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    Apparatus for and method of supplying target material
    2.
    发明授权
    Apparatus for and method of supplying target material 有权
    用于提供目标材料的装置和方法

    公开(公告)号：US09544983B2

    公开(公告)日：2017-01-10

    申请号：US14533813

    申请日：2014-11-05

    Applicant: ASML Netherlands B.V.

    Inventor： Chirag Rajyaguru ,  John M. Algots ,  Tetsuya Ishikawa ,  Peter Baumgart

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  H05G2/008

    Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.

    Abstract translation: 公开了一种EUV光源目标材料处理系统，其包括目标材料分配器和目标材料储存库，其中通过使用感应加热将目标材料储存库中的固体目标材料转化为液体形式的目标材料。

    DROPLET GENERATOR WITH ACTUATOR INDUCED NOZZLE CLEANING
    3.
    发明申请
    DROPLET GENERATOR WITH ACTUATOR INDUCED NOZZLE CLEANING 有权
    具有致动器的喷射发生器诱导喷嘴清洁

    公开(公告)号：US20140346373A1

    公开(公告)日：2014-11-27

    申请号：US14452418

    申请日：2014-08-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Chirag Rajyaguru ,  Peter M. Baumgart ,  Georgiy O. Vaschenko

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.

    Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。

    Method of purifying target material for an EUV light source
    4.
    发明授权
    Method of purifying target material for an EUV light source 有权

    公开(公告)号：US11317501B2

    公开(公告)日：2022-04-26

    申请号：US16572131

    申请日：2019-09-16

    Applicant: ASML Netherlands B.V.

    Inventor： Georgiy Vaschenko ,  Peter Baumgart ,  Chirag Rajyaguru ,  Benjamin Sams ,  Armin Ridinger ,  Janine Kardokus

    IPC: H05G2/00 ,  C22B9/04 ,  F27B17/02 ,  C22B25/08 ,  F27B17/00

    Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.

    Droplet generator with actuator induced nozzle cleaning
    9.
    发明授权
    Droplet generator with actuator induced nozzle cleaning 有权
    液滴发生器带执行器引起喷嘴清洗

    公开(公告)号：US08969840B2

    公开(公告)日：2015-03-03

    申请号：US14452418

    申请日：2014-08-05

    Applicant: ASML Netherlands B.V.

    Inventor： Chirag Rajyaguru ,  Peter M. Baumgart ,  Georgiy O. Vaschenko

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.

    Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。

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