公开(公告)号：US20230137026A1

公开(公告)日：2023-05-04

申请号：US17973903

申请日：2022-10-26

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Koei Aida ,  Ryo Miyama ,  Yoshiyuki Kikuchi

IPC: H01J37/32 ,  H01L21/311 ,  H01L21/683 ,  H01L21/02

Abstract: Methods and apparatuses for etching a perimeter of a substrate are disclosed. Exemplary methods and apparatuses can be used to deposit material and selectively etch material at the perimeter of the substrate within the same reaction chamber.

公开(公告)号：US20210384033A1

公开(公告)日：2021-12-09

申请号：US17334797

申请日：2021-05-31

Applicant: ASM IP Holding B.V.

Inventor： Ryo Miyama

IPC: H01L21/263 ,  C23C16/56 ,  C23C4/18

Abstract: Examples of a shower plate include a body part of a plate-like conductor having a plurality of through holes, the body part being provided with a surface treated part on at least a part of a lower surface, the surface treated part having been subjected to surface treatment, thereby causing two or more regions having different emissivities to exist on the lower surface, and a flange surrounding the body part.

公开(公告)号：US11705333B2

公开(公告)日：2023-07-18

申请号：US17323321

申请日：2021-05-18

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Yoshiyuki Kikuchi

IPC: H01L21/033 ,  H01J37/32 ,  C23C16/56 ,  C23C16/26 ,  H01L21/311 ,  H01L21/3105

CPC classification number: H01L21/0337 ,  C23C16/26 ,  C23C16/56 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/0332 ,  H01J2237/332 ,  H01L21/31053 ,  H01L21/31122

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the method or system are disclosed. Exemplary methods include forming a first carbon layer and a second carbon layer, wherein a density and/or other property of the first carbon layer differs from the corresponding property of the second carbon layer.

公开(公告)号：US20230126912A1

公开(公告)日：2023-04-27

申请号：US17971829

申请日：2022-10-24

Applicant: ASM IP Holding B.V.

Inventor： Ryo Miyama

IPC: C23C16/509 ,  H01J37/32 ,  C23C16/458 ,  C23C16/04

Abstract: A bevel mask for use in plasma CVD apparatus for depositing a more uniform film while preventing film peeling at the edges of the wafer. The bevel mask includes a bulk portion and an edge portion. The bulk portion includes an inner beveled surface or face, and the edge portion extends outward from a bottom section of the inner beveled surface to provide a covering for a peripheral portion of the upper surface of a wafer received on the susceptor, which supports the annular-shaped mask such as upon a ring structure on an upper surface of the susceptor.

公开(公告)号：US20210238742A1

公开(公告)日：2021-08-05

申请号：US17166660

申请日：2021-02-03

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Hirotsugu Sugiura ,  Yoshiyuki Kikuchi

IPC: C23C16/455 ,  C23C16/26

Abstract: Methods and systems for forming a structure including carbon material and structures formed using the method or system are disclosed. Exemplary methods include providing an inert gas to the reaction chamber for plasma ignition, providing a carbon precursor to the reaction chamber, forming a plasma within the reaction chamber to form an initially viscous carbon material on a surface of the substrate, wherein the initially viscous carbon material becomes carbon material, and treating the carbon material with activated species to form treated carbon material.

公开(公告)号：US20240150894A1

公开(公告)日：2024-05-09

申请号：US18413533

申请日：2024-01-16

Applicant: ASM IP Holding B.V.

Inventor： Toshiharu Watarai ,  Hiroki Arai ,  Toshio Nakanishi ,  Yoshiyuki Kikuchi ,  Ryo Miyama

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32

CPC classification number: C23C16/4405 ,  C23C16/4412 ,  C23C16/45591 ,  C23C16/50 ,  H01J37/32834 ,  H01J37/32853 ,  H01J37/32862 ,  H01J37/3288

Abstract: Examples of a cleaning method includes supplying a cleaning gas into an exhaust duct that provides an exhaust flow passage of a gas supplied to an area above a susceptor, the exhaust duct having a shape surrounding the susceptor in plan view, and activating the cleaning gas to clean an inside of the exhaust duct.

公开(公告)号：US20220336204A1

公开(公告)日：2022-10-20

申请号：US17720214

申请日：2022-04-13

Applicant: ASM IP Holding B.V.

Inventor： Ryo Miyama ,  Yoshio Susa ,  Yoshiyuki Kikuchi ,  Hirotsugu Sugiura

IPC: H01L21/02 ,  H01J37/32 ,  C23C16/455 ,  C23C16/26 ,  C23C16/52

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the methods or systems are disclosed. Exemplary methods include forming a first carbon layer with an initial first flowability and a second carbon layer with an initial second flowability, wherein first flowability is less than second flowability.

公开(公告)号：US20210366712A1

公开(公告)日：2021-11-25

申请号：US17323321

申请日：2021-05-18

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Yoshiyuki Kikuchi

IPC: H01L21/033 ,  H01J37/32 ,  C23C16/26 ,  C23C16/56

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the method or system are disclosed. Exemplary methods include forming a first carbon layer and a second carbon layer, wherein a density and/or other property of the first carbon layer differs from the corresponding property of the second carbon layer.

公开(公告)号：US20210071296A1

公开(公告)日：2021-03-11

申请号：US17010561

申请日：2020-09-02

Applicant: ASM IP Holding B.V.

Inventor： Toshiharu Watarai ,  Hiroki Arai ,  Toshio Nakanishi ,  Yoshiyuki Kikuchi ,  Ryo Miyama

IPC: C23C16/44 ,  C23C16/50

Abstract: Examples of a cleaning method includes supplying a cleaning gas into an exhaust duct that provides an exhaust flow passage of a gas supplied to an area above a susceptor, the exhaust duct having a shape surrounding the susceptor in plan view, and activating the cleaning gas to clean an inside of the exhaust duct.