公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20190339627A1

公开(公告)日：2019-11-07

申请号：US16511867

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20 ,  B05B15/68 ,  B05B15/656 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US20170192359A1

公开(公告)日：2017-07-06

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Niek Elout DE KRUIJF ,  Mircea DUSA ,  Martijn HOUBEN ,  Johannes Gerardus Maria MULDER ,  Thomas POIESZ ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Paul VAN DONGEN ,  Justin Johannes Hermanus GERRITZEN ,  Antonie Hendrik VER WEIJ ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20170045828A1

公开(公告)日：2017-02-16

申请号：US15306676

申请日：2015-03-25

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6875

Abstract: A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

Abstract translation: 一种用于光刻设备的支撑台（WT），所述支撑台被配置为支撑衬底（W）的下表面。 所述支撑台包括：基部表面（22），其被构造成基本上平行于支撑在所述支撑台上的所述基板的下表面;多个凸起（20），突出在所述基座表面上方，所述多个毛刺中的每一个具有 相应的远端和在基底表面上方的第一高度，所述多个毛刺被布置成使得当基底被支撑台支撑时，基底由多个毛刺中的每一个的相应远端支撑，并且 多个在基座表面上突出的细长凸起突起（45），每个细长凸起突起在基面上方具有第二高度，其中第二高度小于第一高度。 基部表面包括多个区域，每个区域中的一些细长凸起突起位于其中。 位于每个区域内的所有细长凸起突起具有基本上相同的伸长方向，使得它们彼此基本平行，从而在细长凸起之间形成基本上平行于细长凸起突起的至少一个气流路径。

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：US20200326635A1

公开(公告)日：2020-10-15

申请号：US16761608

申请日：2018-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20200292947A1

公开(公告)日：2020-09-17

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Satish ACHANTA ,  Jeroen BOUWKNEGT ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US20180231897A1

公开(公告)日：2018-08-16

申请号：US15580806

申请日：2016-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robert DE JONG ,  Martinus Hendrikus Antonius LEENDERS ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Frank Pieter Albert VAN DEN BERKMOTEL

IPC: G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US20180190534A1

公开(公告)日：2018-07-05

申请号：US15580601

申请日：2016-06-01

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ ,  Martijn HOUBEN ,  Abraham Alexander SOETHOUDT

IPC: H01L21/687 ,  H01L21/027 ,  G03F7/20 ,  B23H7/26

CPC classification number: H01L21/6875 ,  B23H7/26 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/0274 ,  H01L21/6831 ,  H01L21/6838

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.