公开(公告)号：US20220342228A1

公开(公告)日：2022-10-27

申请号：US17764057

申请日：2020-09-27

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Irwan Dani SETIJA ,  Arie Jeffrey DEN BOEF ,  Mohamed SWILLAM ,  Arjan Johannes Anton BEUKMAN

IPC: G02B27/48 ,  G02F1/295 ,  G03F7/20

Abstract: A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.

公开(公告)号：US20230273531A1

公开(公告)日：2023-08-31

申请号：US18016225

申请日：2021-06-29

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/706845 ,  G03F7/706849 ,  G03F7/706851 ,  G03F7/70233

Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.

公开(公告)号：US20220268574A1

公开(公告)日：2022-08-25

申请号：US17629001

申请日：2020-06-30

Applicant: ASML Holding N.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Mohamed SWILLAM

IPC: G01B11/27

Abstract: A sensor apparatus includes an illumination system, a detector system, and a processor. The illumination system is con-figured to transmit an illumination beam along an illumination path and includes an adjustable optic. The adjustable optic is configured to transmit the illumination beam toward a diffraction target on a substrate that is disposed adjacent to the illumination system. The transmitting generates a fringe pattern on the diffraction target. A signal beam includes diffraction order sub-beams that are diffracted by the diffraction target. The detector system is configured to collect the signal beam. The processor is configured to measure a char-acteristic of the diffraction target based on the signal beam. The adjustable optic is configured to adjust an angle of incidence of the illumination beam on the diffraction target to adjust a periodicity of the fringe pattern to match a periodicity of the diffraction target.

公开(公告)号：US20240241453A1

公开(公告)日：2024-07-18

申请号：US18562685

申请日：2022-05-09

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM

IPC: G03F7/00

CPC classification number: G03F7/70633 ,  G03F7/70641 ,  G03F7/7085

Abstract: A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.

公开(公告)号：US20240077308A1

公开(公告)日：2024-03-07

申请号：US18260817

申请日：2022-01-04

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX ,  Michael Leo NELSON ,  Muhsin ERALP

IPC: G01B11/27 ,  G03F7/20

CPC classification number: G01B11/272 ,  G03F7/20

Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.

公开(公告)号：US20230213871A1

公开(公告)日：2023-07-06

申请号：US18000087

申请日：2021-05-14

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Filippo ALPEGGIANI ,  Simon Reinald HUISMAN ,  Johannes Jacobus Matheus BASELMANS ,  Haico Victor KOK ,  Mohamed SWILLAM ,  Arjan Johannes Anton BEUKMAN

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/27

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G03F9/7049

Abstract: A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.

公开(公告)号：US20230058714A1

公开(公告)日：2023-02-23

申请号：US17790344

申请日：2020-12-08

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Petrus REIJNDERS ,  Mohamed SWILLAM

IPC: G03F7/20

Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.

公开(公告)号：US20240361703A1

公开(公告)日：2024-10-31

申请号：US18769032

申请日：2024-07-10

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Mohamed SWILLAM ,  Stephen ROUX ,  Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G02B6/122 ,  G02B26/08

CPC classification number: G03F7/70633 ,  G02B6/1225 ,  G02B26/0833

Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

公开(公告)号：US20230266255A1

公开(公告)日：2023-08-24

申请号：US18012801

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Ilse VAN WEPEREN ,  Arjan Johannes Anton BEUKMAN ,  Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G01N21/956

CPC classification number: G01N21/956 ,  G01N2021/95676

Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

公开(公告)号：US20230213868A1

公开(公告)日：2023-07-06

申请号：US18012308

申请日：2021-06-04

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Mohamed SWILLAM ,  Marinus Petrus REIJNDERS

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/7085 ,  G03F7/70275

Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.