公开(公告)号：US20160178351A1

公开(公告)日：2016-06-23

申请号：US14949444

申请日：2015-11-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran AMIT ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G06F17/50 ,  G01B11/27

CPC classification number: G01B11/06 ,  G01B11/272 ,  G01B2210/56 ,  G01B2290/70 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  G06F17/5072 ,  G06F17/5081 ,  H01L22/30

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

Abstract translation: 提供了目标，目标元素和目标设计方法，其包括将目标结构设计为具有高于特定对比度阈值的高对比度至其偏振光背景，同时具有低于特定对比度阈值至其非极化背景下的特定对比度阈值的低对比度 光。 目标可能在设备特征尺度上具有细节，并且与设备设计规则兼容，并且当用偏振照明测量时保持光学对比度，并且因此被有效地用作计量目标。 同样提供了设计变型和相应的测量光学系统。

公开(公告)号：US20150268551A1

公开(公告)日：2015-09-24

申请号：US14734460

申请日：2015-06-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Nuriel AMIR

IPC: G03F1/38 ,  G06F17/50 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F7/20 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5068 ,  Y10T428/24802

Abstract: Methods of designing resist layers to enhance production accuracy, as well as respective layers, design files and metrology targets are disclosed. Continuous or uniform feature(s) adjacent to segmented feature(s) having a pitch and a critical dimension (CD), are configured by design to be segmented upon exposure at a same pitch and a smaller CD than the segmented feature(s), to yield respective unsegmented continuous feature(s) upon development of the exposed resist. The disclosed approach allows producing imaging and scatterometry targets which are compatible with device design rules and with optical constraints of the exposure system, without loss of contrast of the produced targets. The methods may be fine-tuned according to the specific characteristics of lithography tools which are used in the production.

Abstract translation: 公开了设计抗蚀剂层以提高生产精度的方法，以及各层，设计文件和度量目标。 通过设计来配置与具有间距和临界尺寸（CD）的分段特征相邻的连续或均匀特征，以相同间距曝光并且比分割的特征更小的CD进行分段， 以在曝光的抗蚀剂显影时产生相应的未分段的连续特征。 所公开的方法允许产生与设备设计规则和曝光系统的光学约束兼容的成像和散射目标，而不会损失所产生的目标的对比度。 这些方法可以根据生产中使用的光刻工具的具体特性进行微调。

公开(公告)号：US20160179017A1

公开(公告)日：2016-06-23

申请号：US15057723

申请日：2016-03-01

Applicant: KLA-TENCOR CORPORATION

Inventor： Raviv YOHANAN ,  Eran AMIT ,  Mark GHINOVKER ,  Tal ITZKOVICH ,  Nuriel AMIR

IPC: G03F7/20 ,  G06F17/50 ,  G02B27/42

Abstract: Imaging metrology targets and methods are provided, which combine one-dimensional (1D) elements designed to provide 1D imaging metrology signals along at least two measurement directions and two-dimensional (2D) elements designed to provide at least one 2D imaging metrology overlay signal. The target area of the 1D elements may enclose the 2D elements or the target areas of the 1D and 2D elements may be partially or fully congruent. The compound targets are small, possible multilayered, and may be designed to be process compatible (e.g., by segmentation of the elements, interspaces between elements and element backgrounds) and possibly be produced in die. 2D elements may be designed to periodic to provide additional one dimensional metrology signals.

Abstract translation: 提供成像测量目标和方法，其组合一维（1D）元件，其被设计用于沿着至少两个测量方向提供1D成像测量信号，以及设计成提供至少一个2D成像测量覆盖信号的二维（2D）元件。 1D元件的目标区域可以包围2D元素，或者1D和2D元素的目标区域可以是部分或完全一致的。 复合靶是小的，可能的多层，并且可以被设计为与工艺相容（例如，通过元件的分割，元件和元件背景之间的间隙）并且可能在裸片中产生。 2D元件可被设计成周期性地提供额外的一维计量信号。

