公开(公告)号：US20240175896A1

公开(公告)日：2024-05-30

申请号：US18524772

申请日：2023-11-30

Applicant: IMEC VZW

Inventor： Thomas Hantschel ,  XiuMei Xu

IPC: G01Q70/16 ,  G01Q70/06

CPC classification number: G01Q70/16 ,  G01Q70/06

Abstract: One embodiment of the present disclosure is related to a method for producing a substrate comprising a plurality of tips suitable to be used in scanning probe microscopy (SPM), wherein as a first step, a substrate is produced or provided comprising a plurality of nano-sized tips, preferably arranged in a regular array and spaced apart by nano-sized interspacings. A mask is applied to this substrate, comprising multiple mask portions, wherein each mask portion covers at least one tip, whereafter the substrate is subjected to an etching process relative to the mask portions. After the removal of the mask portions, the method results in the creation of a substrate comprising multiple pedestals having each at least one nanotip on the upper surface thereof and spaced apart at a distance suitable for performing an SPM measurement of a given type.

公开(公告)号：US20250052703A1

公开(公告)日：2025-02-13

申请号：US18799185

申请日：2024-08-09

Applicant: IMEC VZW

Inventor： XiuMei Xu ,  Gian Francesco Lorusso

IPC: G01N23/2251 ,  B82Y35/00

Abstract: Example embodiments relate to methods for evaluating the bending stiffness of high aspect ratio nanosized structures. One example method for evaluating a bending stiffness of high aspect ratio nanosized structures arranged in a plurality of test patterns produced by lithography and etching in a respective plurality of different areas of a semiconductor substrate, where each test pattern includes a regular array of the high aspect ratio nanosized structures, includes scanning the regular arrays in the plurality of test patterns by an electron beam produced according to a same set of beam conditions for each array. The method also includes deriving images of the regular arrays in the respective test patterns by electron beam microscopy. Additionally, the method includes determining from each of the images an e-beam induced collapse rate representative of a percentage of structures in each array that have collapsed under an influence of the electron beam scanning.

公开(公告)号：US10433542B2

公开(公告)日：2019-10-08

申请号：US15871190

申请日：2018-01-15

Applicant: IMEC VZW

Inventor： XiuMei Xu

IPC: A01N25/10 ,  C08L53/00 ,  B82B3/00 ,  A01N25/34 ,  H01L21/3065 ,  B81C1/00 ,  B82Y30/00 ,  B82Y40/00 ,  G01N23/2251

Abstract: Embodiments described herein include an antimicrobial substrate surface. An example embodiment includes a structure that includes an antimicrobial surface on a substrate. The antimicrobial surface includes a plurality of nanostructures. Each nanostructure includes a nanopillar on the substrate. The nanopillar has a height. Each nanostructure also includes a head covering a distal end and at least part of the height of the nanopillar.

公开(公告)号：US20180213772A1

公开(公告)日：2018-08-02

申请号：US15871190

申请日：2018-01-15

Applicant: IMEC VZW

Inventor： XiuMei Xu

IPC: A01N25/10 ,  C08L53/00

CPC classification number: A01N25/10 ,  A01N25/34 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C1/00206 ,  B82B3/0014 ,  B82Y30/00 ,  B82Y40/00 ,  C08L53/00 ,  G01N23/2251 ,  H01L21/3065 ,  A01N59/00 ,  A01N59/06 ,  A01N59/16 ,  A01N59/20

Abstract: Embodiments described herein include an antimicrobial substrate surface. An example embodiment includes a structure that includes an antimicrobial surface on a substrate. The antimicrobial surface includes a plurality of nanostructures. Each nanostructure includes a nanopillar on the substrate. The nanopillar has a height. Each nanostructure also includes a head covering a distal end and at least part of the height of the nanopillar.

公开(公告)号：US20180043283A1

公开(公告)日：2018-02-15

申请号：US15674438

申请日：2017-08-10

Applicant: IMEC VZW

Inventor： Zheng Tao ,  Boon Teik Chan ,  XiuMei Xu ,  Khashayar Babaei Gavan ,  Efrain Altamirano Sanchez

IPC: B01D15/10 ,  B01D53/04

CPC classification number: B01D15/10 ,  B01D53/0407 ,  B01D63/14 ,  B01L3/502753 ,  B01L2300/0896 ,  B81B2201/058 ,  B81B2201/10 ,  B81B2203/0315 ,  B81B2203/0338 ,  B81B2203/0346 ,  B81B2203/0384 ,  B81C1/00119 ,  C12M1/123 ,  C12M33/14

Abstract: A method for producing a structure including, on a main surface of a substrate, at least one elongated cavity having openings at opposing ends. The method includes providing a substrate having a main surface. On the main surface, a first pair of features are formed that protrude perpendicularly from the main surface. The features have elongated sidewalls and a top surface, are parallel to one another, are separated by a gap having a width s1 and a bottom area, and have a width w1 and a height h1. At least the main surface of the substrate and the first pair of features are brought in contact with a liquid, suitable for making a contact angle of less than 90° with the material of the elongated sidewalls and subsequently the substrate is dried.