120220058A1

公开(公告)日：2012-08-30

申请号：US13406655

申请日：2012-02-28

申请人： Jee-eun JUNG ,  Kyoung-yun Baek ,  Seong-woon Choi

发明人： Jee-eun JUNG ,  Kyoung-yun Baek ,  Seong-woon Choi

IPC分类号： H01L21/66

CPC分类号： G03F7/70125 ,  G03F1/70

摘要： A method of fabricating a semiconductor device includes preparing a layout of the semiconductor device, obtaining contrast of an exposure image of the layout through a simulation under a condition of using a crosspole illumination system, separating the layout into a plurality of sub-layouts based on the contrast of the exposure image, forming a photomask having a mask pattern corresponding to the plurality of sub-layouts, and performing an exposure process using the photomask under an exposure condition of using a dipole illumination system.

摘要翻译： 一种制造半导体器件的方法包括：准备半导体器件的布局，在使用交叉极照明系统的条件下通过仿真获得布局的曝光图像的对比度，将布局分为多个子布局 曝光图像的对比度，形成具有对应于多个子布局的掩模图案的光掩模，以及在使用偶极照明系统的曝光条件下使用光掩模进行曝光处理。

公开(公告)号：US20120210278A1

公开(公告)日：2012-08-16

申请号：US13281787

申请日：2011-10-26

申请人： Mi-kyeong Lee ,  Seong-woon Choi

发明人： Mi-kyeong Lee ,  Seong-woon Choi

IPC分类号： G06F17/50

CPC分类号： G03F1/70

摘要： At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.

摘要翻译： 由于在微电子器件的制造期间由于施加到特征的溶液的表面张力，识别出具有导致由光掩模形成的微电子器件特征崩溃的可能性的至少一个光掩模图案。 然后修改光掩模的图案以减少崩溃的可能性。 可以形成光掩模，并且可以使用光掩模来制造微电子器件。 描述相关方法，系统，设备和计算机程序产品。

公开(公告)号：US20120163184A1

公开(公告)日：2012-06-28

申请号：US13177761

申请日：2011-07-07

申请人： Suk Woon CHOI

发明人： Suk Woon CHOI

IPC分类号： H04W60/00 ,  H04W24/00

CPC分类号： H04L65/1016 ,  H04L65/1053 ,  H04L65/1069 ,  H04L65/1073 ,  H04W8/02 ,  H04W80/04

摘要： In a system to control a VoIP service, a user terminal performs a first registration procedure of a CSCF through a first P-CSCF using a first mobile IP allocated from a wireless LAN, monitors a signal intensity of the wireless LAN while receiving the VoIP service over the wireless LAN, and performs a second registration procedure through a second P-CSCF using a second mobile IP allocated from a wireless packet network upon booting if the signal intensity of the wireless LAN becomes weaker than a reference value. The CSCF sends a VoIP call to the second P-CSCF if the user terminal performs the second registration procedure and the user terminal then receives an incoming VoIP call.

摘要翻译： 在控制VoIP服务的系统中，用户终端使用从无线LAN分配的第一移动IP通过第一P-CSCF执行CSCF的第一注册过程，在接收到VoIP服务的同时监视无线LAN的信号强度 并且如果无线LAN的信号强度变得弱于参考值，则在启动时使用从无线分组网络分配的第二移动IP，通过第二P-CSCF执行第二注册过程。 如果用户终端执行第二注册过程，并且用户终端接收到进入的VoIP呼叫，则CSCF向第二P-CSCF发送VoIP呼叫。

公开(公告)号：US08173358B2

公开(公告)日：2012-05-08

申请号：US12432357

申请日：2009-04-29

申请人： Hyoung-hee Kim ,  Yool Kang ,  Seong-woon Choi ,  Jin-young Yoon

发明人： Hyoung-hee Kim ,  Yool Kang ,  Seong-woon Choi ,  Jin-young Yoon

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40

CPC分类号： H01L21/0273 ,  Y10S430/106 ,  Y10S430/114

摘要： A method of forming fine patterns of a semiconductor device includes forming a plurality of first mask patterns on a substrate such that the plurality of first mask patterns are separated from one another by a space located therebetween, in a direction parallel to a main surface of the substrate, forming a plurality of capping films formed of a first material having a first solubility in a solvent on sidewalls and a top surface of the plurality of first mask patterns. The method further includes forming a second mask layer formed of a second material having a second solubility in the solvent, which is less than the first solubility, so as to fill the space located between the plurality of first mask patterns, and forming a plurality of second mask patterns corresponding to residual portions of the second mask layer which remain in the space located between the plurality of first mask patterns, after removing the plurality of capping films and a portion of the second mask layer using the solvent.

摘要翻译： 一种形成半导体器件的精细图案的方法包括在衬底上形成多个第一掩模图案，使得多个第一掩模图案在平行于所述第一掩模图案的主表面的方向上彼此分开位于其间的空间 形成多个由第一材料形成的封盖膜，该第一材料在溶剂中具有第一溶解性，并且在多个第一掩模图案的侧壁和顶表面上形成。 该方法还包括形成由溶剂中第二溶解度小于第一溶解度的第二材料形成的第二掩模层，以填充位于多个第一掩模图案之间的空间，并形成多个 第二掩模图案对应于残留在位于多个第一掩模图案之间的空间中的第二掩模层的残留部分，在使用溶剂除去多个封盖膜和第二掩模层的一部分之后。

公开(公告)号：US20120070785A1

公开(公告)日：2012-03-22

申请号：US13225832

申请日：2011-09-06

申请人： Han Sup Lee ,  Bong Guk Park ,  Chul-jin Jo ,  Ki Woon Choi

发明人： Han Sup Lee ,  Bong Guk Park ,  Chul-jin Jo ,  Ki Woon Choi

IPC分类号： G03F7/20 ,  C08J7/04 ,  B29D11/00

CPC分类号： G03F7/0005 ,  B29D11/00298 ,  B29D11/00365 ,  C08J7/047 ,  C08J2333/12 ,  C08J2367/02 ,  C08J2369/00 ,  G02B3/0031

摘要： A method of manufacturing a micro lens array, wherein the quality of an image is prevented from being deteriorated as a beam on an off-axis surface reaches a focal plane of a micro lens by forming a shading film for preventing the beam from penetrating through a space between micro lenses of the micro lens array, a micro lens having a high numerical aperture or any shape, such as an aspheric shape, is quickly manufactured at a low cost, and the micro lenses and a mask pattern are easily aligned by forming a mask pattern on a focus region formed by the micro lenses of the micro lens array.

摘要翻译： 一种制造微透镜阵列的方法，其中防止图像的质量随着离轴表面上的光束通过形成遮光膜而到达微透镜的焦平面而劣化，以防止光束穿透 微型透镜阵列的微透镜之间的空间，具有高数值孔径或任何形状（例如非球面形状）的微透镜以低成本快速制造，并且微透镜和掩模图案通过形成 在由微透镜阵列的微透镜形成的聚焦区域上的掩模图案。