System and method for tilt mirror calibration due to capacitive sensor drift
    2.
    发明申请
    System and method for tilt mirror calibration due to capacitive sensor drift 有权
    由于电容式传感器漂移,用于倾斜镜校准的系统和方法

    公开(公告)号:US20030025982A1

    公开(公告)日:2003-02-06

    申请号:US09919119

    申请日:2001-07-31

    CPC classification number: G02B26/0841

    Abstract: A movable MEMS mirror system with a mirror position detection system, such as a capacitive sensor, is calibrated using a physical stop with a range of movement of the mirror structure. Thus, drift in the position detection system can be compensated without the need for a separate reference signal source as used in conventional systems.

    Abstract translation: 具有反射镜位置检测系统(诸如电容传感器)的可移动的MEMS镜系统使用具有镜面结构的移动范围的物理停止来校准。 因此,可以补偿位置检测系统中的漂移,而不需要在常规系统中使用的单独的参考信号源。

    Fixed wavelength single longitudinal mode coolerless external cavity semiconductor laser system
    3.
    发明申请
    Fixed wavelength single longitudinal mode coolerless external cavity semiconductor laser system 有权
    固定波长单纵模式无冷却器外腔半导体激光系统

    公开(公告)号:US20030016709A1

    公开(公告)日:2003-01-23

    申请号:US09909330

    申请日:2001-07-19

    Inventor: Dale C. Flanders

    Abstract: A fixed wavelength, external cavity semiconductor laser comprises a semiconductor laser gain medium and an intra-cavity filter having a filter function specifying a frequency of operation of the laser. This distinguishes it from distributed feedback Bragg reflector systems in which the wavelength of operation is dictated by the semiconductor Bragg grating, drive current, and temperature. A cavity length modulation system is further provided that modulates an optical length of the cavity to change the spectral locations of longitudinal modes of the cavity relative to the filter function. One important advantage of the present invention is that it can be deployed without a thermoelectric (TE) cooler. Specifically, the intra-cavity filter material in combination with the cavity length controller, allow a mode of cavity to be located at the filter function. Thus, the temperature of the module can fluctuate with ambient temperature or other operating parameters, but the wavelength is held stable with single longitudinal mode operation of the module being guaranteed.

    Abstract translation: 固定波长的外腔半导体激光器包括半导体激光增益介质和具有指定激光器的操作频率的滤波器功能的腔内滤波器。 这与其中工作波长由半导体布拉格光栅,驱动电流和温度决定的分布式反馈布拉格反射器系统区分开来。 还提供了一种腔长调制系统,其调制空腔的光学长度以改变空腔相对于滤光器功能的纵向模式的光谱位置。 本发明的一个重要优点是可以在没有热电(TE)冷却器的情况下部署。 具体地说,腔体内的过滤材料与空腔长度控制器相结合,允许空腔的模式位于过滤器功能。 因此,模块的温度可以随着环境温度或其他操作参数而波动,但是波长保持稳定,模块的单纵模操作得到保证。

    Tilt mirror fabry-perot filter system, fabrication process therefor, and method of operation thereof

    公开(公告)号:US20030011864A1

    公开(公告)日:2003-01-16

    申请号:US09906495

    申请日:2001-07-16

    Inventor: Dale C. Flanders

    Abstract: A tilt mirror Fabry-Perot tunable filter comprises a frame and a first mirror structure. A tether system connects the first mirror structure to this frame. The tether system is designed to enable the tilting of the first mirror structure relative to an optical axis, in addition to translation of the first mirror structure along the optical axis. A second mirror structure is further provided to define an optical cavity in combination with the first mirror structure. At least two drive electrodes are provided for electrostatically tilting and translating the first mirror structure. The resulting MEMS Fabry-Perot tunable filter is capable for hitless tuning. It can be tuned to between bands directly, i.e., without dropping intervening bands.

    Reentrant-walled optical system template and process for optical system fabrication using same
    5.
    发明申请
    Reentrant-walled optical system template and process for optical system fabrication using same 有权
    可重入壁光学系统模板和使用其的光学系统制造工艺

    公开(公告)号:US20020186477A1

    公开(公告)日:2002-12-12

    申请号:US09878800

    申请日:2001-06-11

    CPC classification number: G02B6/423

    Abstract: An optical system assembly technique utilizes a templating system for locating optical components 200 on optical benches 150. Specifically, the template system comprises a template substrate 102 that is placed over the optical bench. The substrate 102 has at least one alignment slot 104 that is formed through the substrate. This alignment slot 104 has an alignment feature 120, against which an optical component 200 is registered. In order to improve the accuracy of the alignment of the optical component on the optical bench, the slot 104 has a reentrant, such as a smooth or step, sidewall 106 extending from the alignment feature 120 into the template substrate 102. This way, there is a single point or near single point of contact between the optical component 200 and the template 102, to thereby improve the placement precision for the optical component on the optical bench 150.

