SEMICONDUCTOR DEVICE STRUCTURE FOR OHMIC CONTACT AND METHOD FOR FABRICATING THE SAME
    1.
    发明申请
    SEMICONDUCTOR DEVICE STRUCTURE FOR OHMIC CONTACT AND METHOD FOR FABRICATING THE SAME 审中-公开
    用于OHMIC接触的半导体器件结构及其制造方法

    公开(公告)号:US20140183557A1

    公开(公告)日:2014-07-03

    申请号:US14092098

    申请日:2013-11-27

    CPC classification number: H01L29/45 H01L21/0485 H01L29/1608

    Abstract: A semiconductor device structure for an ohmic contact is provided, including a silicon carbide substrate and an ohmic contact layer disposed on the silicon carbide substrate. A carbon layer is disposed on the ohmic contact layer. An anti-diffusion layer is disposed on the carbon layer, and a pad layer is disposed on the anti-diffusion layer. The anti-diffusion layer is made of any one of tungsten (W), titanium (Ti), titanium nitride (TiN), tantalum (Ta), and tantalum nitride (TaN).

    Abstract translation: 提供了一种用于欧姆接触的半导体器件结构,包括碳化硅衬底和设置在碳化硅衬底上的欧姆接触层。 碳层设置在欧姆接触层上。 在碳层上设置防扩散层,在反扩散层上设置衬垫层。 抗扩散层由钨(W),钛(Ti),氮化钛(TiN),钽(Ta)和氮化钽(TaN)中的任一种制成。

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