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公开(公告)号：US20140160453A1
公开(公告)日：2014-06-12
申请号：US14234982
申请日：2011-12-13
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译： 辐射源包括：喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块。 捕获器包括构造成容纳流体的容器; 驱动器，配置成驱动流体，使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。
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公开(公告)号：US09119280B2
公开(公告)日：2015-08-25
申请号：US14234982
申请日：2011-12-13
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译： 辐射源包括：喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块。 捕获器包括构造成容纳流体的容器; 驱动器，配置成驱动流体，使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。
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公开(公告)号：US09164403B2
公开(公告)日：2015-10-20
申请号：US13512128
申请日：2010-12-08
申请人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
发明人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
CPC分类号： G03F7/70908 , B08B3/08 , G03F7/70033 , G03F7/708 , G03F7/70916 , G03F7/70925
摘要： A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
摘要翻译： 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。
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4.发明申请公开(公告)号：US20120295205A1
公开(公告)日：2012-11-22
申请号：US13512128
申请日：2010-12-08
申请人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
发明人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
CPC分类号： G03F7/70908 , B08B3/08 , G03F7/70033 , G03F7/708 , G03F7/70916 , G03F7/70925
摘要： A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
摘要翻译： 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。
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公开(公告)号：US08755032B2
公开(公告)日：2014-06-17
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US08373846B2
公开(公告)日：2013-02-12
申请号：US12553368
申请日：2009-09-03
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
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公开(公告)号：US08368040B2
公开(公告)日：2013-02-05
申请号：US12832258
申请日：2010-07-08
申请人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.
摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。
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公开(公告)号：US20100110405A1
公开(公告)日：2010-05-06
申请号：US12611269
申请日：2009-11-03
申请人： Erik Roelof LOOPSTRA , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
发明人： Erik Roelof LOOPSTRA , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
CPC分类号： G03F7/70108 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a collector arranged to collect EUV radiation emitted by the plasma. The optics are arranged such that in use the fuel vaporizing and exciting radiation is incident upon more than one side of the fuel droplet at the interaction point.
摘要翻译： 被配置为产生EUV辐射的源包括燃料液滴发生器，其构造成将燃料液滴输送到相互作用点，光学构造成将燃料蒸发和激发辐射输送到相互作用点以产生等离子体;以及收集器，其被布置成收集EUV辐射 由等离子体发射。 光学系统布置成使得在使用中，燃料蒸发和激发的辐射入射在相互作用点处的燃料液滴的多于一侧。
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公开(公告)号：US20100053576A1
公开(公告)日：2010-03-04
申请号：US12553368
申请日：2009-09-03
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
摘要翻译： 辐射源被配置为产生极紫外辐射。 辐射源包括在其中使用中产生等离子体的腔室，以及蒸发表面，该蒸发表面构造成蒸发由等离子体形成的副产物并被发射到蒸发表面的材料。 用于在平版印刷设备的等离子体辐射源中除去或来自等离子体辐射源的副产物材料的方法包括在等离子体中蒸发在使用中发射到该表面的材料。
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10.发明授权Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method 有权光刻设备，EUV辐射发生装置及器件制造方法公开(公告)号：US09110377B2
公开(公告)日：2015-08-18
申请号：US13817792
申请日：2011-08-04
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
CPC分类号： G03F7/70033 , B23K26/0643 , G03F7/70025 , G03F7/70191 , G03F7/7055 , H01S3/0071 , H01S3/2308 , H05G2/001 , H05G2/008
摘要： An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.
摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射脉冲的激光器，以及包括可旋转地安装的反射器和径向定位的反射器的光隔离装置。 可旋转地安装的反射器和激光器是同步的，使得当光隔离装置接收到激光辐射脉冲以允许激光辐射脉冲传递到一个激光辐射脉冲时，可旋转安装的反射器的反射表面与径向定位的反射器光学连通 等离子体形成位置并且通过燃料材料液滴的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光学隔离装置接收从等离子体形成位置反射的辐射时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。
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