METHODS AND APPARATI FOR MAKING THIN SEMI-CONDUCTOR WAFERS WITH LOCALLY CONTROLLED REGIONS THAT ARE RELATIVELY THICKER THAN OTHER REGIONS AND SUCH WAFERS
    2.
    发明申请
    METHODS AND APPARATI FOR MAKING THIN SEMI-CONDUCTOR WAFERS WITH LOCALLY CONTROLLED REGIONS THAT ARE RELATIVELY THICKER THAN OTHER REGIONS AND SUCH WAFERS 审中-公开
    用于制造具有相对于其他区域和其他区域的相对厚度的局部控制区域的薄半导体波导的方法和装置

    公开(公告)号:US20170051429A1

    公开(公告)日:2017-02-23

    申请号:US15306787

    申请日:2015-04-17

    Abstract: Semi-conductor wafers with thin and thicker regions at controlled locations may be for Photovoltaics. The interior may be less than 180 microns or thinner, to 50 microns, with a thicker portion, at 180-250 microns. Thin wafers have higher efficiency. A thicker perimeter provides handling strength. Thicker stripes, landings and islands are for metallization coupling. Wafers may be made directly from a melt upon a template with regions of different heat extraction propensity arranged to correspond to locations of relative thicknesses. Interstitial oxygen is less than 6×1017 atoms/cc, preferably less than 2×1017, total oxygen less than 8.75×1017 atoms/cc, preferably less than 5.25×1017. Thicker regions form adjacent template regions having relatively higher heat extraction propensity; thinner regions adjacent regions with lesser extraction propensity. Thicker template regions have higher extraction propensity. Functional materials upon the template also have differing extraction propensities.

    Abstract translation: 半导体晶片在受控位置具有较薄和较厚的区域可能适用于光伏发电。 内部可以小于180微米或更薄,至50微米,较厚部分为180-250微米。 薄晶圆具有更高的效率。 较厚的周长提供处理强度。 较厚的条纹,着陆和岛屿用于金属化耦合。 晶片可以直接从熔体制成模板,其中不同热提取倾向的区域布置成对应于相对厚度的位置。 间隙氧小于6×1017原子/ cc,优选小于2×1017,总氧低于8.75×1017原子/ cc,优选小于5.25×1017。 更厚的区域形成具有相对更高的热提取倾向的相邻模板区域; 较薄的区域具有较小的提取倾向。 较厚的模板区域具有较高的提取倾向。 模板上的功能材料也具有不同的提取倾向。

    METHOD FOR MAINTAINING CONTAINED VOLUME OF MOLTEN MATERIAL FROM WHICH MATERIAL IS DEPLETED AND REPLENISHED

    公开(公告)号:US20180119309A1

    公开(公告)日:2018-05-03

    申请号:US15566785

    申请日:2016-04-28

    Abstract: A main crucible of molten semiconductor is replenished from a supply crucible maintained such that there are always two phases of solid and liquid semiconductor within the supply crucible. Heat added to melt the solid material results in the solid material changing phase to liquid, but will not result in any significant elevation in temperature of the liquid within the supply crucible. The temperature excursions are advantageously small, being less than that which would cause problems with the formed product. The solid product material acts as a sort of temperature buffer, to maintain the supply liquid temperature automatically and passively at or very near to the phase transition temperature. For silicon, excursions are kept to less than 90° C., and even as small as 50° C. The methods also are useful with germanium. Prior art silicon methods that entirely melt the semiconductor experience excursions exceeding 100° C.

Patent Agency Ranking