公开(公告)号：US20020048839A1

公开(公告)日：2002-04-25

申请号：US09954861

申请日：2001-09-18

Applicant: AXSUN Technologies, Inc.

Inventor： Michael F. Miller ,  Minh Van Le ,  Christopher C. Cook ,  Dale C. Flanders ,  Steven F. Nagle

IPC: H01L021/00

CPC classification number: B81B3/0083 ,  B81B2201/042 ,  B81B2201/047 ,  B81C1/0038 ,  B81C2201/0159 ,  B81C2201/053 ,  B81C2201/056 ,  G02B26/001

Abstract: A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to null100 nullm, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

Abstract translation: 公开了一种用于在MEMS制造的上下文中通常在光学涂层中发现的类型的介电层图案的工艺。 电介质涂层沉积在器件层上，器件层已经或将被释放，并使用掩模层进行图案化。 在一个实例中，使用掩模层作为保护层来蚀刻涂层。 在另一示例中，示出了剥离过程。 光学MEMS器件中电介质层的光刻图案的主要优点是可以在诸如尺寸，位置和残余材料应力的制造中实现更高水平的稠度。 诸如阴影掩蔽的竞争技术产生较低的质量特征并且难以对准。 此外，根据涂层系统的几何形状，使用荫罩可获得的最小特征尺寸限制在〜100μm，并且它们需要与晶片的表面硬接触，这可能导致损坏和/或微粒污染。

公开(公告)号：US20020072015A1

公开(公告)日：2002-06-13

申请号：US10016797

申请日：2001-12-10

Applicant: AXSUN Technologies, Inc.

Inventor： Michael F. Miller ,  Dale C. Flanders

IPC: G03C005/00 ,  G02B026/08 ,  G02B005/08 ,  B29D011/00

CPC classification number: B81B3/001 ,  G02B26/001 ,  G02B26/02

Abstract: Tabs or stops are integrated into a membrane structure to prevent its snapdown. Features comprising two surfaces separated by a distance equal to the maximum desired range of movement are produced. When the two surfaces contact, the motion of the structure is arrested or greatly diminished by increasing its rigidity. For an electrostatically actuated MEMS structure, these features can be used to limit the range of motion such that pull-in or snapdown is avoided, greatly enhancing the reliability of the device. One key design feature is that the two contacting surfaces are maintained at the same electrical potential avoiding problems associated with electrostatic cavity discharge.

Abstract translation: 标签或止动件集成到膜结构中以防止其卡扣。 产生包括两个表面分开等于最大期望运动范围的距离的特征。 当两个表面接触时，结构的运动通过增加其刚度而被阻止或大大减小。 对于静电驱动的MEMS结构，这些特征可用于限制运动范围，从而避免拉入或跳跃，大大提高了设备​​的可靠性。 一个关键设计特征是两个接触表面保持在相同的电位，避免与静电腔排放相关的问题。

公开(公告)号：US20030108306A1

公开(公告)日：2003-06-12

申请号：US10021765

申请日：2001-12-12

Applicant: AXSUN Technologies, Inc.

Inventor： Peter S. Whitney ,  Jeffrey A. Korn ,  Michael F. Miller ,  Raymond V. Pourmand

IPC: G02B006/42

CPC classification number: G02B6/29362 ,  G02B6/29395 ,  G02B6/4215 ,  G02B6/4251 ,  G02B6/4265 ,  G02B6/4271 ,  G02B6/4285 ,  G02B6/4286

Abstract: In optoelectronic systems, package moisture can affect stress levels in dielectric coatings on MEMS devices. Specifically, as the moisture content in these dielectric coatings changes, there are concomitant changes in the material stress. These changes in material stress can affect the operation of the overall MEMS device. Specifically, in the context of tunable filters, moisture can lead to a drift in the size of the optical resonant cavity over time as changes in material stress affect the MEMS structures. According to the invention, a getter is added to the package to absorb moisture, and thereby stabilize the operation of the optical filter, and specifically prevent uncontrolled drift in the size of its optical cavity.

Abstract translation: 在光电子系统中，封装湿度可以影响MEMS器件上的介电涂层中的应力水平。 具体来说，随着这些电介质涂层中的水分含量发生变化，材料应力随之发生变化。 材料应力的这些变化可能会影响整个MEMS器件的运行。 具体地说，在可调滤波器的上下文中，随着材料应力的变化影响MEMS结构，水分会随着时间的推移导致光学谐振腔的尺寸的漂移。 根据本发明，将吸气剂添加到包装中以吸收水分，从而稳定滤光器的操作，并且特别地防止其光腔的尺寸的不受控制的漂移。