公开(公告)号：US09899183B1

公开(公告)日：2018-02-20

申请号：US15222096

申请日：2016-07-28

Applicant: GLOBALFOUNDRIES INC.

Inventor： Lei Zhuang ,  Timothy A. Brunner

IPC: G03F9/00 ,  G03B27/62 ,  G03B27/42 ,  H01J37/26

CPC classification number: H01J37/26

Abstract: Various embodiments include measurement structures and methods for measuring integrated circuit (IC) images. In some cases, a measurement structure for use in measuring an image of an IC, includes: a first section having a positive shift spacing pattern; a second section, on an opposite side of the measurement structure, having a negative shift spacing pattern; and a third section having a reference spacing pattern for calibrating a measurement from at least one of the first section or the second section.

公开(公告)号：US20170200614A1

公开(公告)日：2017-07-13

申请号：US14992391

申请日：2016-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Sunit S. Mahajan ,  Parul Dhagat ,  Anne C. Friedman ,  Timothy A. Brunner ,  Shahrukh A. Khan

IPC: H01L21/308 ,  H01L29/06 ,  H01L27/088 ,  H01L21/306 ,  H01L21/8234

CPC classification number: H01L21/3081 ,  H01L21/30604 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/0657

Abstract: A method for preventing buckling in a substrate using a tensile hard mask is provided. The method may include forming a mask over a substrate, the hard mask including a first area having a pattern for forming a plurality of openings and an adjacent second area free of openings, and the hard mask includes a tensile stress therein. The hard mask may be used to form the plurality of openings in the substrate. Partially eroding the hard mask leaves the substrate with the plurality of openings therein and a substantially planar surface, having diminished buckling.

公开(公告)号：US10552569B2

公开(公告)日：2020-02-04

申请号：US15868364

申请日：2018-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Christina Turley ,  Jed H. Rankin ,  Xuemei Chen ,  Allen H. Gabor ,  Timothy A. Brunner

IPC: G06F17/50 ,  G03F1/22 ,  G03F1/24 ,  G03F1/84

Abstract: The present disclosure generally relates to semiconductor structures and, more particularly, to mask structures and methods of manufacture. The method includes determining a plane through a frontside surface and a backside surface of a mask, each plane representing a flatness of the frontside surface and the backside surface, respectively; subtracting, using at least one computing device, a difference between the plane of the frontside surface and the plane of the backside surface to find a thickness variation; generating, using the at least one computing device, a fitting to fit the thickness variation; and subtracting, using the at least one computing device, the fitting from the thickness variation to generate a residual structure for collecting a residual flatness measurement.

公开(公告)号：US20180033590A1

公开(公告)日：2018-02-01

申请号：US15222096

申请日：2016-07-28

Applicant: GLOBALFOUNDRIES INC.

Inventor： Lei Zhuang ,  Timothy A. Brunner

IPC: H01J37/26

CPC classification number: H01J37/26

Abstract: Various embodiments include measurement structures and methods for measuring integrated circuit (IC) images. In some cases, a measurement structure for use in measuring an image of an IC, includes: a first section having a positive shift spacing pattern; a second section, on an opposite side of the measurement structure, having a negative shift spacing pattern; and a third section having a reference spacing pattern for calibrating a measurement from at least one of the first section or the second section.

公开(公告)号：US09741581B2

公开(公告)日：2017-08-22

申请号：US14992391

申请日：2016-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Sunit S. Mahajan ,  Parul Dhagat ,  Anne C. Friedman ,  Timothy A. Brunner ,  Shahrukh A. Khan

IPC: H01L29/06 ,  H01L21/308 ,  H01L21/306 ,  H01L21/8234 ,  H01L27/088

CPC classification number: H01L21/3081 ,  H01L21/30604 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/0657

Abstract: A method for preventing buckling in a substrate using a tensile hard mask is provided. The method may include forming a mask over a substrate, the hard mask including a first area having a pattern for forming a plurality of openings and an adjacent second area free of openings, and the hard mask includes a tensile stress therein. The hard mask may be used to form the plurality of openings in the substrate. Partially eroding the hard mask leaves the substrate with the plurality of openings therein and a substantially planar surface, having diminished buckling.

公开(公告)号：US09411249B2

公开(公告)日：2016-08-09

申请号：US14033593

申请日：2013-09-23

Applicant: GLOBALFOUNDRIES INC.

Inventor： Christopher P. Ausschnitt ,  Timothy A. Brunner

IPC: G01B9/00 ,  G03B27/32 ,  G03B27/52 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F7/70625 ,  G03F7/70683 ,  G03F9/7026

Abstract: A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose monitors generate edges on a photoresist layer such that the edges move in opposite directions as a function of a dose offset. Each complementary set of unit focus monitors generates edges on the photoresist layer such that the edges move in opposite directions as a function of a focus offset. The dose and focus monitor structure generates self-compensating differential measurements of the dose offset and the focus offset such that the dose offset measurement and the focus offset measurement are independent of each other.

Abstract translation: 剂量和聚焦监测器结构包括至少一个互补的单位剂量监测器组和至少一个互补的单位焦点监测器组。 每个补充的单位剂量监测器组在光致抗蚀剂层上产生边缘，使得边缘作为剂量偏移的函数沿相反方向移动。 每个互补的单元聚焦监视器组在光致抗蚀剂层上产生边缘，使得边缘作为聚焦偏移的函数沿相反方向移动。 剂量和聚焦监测结构产生剂量偏移和聚焦偏移的自补偿差分测量，使得剂量偏移测量和聚焦偏移测量彼此独立。