公开(公告)号：US20220159817A1

公开(公告)日：2022-05-19

申请号：US17435861

申请日：2020-03-09

Applicant: ASML Netherlands B.V.

Inventor： Abhiram Lakshmi Ganesh Govindaraju ,  David Bessems ,  Sandeep Rai ,  Petrus Adrianus Willems ,  Serkan Kincal ,  Joshua Mark Lukens ,  Jon David Tedrow

IPC: H05G2/00 ,  G03F7/20

Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.

公开(公告)号：US20190155177A1

公开(公告)日：2019-05-23

申请号：US16257578

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： David Bessems ,  Jon David Tedrow ,  Colin Michael Odneal

IPC: G03F7/20

Abstract: A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

公开(公告)号：US11500297B2

公开(公告)日：2022-11-15

申请号：US16257578

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： David Bessems ,  Jon David Tedrow ,  Colin Michael Odneal

IPC: F16L27/00 ,  G03F7/20 ,  H05G2/00

Abstract: A coupling arrangement including a first fitting, a second fitting, and a rotational coupler which when turned presses the first fitting against the second fitting, in which the fittings engage rotationally to inhibit relative rotation of the fittings. For example, one of the fittings may have protrusions and the other fitting may have recesses arranged to receive the protrusions.

公开(公告)号：US10451980B2

公开(公告)日：2019-10-22

申请号：US15490598

申请日：2017-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US10437162B2

公开(公告)日：2019-10-08

申请号：US15711678

申请日：2017-09-21

Applicant: ASML Netherlands B.V.

Inventor： David Bessems ,  Jon David Tedrow ,  Colin Michael Odneal

IPC: G03F7/20

Abstract: A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

公开(公告)号：US11774012B2

公开(公告)日：2023-10-03

申请号：US17270658

申请日：2019-08-12

Applicant: ASML Netherlands B.V.

Inventor： Jon David Tedrow ,  David Bessems ,  Wei-Hsun Chen

IPC: F16L13/02 ,  F16L9/02 ,  H05G2/00

CPC classification number: F16L13/02 ,  F16L9/02 ,  H05G2/006

Abstract: A conduit suitable for use in a high temperature, high pressure environment, the conduit having an elongate portion made of a first refractory metal and a fitting portion made of a second refractory metal attached to an axial end of the elongate portion. The attachment may be made by welding and the second refractory metal may have a greater yield strength than the first refractory metal.

公开(公告)号：US10859919B2

公开(公告)日：2020-12-08

申请号：US16778635

申请日：2020-01-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US09625833B2

公开(公告)日：2017-04-18

申请号：US14739751

申请日：2015-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Mathieus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/68 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US12197140B2

公开(公告)日：2025-01-14

申请号：US17565144

申请日：2021-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/00 ,  H01L21/68 ,  H01L21/687

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US11215933B2

公开(公告)日：2022-01-04

申请号：US16657267

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.