-
公开(公告)号：US07399572B2
公开(公告)日：2008-07-15
申请号：US11445902
申请日：2006-06-02
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line Formulas”end =“lead”→> V > 2 在线公式描述=“在线公式”end =“tail”？>其中Y选自S，O，NR 2 >，（HOCH）p ，每个R 1独立地选自H，烷基，烯基，炔基，烷氧基或卤素， 每个R 2独立地为H，SH，CH 3，C 2 H 5，以及直链或支链 含有硫醇基的C 1 -C 4烷基; 并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数，条件是仅当Y-n为 1到5的整数; p为1〜4的整数，每个R 1如上定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将感光组合物涂布在基材上时有效地抑制残留物的形成，并且将涂覆的基材加工成在其上形成图像。
-
公开(公告)号：US07220520B2
公开(公告)日：2007-05-22
申请号：US11445764
申请日：2006-06-02
CPC分类号： G03F7/023 , G03F7/022 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1–C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (d) at least one photoactive compound is also present in the composition.
摘要翻译： 一种感光性树脂组合物，其包含：（d）至少一种聚苯并恶唑前体聚合物（e）至少一种具有结构VI <β的在线式描述=“在线公式”的化合物结束=“铅”→V > 1 -YV VI <？in-line-formula description =“In-line Formulas”end =“tail”？>其中Y选自S，O，NR < （HOCH）p，并且每个R 1选自H，烷基，烯基，炔基，烷氧基 或卤素，每个R 2选自H，SH，CH 3，C 2 H 5， 和含有硫醇基的直链或支链C 1 -C 4烷基; p是1至4的整数，并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数 条件是仅当Y = n为1至5的整数时m = 0; 并且每个R 1如上定义; 和（f）至少一种溶剂; 其中存在结构VI的化合物的量是当将组合物涂覆在基材上并且基底随后被加工以形成图像时有效抑制残留物形成的量，条件是如果聚苯并恶唑前体聚合物仅包含 的聚苯并恶唑前体聚合物，其在聚合物上不含有光活性部分，则（d）组合物中也存在至少一种光活性化合物。
-
公开(公告)号：US07416830B2
公开(公告)日：2008-08-26
申请号：US10966349
申请日：2005-02-18
申请人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
发明人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
CPC分类号： G03F7/023 , G03F7/022 , Y10T428/24802
摘要： A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
摘要翻译： 一种正性光敏组合物，其包含一种或多种聚苯并恶唑前体聚合物，重氮萘醌光敏化合物，其是含有2至约9个芳族羟基的化合物与5-萘醌二叠氮化物磺酰化合物与4-萘醌二叠氮基磺酰基 化合物和至少一种溶剂，以及使用这种组合物在基材上形成浮雕图案，从而形成涂布的基材。
-
公开(公告)号：US20090004444A1
公开(公告)日：2009-01-01
申请号：US12195702
申请日：2008-08-21
申请人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
发明人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
CPC分类号： G03F7/023 , G03F7/022 , Y10T428/24802
摘要： A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate.
摘要翻译： 含有一种或多种聚苯并恶唑前体聚合物的正性光敏组合物，作为包含2-约9个芳族羟基的化合物与5-萘醌二叠氮化物磺酰化合物和4-萘醌二叠氮基磺酰基的缩合产物的重氮萘醌光敏化合物 化合物和至少一种溶剂，以及使用这些组合物在基材上形成浮雕图案。
-
公开(公告)号：US20080305431A1
公开(公告)日：2008-12-11
申请号：US12136437
申请日：2008-06-10
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2 VI in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line formula”end =“lead”？> V1-Y-V2 VI < 描述=“在线公式”end =“tail”？>其中Y，V1和V2中的每一个在说明书中定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将光敏组合物涂覆在基材上并且涂覆的基材被加工以在其上形成图像时有效抑制残留物形成。
-
公开(公告)号：US07803510B2
公开(公告)日：2010-09-28
申请号：US11500251
申请日：2006-08-07
IPC分类号： G03F7/30
CPC分类号： G03F7/0233 , G03F7/023 , G03F7/0392 , G03F7/0751
摘要： A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
摘要翻译： 一种耐热正性感光性PBO前体组合物，其包含：（a）至少一种聚苯并恶唑前体聚合物; （b）至少一种增塑剂化合物; （c）至少一种溶剂; 其中存在于组合物中的增塑剂的量是有效减少基材上涂覆膜中的成像和固化特征的侧壁角度的量，以防止由于成像特征的陡峭角度导致的随后的基板金属化中的应力失效， 并且条件是如果聚苯并恶唑前体聚合物仅由聚合物上不含光活性部分的聚苯并恶唑前体聚合物组成，则（d）组合物中也存在至少一种光活性化合物。
-
公开(公告)号：US07407731B2
公开(公告)日：2008-08-05
申请号：US11386471
申请日：2006-03-22
CPC分类号： G03F7/023 , G03F7/0046 , G03F7/022 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/039 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl or cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring; and (c) at least one solvent; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the composition is coated on a substrate and the coated substrate is subsequently processed to form an image on the substrate, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety in the polymer, then (d) at least one photoactive compound is also present in the composition. The present invention also concerns a process for forming a relief pattern and electronic parts using the composition.
