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    Imaging of crystalline defects
    1.
    发明授权
    Imaging of crystalline defects 有权

    公开(公告)号：US10347462B2

    公开(公告)日：2019-07-09

    申请号：US15955467

    申请日：2018-04-17

    Applicant: Applied Materials Israel Ltd.

    Inventor： Dror Shemesh ,  Uri Lev ,  Benjamin Colombeau ,  Amir Wachs ,  Kourosh Nafisi

    IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

    Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.

    Iterative defect filtering process
    2.
    发明授权
    Iterative defect filtering process 有权

    公开(公告)号：US10049441B2

    公开(公告)日：2018-08-14

    申请号：US15019894

    申请日：2016-02-09

    Applicant: Applied Materials Israel Ltd.

    Inventor： Saar Shabtay ,  Idan Kaizerman ,  Amir Wachs

    IPC: G06T7/00 ,  G06K9/52 ,  G06K9/68 ,  G06K9/46

    Abstract: A method for classifying defects of a wafer, the method is executed by a computerized system, the method may include obtaining defect candidate information about a group of defect candidates, wherein the defect candidate information comprises values of attributes per each defect candidate of the group; selecting, by a processor of the computerized system, a selected sub-group of defect candidates in response to values of attributes of defect candidates that belong to at least the selected sub-group; classifying defect candidates of the selected sub-group to provide selected sub-group classification results; repeating, until fulfilling a stop condition: selecting an additional selected sub-group of defect candidates in response to (a) values of attributes of defect candidates that belong to at least the additional selected sub-group; and (b) classification results obtained from classifying at least one other selected sub-group; and classifying defect candidates of the additional selected sub-group to provide additional selected sub-group classification results.

    Updating of a recipe for evaluating a manufacturing stage of an electrical circuit
    4.
    发明授权
    Updating of a recipe for evaluating a manufacturing stage of an electrical circuit 有权

    公开(公告)号：US09880550B2

    公开(公告)日：2018-01-30

    申请号：US14667086

    申请日：2015-03-24

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Amir Wachs

    IPC: G05B19/418

    CPC classification number: G05B19/41875 ,  G05B2219/31443 ,  G05B2219/45031 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/22

    Abstract: A computerized system that may include a recipe module and a yield diagnostics module. The yield diagnostics module may be configured to generate evaluation results that are indicative of an outcome of an evaluation process of at least one manufacturing stage of at least one electrical circuit. The evaluation results differ from end of line (EOL) results. The recipe module may be configured to receive EOL results relating to the at least one electrical circuit, to receive the evaluation results relating to the at least one electrical circuit; to correlate the evaluation results and the EOL results to provide correlation results; and respond to the correlation results. The responding to the correlation results may include determining whether to alter a recipe in response to the correlation results and altering the recipe if it is determined to alter the recipe.

    UPDATING OF A RECIPE FOR EVALUATING A MANUFACTURING STAGE OF AN ELECTRICAL CIRCUIT
    5.
    发明申请
    UPDATING OF A RECIPE FOR EVALUATING A MANUFACTURING STAGE OF AN ELECTRICAL CIRCUIT 有权
    用于评估电路制造阶段的收件人的更新

    公开(公告)号：US20160282856A1

    公开(公告)日：2016-09-29

    申请号：US14667086

    申请日：2015-03-24

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Amir Wachs

    IPC: G05B19/418

    CPC classification number: G05B19/41875 ,  G05B2219/31443 ,  G05B2219/45031 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/22

    Abstract: A computerized system that may include a recipe module and a yield diagnostics module. The yield diagnostics module may be configured to generate evaluation results that are indicative of an outcome of an evaluation process of at least one manufacturing stage of at least one electrical circuit. The evaluation results differ from end of line (EOL) results. The recipe module may be configured to receive EOL results relating to the at least one electrical circuit, to receive the evaluation results relating to the at least one electrical circuit; to correlate the evaluation results and the EOL results to provide correlation results; and respond to the correlation results. The responding to the correlation results may include determining whether to alter a recipe in response to the correlation results and altering the recipe if it is determined to alter the recipe.

    Abstract translation: 可以包括配方模块和成品率诊断模块的计算机化系统。 产量诊断模块可以被配置为产生指示至少一个电路的至少一个制造阶段的评估过程的结果的评估结果。 评估结果与行末（EOL）结果不同。 所述配方模块可以被配置为接收与所述至少一个电路相关的EOL结果，以接收与所述至少一个电路相关的评估结果; 将评估结果与EOL结果相关联，提供相关性结果; 并对相关结果做出回应。 对相关结果的响应可以包括如果确定改变配方，则确定是否响应于相关结果改变配方并改变配方。

    ITERATIVE DEFECT FILTERING PROCESS
    7.
    发明申请
    ITERATIVE DEFECT FILTERING PROCESS 审中-公开
    迭代缺陷过滤

    公开(公告)号：US20160163038A1

    公开(公告)日：2016-06-09

    申请号：US15019894

    申请日：2016-02-09

    Applicant: Applied Materials Israel Ltd.

