公开(公告)号：US11269262B2

公开(公告)日：2022-03-08

申请号：US17049719

申请日：2019-04-04

申请人： ASML Netherlands B.V.

发明人： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03F7/20

摘要： A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US11169450B2

公开(公告)日：2021-11-09

申请号：US17050264

申请日：2019-03-18

申请人： ASML Netherlands B.V.

发明人： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03F7/20

摘要： The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US10962890B2

公开(公告)日：2021-03-30

申请号：US16959738

申请日：2018-11-29

申请人： ASML Netherlands B.V.

发明人： Wilhelmus Franciscus Johannes Simons ,  Dave Braaksma ,  Hans Butler ,  Hendrikus Herman Marie Cox ,  René Wilhelmus Antonius Hubertus Leenaars ,  Stephan Christiaan Quintus Libourel ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03F7/20

摘要： The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

公开(公告)号：US09977349B2

公开(公告)日：2018-05-22

申请号：US15109427

申请日：2014-12-18

申请人： ASML NETHERLANDS B.V.

发明人： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Ingmar August Kerp ,  Pieter Johannes Gertrudis Meijers ,  Jeroen Pieter Starreveld ,  Derk Ten Hoopen ,  Martinus Van Duijnhoven ,  Edward Hage ,  Evert Hendrik Jan Draaijer ,  Wesley Ooms

IPC分类号： G03F7/20 ,  F16F15/023

CPC分类号： G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

摘要： A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

公开(公告)号：US11762304B2

公开(公告)日：2023-09-19

申请号：US15570934

申请日：2016-03-29

申请人： ASML Netherlands B.V.

发明人： Güneş Nak{dot over (i)}boğlu ,  Maarten Holtrust ,  Martinus Van Duijnhoven ,  Francis Fahrni ,  Frank Johannes Jacobus Van Boxtel ,  Anne Willemijn Bertine Quist ,  Bart Dinand Paarhuis ,  Daan Daniel Johannes Antonius Van Sommeren

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： G03F7/70858 ,  G03F7/709 ,  G03F7/70308 ,  G03F7/70883 ,  G03F7/70891

摘要： A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

申请人： ASML Netherlands B.V.

发明人： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC分类号： G10K11/168 ,  G03F7/20 ,  G10K11/16

摘要： A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.