Method of annealing polycrystalline silicon using solid-state laser and devices built thereon
    10.
    发明申请
    Method of annealing polycrystalline silicon using solid-state laser and devices built thereon 有权
    使用固态激光器退火多晶硅的方法和其上构建的器件

    公开(公告)号:US20060148217A1

    公开(公告)日:2006-07-06

    申请号:US11292257

    申请日:2005-12-01

    IPC分类号: H01L21/20

    摘要: The invention provides a method of forming polycrystalline silicon comprising the steps of: forming a layer of amorphous silicon, forming a layer of metal or metal-containing compound on the layer of amorphous silicon, annealing the layer of amorphous silicon and said layer of metal to form a polycrystalline silicon layer, and irradiating the polycrystalline silicon layer with two different harmonics of a pulsed laser. The pulsed laser is preferably a solid-state laser such as a Nd-Yag laser. One harmonic is chosen such that it is preferentially absorbed by defects in the polycrystalline silicon layer, the other harmonic is absorbed by the bulk polycrystalline silicon.

    摘要翻译: 本发明提供一种形成多晶硅的方法,包括以下步骤:形成非晶硅层,在非晶硅层上形成金属或含金属化合物层,将非晶硅层和所述金属层退火到 形成多晶硅层,并用脉冲激光的两个不同谐波照射多晶硅层。 脉冲激光器优选为诸如Nd-Yag激光器的固态激光器。 选择一个谐波使得其被多晶硅层中的缺陷优先吸收,另一个谐波被体多晶硅吸收。