    Inventor： Saar Shabtay ,  Idan Kaizerman ,  Amir Wachs

    IPC: G06T7/00 ,  G06K9/52 ,  G06K9/62

    CPC classification number: G06T7/0004 ,  G06K9/52 ,  G06K9/685 ,  G06K2009/4666 ,  G06T7/0012 ,  G06T2207/10056 ,  G06T2207/20112 ,  G06T2207/30148

    Abstract: A method for classifying defects of a wafer, the method is executed by a computerized system, the method may include obtaining defect candidate information about a group of defect candidates, wherein the defect candidate information comprises values of attributes per each defect candidate of the group; selecting, by a processor of the computerized system, a selected sub-group of defect candidates in response to values of attributes of defect candidates that belong to at least the selected sub-group; classifying defect candidates of the selected sub-group to provide selected sub-group classification results; repeating, until fulfilling a stop condition: selecting an additional selected sub-group of defect candidates in response to (a) values of attributes of defect candidates that belong to at least the additional selected sub-group; and (b) classification results obtained from classifying at least one other selected sub-group; and classifying defect candidates of the additional selected sub-group to provide additional selected sub-group classification results.

    Abstract translation: 一种用于分类晶片缺陷的方法，所述方法由计算机化系统执行，所述方法可以包括获得关于缺陷候选组的缺陷候选信息，其中所述缺陷候选信息包括所述组中每个缺陷候选的属性值; 响应于属于至少所选择的子组的缺陷候选的属性的值，由所述计算机化系统的处理器选择所选择的缺陷候选子组; 对所选子组的缺陷候选进行分类，以提供选定的子组分类结果; 重复，直到完成停止条件：响应于（a）至少属于附加选择的子组的缺陷候选的属性值，选择附加的选择的缺陷候选子组; 和（b）从至少一个其他选择的子组分类获得的分类结果; 并对附加选择的子组的缺陷候选进行分类，以提供附加的选择的子组分类结果。

    Iterative defect filtering process
    8.
    发明授权
    Iterative defect filtering process 有权
    迭代缺陷过滤过程

    公开(公告)号：US09286675B1

    公开(公告)日：2016-03-15

    申请号：US14522543

    申请日：2014-10-23

    Applicant: Applied Materials Israel Ltd.

    Inventor： Saar Shabtay ,  Idan Kaizerman ,  Amir Wachs

    IPC: G06T7/00 ,  G06K9/62

    CPC classification number: G06T7/0004 ,  G06K9/52 ,  G06K9/685 ,  G06K2009/4666 ,  G06T7/0012 ,  G06T2207/10056 ,  G06T2207/20112 ,  G06T2207/30148

    Abstract: A method for classifying defects of a wafer, the method is executed by a computerized system, the method may include obtaining defect candidate information about a group of defect candidates, wherein the defect candidate information comprises values of attributes per each defect candidate of the group; selecting, by a processor of the computerized system, a selected sub-group of defect candidates in response to values of attributes of defect candidates that belong to at least the selected sub-group; classifying defect candidates of the selected sub-group to provide selected sub-group classification results; repeating, until fulfilling a stop condition: selecting an additional selected sub-group of defect candidates in response to (a) values of attributes of defect candidates that belong to at least the additional selected sub-group; and (b) classification results obtained from classifying at least one other selected sub-group; and classifying defect candidates of the additional selected sub-group to provide additional selected sub-group classification results.

    Abstract translation: 一种用于分类晶片缺陷的方法，所述方法由计算机化系统执行，所述方法可以包括获得关于缺陷候选组的缺陷候选信息，其中所述缺陷候选信息包括所述组中每个缺陷候选的属性值; 响应于属于至少所选择的子组的缺陷候选的属性的值，由所述计算机化系统的处理器选择所选择的缺陷候选子组; 对所选子组的缺陷候选进行分类，以提供选定的子组分类结果; 重复，直到完成停止条件：响应于（a）至少属于附加选择的子组的缺陷候选的属性值，选择附加的选择的缺陷候选子组; 和（b）从至少一个其他选择的子组分类获得的分类结果; 并对附加选择的子组的缺陷候选进行分类，以提供附加的选择的子组分类结果。

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