摘要翻译： 一种光敏树脂组合物，其包含：（a）至少一种聚苯并恶唑前体聚合物; （b）至少一种具有结构VI的化合物，其中V是CH或N，Y是O或NR 3，其中R 3是H，CH 3， 或/或C 2 H 5，R 1和R 2各自独立地为H，C 1和R 2'稠合以产生取代或未取代的苯环; 和（c）至少一种溶剂; 其中组合物中存在的结构VI化合物的量有效地抑制当组合物涂覆在基材上时残留物形成，并且随后处理涂覆的基材以在基材上形成图像，条件是如果 聚苯并恶唑前体聚合物仅由在聚合物中不含光活性部分的聚苯并恶唑前体聚合物组成，则（d）组合物中也存在至少一种光活性化合物。 本发明还涉及使用该组合物形成浮雕图案和电子部件的方法。
-
公开(公告)号：US07129011B2
公开(公告)日：2006-10-31
申请号：US10860783
申请日：2004-06-03
申请人： Ilya Rushkin , Ahmad A. Naiini , Richard Hopla , Pamela J. Waterson , William D. Weber , David B. Powell
发明人： Ilya Rushkin , Ahmad A. Naiini , Richard Hopla , Pamela J. Waterson , William D. Weber , David B. Powell
CPC分类号： G03F7/038 , G03F7/0382 , G03F7/0751 , Y10S430/106
摘要： A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that may contain silicon; Ar3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is Ar1 (OH)2 or Ar2; G is a monovalent organic group a carbonyl, carbonyloxy or sulfonyl group; (b) one or more photo-active compounds which release acid upon irradiation (PAGs); (c) one or more latent crosslinkers each of which contains at least two ˜N—(CH2OR)n units (n=1 or 2, wherein R is a linear or branched C1–C8 alkyl group); (d) at least one solvent, and (e) at least one dissolution rate modifier, with the proviso that when the latent crosslinker is highly reactive, the dissolution rate modifier does not contain carboxylic acid groups.
摘要翻译： 一种耐热负性光敏组合物，其包含（a）一种或多种聚苯并恶唑前体聚合物（I）：其中x为约10至约1000的整数，y为0至约900的整数，（x + y）为 约少于1000; Ar 1是四价芳族基团，四价杂环基团或其混合物; Ar 2是可以含有硅的二价芳族，二价杂环，二价脂环族或二价脂族基团; Ar 3是二价芳族基团，二价脂族基团，二价杂环基团或其混合物; Ar 4是Ar 1（OH）2或Ar 2; G是羰基，羰氧基或磺酰基的单价有机基团; （b）一种或多种在照射时释放酸的光活性化合物（PAG）; （c）一种或多种潜在交联剂，其各自含有至少两个N（CH 2）2或N 2单元（n = 1或2，其中R为 直链或支链C 1 -C 8烷基）; （d）至少一种溶剂，和（e）至少一种溶解速率改性剂，条件是当潜在交联剂具有高反应性时，溶解速率改性剂不含羧酸基团。
-
公开(公告)号：US09519216B2
公开(公告)日：2016-12-13
申请号：US12363492
申请日：2009-01-30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/40 , Y10T428/265
摘要： The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.
摘要翻译： 本公开涉及包含至少一种聚苯并恶唑前体聚合物，至少一种光致酸产生剂和至少一种碱性化合物的组合物。 还公开了与这些组合物相关的制品，膜和方法。
-
公开(公告)号：US06929891B2
公开(公告)日：2005-08-16
申请号：US10795577
申请日：2004-03-08
CPC分类号： C08G73/22 , C08L79/00 , G03F7/0382 , G03F7/0387 , G03F7/0751 , Y10S430/107
摘要： A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is selected from the group consisting of a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is selected from the group consisting a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, a divalent aliphatic group that may contain silicon, or mixtures thereof; Ar3 is selected from the group consisting a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is selected from the group consisting Ar1 (OH)2 or Ar2; G is an organic group selected from the group consisting groups having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH group of the polymer; (b) one or more photo-active compounds which release acid upon irradiation (PAGs); (c) a latent crosslinker which contains at least two ˜N—(CH2OR)n units wherein n=1 or 2 and R is a linear or branched C1-C8 alkyl group, with the proviso that when a glycoluril is employed as the latent crosslinker, the G group in the polybenzoxazole precursor polymer is produced from the reaction of a cyclic anhydride; and (d) at least one solvent that is not NMP.
摘要翻译： 一种耐热负性光敏组合物，其包含（a）一种或多种聚苯并恶唑前体聚合物（I）：其中x为约10至约1000的整数，y为0至约900的整数，（x + y）为 约少于1000; Ar 1选自四价芳族基团，四价杂环基团或其混合物; Ar 2选自二价芳族，二价杂环，二价脂环族，可含硅的二价脂族基团，或其混合物; Ar 3选自二价芳族基团，二价脂族基团，二价杂环基团或其混合物; Ar 4选自Ar 1（OH）2 2或Ar 2 O 2; G是选自具有直接与聚合物的末端NH基团连接的羰基，羰氧基或磺酰基的基团的有机基团; （b）一种或多种在照射时释放酸的光活性化合物（PAG）; （c）潜在交联剂，其含有n = 1或2的至少两个N-（CH 2）2或N 2单元，R是直链或支链C 1 -C 6烷基， SUB 1 -C 8烷基，条件是当使用甘脲作为潜在交联剂时，聚苯并恶唑前体聚合物中的G基团是由环状 酐; 和（d）至少一种不是NMP的溶剂。
-
-
-
-
-
-
-
-
-
搜索结果
21 条记录 (耗时 0.027 秒)
