公开(公告)号：US20170110287A1

公开(公告)日：2017-04-20

申请号：US14883538

申请日：2015-10-14

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Zhimin WAN ,  Kourosh SAADATMAND ,  Nicholas WHITE

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  H01J37/1471 ,  H01J37/3171 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924

Abstract: Ion implantation systems and processes are disclosed. An exemplary ion implantation system may include an ion source, an extraction manipulator, a magnetic analyzer, and an electrode assembly. The extraction manipulator may be configured to generate an ion beam by extracting ions from the ion source. A cross-section of the generated ion beam may have a long dimension and a short dimension orthogonal to the long dimension of the ion beam. The magnetic analyzer may be configured to focus the ion beam in an x-direction parallel to the short dimension of the ion beam. The electrode assembly may be configured to accelerate or decelerate the ion beam. One or more entrance electrodes of the electrode assembly may define a first opening and the electrode assembly may be positioned relative to the magnetic analyzer such that the ion beam converges in the x-direction as the ion beam enters through the first opening.

公开(公告)号：US20150136967A1

公开(公告)日：2015-05-21

申请号：US14605985

申请日：2015-01-26

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Nicholas WHITE ,  Zhimin WAN ,  Erik COLLART

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

Abstract translation: 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

公开(公告)号：US20160111245A1

公开(公告)日：2016-04-21

申请号：US14519080

申请日：2014-10-20

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Kourosh SAADATMAND ,  Nicholas WHITE

IPC: H01J37/147 ,  H01J37/317 ,  H05H5/04

CPC classification number: H01J37/147 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/1538 ,  H05H7/001 ,  H05H7/12 ,  H05H2007/004 ,  H05H2007/122

Abstract: An electrode assembly for accelerating or decelerating an ion beam is provided. In one example, the electrode assembly may include a pair of exit electrodes adjacent to an exit opening of the electrode assembly. The pair of exit electrodes may be positioned on opposite sides of a first plane aligned with a first dimension of the exit opening. A pair of pierce electrodes may be adjacent to the pair of exit electrodes. The pair of pierce electrodes may be positioned on opposite sides of a second plane aligned with a second dimension of the exit opening. The second dimension of the exit opening may be perpendicular to the first dimension of the exit opening. Each pierce electrode may include an angled surface positioned such that a dimension of the angled surface forms an angle of between 40 and 80 degrees with respect to the second plane.

Abstract translation: 提供了用于加速或减速离子束的电极组件。 在一个示例中，电极组件可以包括与电极组件的出口相邻的一对出口电极。 一对出口电极可以定位在与出口的第一尺寸对准的第一平面的相对侧上。 一对穿孔电极可以与该对出口电极相邻。 一对穿孔电极可以定位在与出口开口的第二尺寸对准的第二平面的相对侧上。 出口的第二尺寸可以垂直于出口的第一尺寸。 每个穿孔电极可以包括成角度的表面，其被定位成使得成角度的表面的尺寸相对于第二平面形成介于40度和80度之间的角度。