    Abstract translation: 光学系统组装技术利用模板系统来定位光学台架150上的光学组件200.具体地,模板系统包括放置在光学台上的模板衬底102。 衬底102具有通过衬底形成的至少一个对准槽104。 该对准狭槽104具有对准特征120,光学部件200对准该对准特征120。 为了提高光学部件在光学工作台上的对准精度,狭槽104具有从对准特征120延伸到模板衬底102中的凹槽,例如平滑或台阶侧壁106。这样,那里 是光学部件200和模板102之间的单点或近点接触点,从而提高光学部件150上的光学部件的放置精度。

    Stray light insensitive detector system and amplifier
    6.
    发明申请
    Stray light insensitive detector system and amplifier 有权
    杂散光不敏感探测器系统和放大器

    公开(公告)号:US20040100686A1

    公开(公告)日:2004-05-27

    申请号:US10392353

    申请日:2003-03-19

    CPC classification number: H01S5/02216 H01S5/02248 H01S5/02284 H01S5/0683

    Abstract: A detector system for a fiber optic component is insensitive to stray light. Specifically, the invention comprises a detector chip, which converts received light into an electric signal. A baffle substrate is positioned over the detector chip. This baffle substrate has a transmission port through which an optical signal is transmitted to the detector chip. As a result, light that is not directed to be transmitted through the port is blocked by the baffle substrate. In this way, it rejects stray light that may be present in the hermetic package. A detector substrate is provided on which the detector chip is mounted. This detector substrate preferably comprises electrical traces to which the detector chip is electrically connected. The detector substrate can further comprise bond pads for wire bonding to make electrical connections to the electrical traces.

    Abstract translation: 用于光纤部件的检测器系统对杂散光不敏感。 具体地,本发明包括将接收的光转换成电信号的检测器芯片。 挡板基板位于检测器芯片上。 该挡板基板具有传输端口,通过该传输端口将光信号传输到检测器芯片。 结果,不被透射通过端口的光被挡板衬底阻挡。 以这种方式,它拒绝可能存在于密封包装中的杂散光。 设置有检测器芯片安装在其上的检测器基板。 该检测器基板优选地包括检测器芯片电连接到的电迹线。 检测器基板还可以包括用于引线键合的接合焊盘以与电迹线进行电连接。

    Process for integrating dielectric optical coatings into micro-electromechanical devices
    8.
    发明申请
    Process for integrating dielectric optical coatings into micro-electromechanical devices 有权
    将介电光学涂层集成到微机电装置中的工艺

    公开(公告)号:US20020048839A1

    公开(公告)日:2002-04-25

    申请号:US09954861

    申请日:2001-09-18

    Abstract: A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to null100 nullm, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

    Abstract translation: 公开了一种用于在MEMS制造的上下文中通常在光学涂层中发现的类型的介电层图案的工艺。 电介质涂层沉积在器件层上,器件层已经或将被释放,并使用掩模层进行图案化。 在一个实例中,使用掩模层作为保护层来蚀刻涂层。 在另一示例中,示出了剥离过程。 光学MEMS器件中电介质层的光刻图案的主要优点是可以在诸如尺寸,位置和残余材料应力的制造中实现更高水平的稠度。 诸如阴影掩蔽的竞争技术产生较低的质量特征并且难以对准。 此外,根据涂层系统的几何形状,使用荫罩可获得的最小特征尺寸限制在〜100μm,并且它们需要与晶片的表面硬接触,这可能导致损坏和/或微粒污染。

    Process for fabricating MEMS membrane with integral mirror/lens
    9.
    发明申请
    Process for fabricating MEMS membrane with integral mirror/lens 有权
    用于制造具有整体镜/透镜的MEMS膜的工艺

    公开(公告)号:US20040218509A1

    公开(公告)日:2004-11-04

    申请号:US10840814

    申请日:2004-05-08

    Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

    Abstract translation: 对光学膜装置及其制造方法进行说明。 该膜是显着的,因为它包括光学曲面。 在一些实施例中,该弯曲的光学表面是光学凹入的并且例如用高反射(HR)涂层涂覆以形成弯曲的镜。 在其它实施例中,光学表面是光学凸起的并且涂覆有优选抗反射(AR)涂层,用作折射或衍射透镜。

    Interferometric filter wavelength meter and controller
    10.
    发明申请
    Interferometric filter wavelength meter and controller 有权
    干涉滤波器波长计和控制器

    公开(公告)号:US20040022283A1

    公开(公告)日:2004-02-05

    申请号:US10392357

    申请日:2003-03-19

    CPC classification number: H01S5/0687 G01J9/0246 H01S5/0617 H01S5/141

    Abstract: A wavelength measurement system uses birefringent material waveplate, thereby producing a substantially sinusoidal spectral response. As a result, the responses of multiple birefringent filters can be combined to yield a filter system with a periodic frequency response that has an additive wavelength resolution that is spectrally stable. That is, the wavelength measurement system does not have regions where wavelength resolution is degraded. In one implementation, a waveplate system 112 is used, placed between two blocks of birefringent material 110 and 114. A quadrant detector 116 is used to detect the intensities of the resulting four beams.

    Abstract translation: 波长测量系统使用双折射材料波片,从而产生基本上正弦的光谱响应。 结果,可以组合多个双折射滤波器的响应以产生具有频谱稳定的附加波长分辨率的周期性频率响应的滤波器系统。 也就是说,波长测量系统不具有波长分辨率降低的区域。 在一个实现中,使用波片系统112,放置在双折射材料110和114的两个块之间。象限检测器116用于检测所得到的四个光束的强度。

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