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公开(公告)号：US12032301B2
公开(公告)日：2024-07-09
申请号：US18090873
申请日：2022-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
IPC: G03F7/00
CPC classification number: G03F7/70708 , G03F7/70691 , G03F7/707 , G03F7/70733
Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.
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公开(公告)号：US09977351B2
公开(公告)日：2018-05-22
申请号：US15649161
申请日：2017-07-13
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09766557B2
公开(公告)日：2017-09-19
申请号：US15438376
申请日：2017-02-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US11994848B2
公开(公告)日：2024-05-28
申请号：US17601503
申请日：2020-03-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Arnaud Hubaux
IPC: G05B19/418
CPC classification number: G05B19/41885 , G05B2219/32335 , G05B2219/45031
Abstract: A method for configuring a semiconductor manufacturing process, the method including: providing an initial prediction model including a plurality of model parameters to one or more remote locations; receiving at least one updated model parameter from the one or more remote locations, the at least one model parameter is updated by training the initial prediction model with local data at the one or more remote locations; determining aggregated model parameters based on the at least one updated model parameter received from the one or more remote locations; and adjusting the initial prediction model based on the aggregated model parameters, the adjusted prediction model being operable to configure the semiconductor manufacturing process.
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公开(公告)号：US20230134837A1
公开(公告)日：2023-05-04
申请号：US18090873
申请日：2022-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
IPC: G03F7/20
Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.
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Patent Agency Ranking
公开(公告)号：US11556063B2
公开(公告)日：2023-01-17
申请号：US16092021
申请日：2017-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
IPC: G03F7/20
Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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公开(公告)号：US09632433B2
公开(公告)日：2017-04-25
申请号：US14439359
申请日：2013-10-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US09372412B2
公开(公告)日：2016-06-21
申请号：US14839663
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Erwin John Van Zwet , Pieter Willem Herman De Jager , Johannes Onvlee , Erik Christiaan Fritz
CPC classification number: G03F7/70366 , G03F7/70275 , G03F7/70391 , G03F7/704 , G03F7/70491 , G03F7/70883
Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.
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公开(公告)号：US09335638B2
公开(公告)日：2016-05-10
申请号：US13973703
申请日：2013-08-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC classification number: G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
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