公开(公告)号：US20150242558A1

公开(公告)日：2015-08-27

申请号：US14710201

申请日：2015-05-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran AMIT ,  Raviv YOHANAN ,  Tal ITZKOVICH ,  Nuriel AMIR ,  Roie VOLKOVICH ,  Dongsub CHOI

IPC: G06F17/50 ,  H01L21/311 ,  H01L21/3105

CPC classification number: G06F17/5072 ,  G01N21/93 ,  G01N21/956 ,  G03F7/0002 ,  H01L21/3105 ,  H01L21/31058 ,  H01L21/31138 ,  Y10T428/24802

Abstract: Target designs methods and targets are provided, in which at least some of the differentiation between target elements and their background is carried out by segmenting either of them. Directed self-assembly (DSA) processes are used to generate fine segmentation, and various characteristics of the polymer lines and their guiding lines are used to differentiate target elements from their background. Target designs and design principles are disclosed in relation to the DSA process, as well as optimization of the DSA process to yield high metrology measurement accuracy in face of production inaccuracies. Furthermore, designs and methods are provided for enhancing and using ordered regions of a DSA-produced polymer surface as target elements and as hard masks for production processes. The targets and methods may be configured to enable metrology measurements using polarized light to distinguish target elements or DSA features.

Abstract translation: 提供了目标设计方法和目标，其中目标元素与其背景之间的至少一些区分通过分割它们之一进行。 定向自组装（DSA）过程用于生成细分，聚合物线及其引导线的各种特征用于区分目标元素与其背景。 关于DSA过程披露了目标设计和设计原理，以及在生产不准确的情况下优化DSA过程以产生高计量测量精度。 此外，提供了用于增强和使用DSA生产的聚合物表面的有序区域作为目标元素的设计和方法，以及用于生产过程的硬掩模。 目标和方法可以被配置为使得能够使用偏振光进行度量测量来区分目标元素或DSA特征。

公开(公告)号：US20150153268A1

公开(公告)日：2015-06-04

申请号：US14620992

申请日：2015-02-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Nuriel AMIR

IPC: G01N21/01 ,  G06F17/50 ,  G01N21/95

CPC classification number: G01N21/01 ,  G01N21/9501 ,  G01N2201/02 ,  G01N2201/12 ,  G03F7/70616 ,  G06F17/5072 ,  G06F17/5081 ,  Y10T428/2457

Abstract: Multi-layered targets, design files and design and production methods thereof are provided. The multi-layered targets comprise process layers arranged to have parallel segmentation features at specified regions, and target layer comprising target elements which are perpendicular to the parallel segmentation features of the process layers at the specified regions.

Abstract translation: 提供了多层目标，设计文件及其设计和制作方法。 多层目标包括布置成在特定区域具有平行分割特征的处理层，目标层包括与指定区域处理层的平行分割特征垂直的目标元素。

公开(公告)号：US20200158492A1

公开(公告)日：2020-05-21

申请号：US16665759

申请日：2019-10-28

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/956 ,  G01N21/95 ,  G06F30/398 ,  G06F30/392

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US20150301514A1

公开(公告)日：2015-10-22

申请号：US14755758

申请日：2015-06-30

Applicant: KLA-TENCOR CORPORATION

Inventor： Roie VOLKOVICH ,  Eran AMIT ,  Nuriel AMIR ,  Michael E. ADEL

IPC: G05B19/048 ,  H01L21/66

CPC classification number: G05B19/048 ,  G03F7/0002 ,  G03F7/70625 ,  G05B2219/33285 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and metrology tool modules embodying the methods are provided. Methods comprise measuring characteristics of intermediate features such as guiding lines in a directed self-assembly (DSA) process, deriving exposure parameters from the measured characteristics; and adjusting production parameters for producing consecutive target features according to the derived exposure parameters. The methods and modules enhance the accuracy of the DSA-produced structures and related measurements.

Abstract translation: 提供了体现方法的方法和计量工具模块。 方法包括测量中间特征的特征，例如在定向自组装（DSA）过程中的引导线，从测量的特征导出曝光参数; 并根据导出的曝光参数调整生产连续目标特征的生产参数。 这些方法和模块提高了DSA生产的结构和相关测量的准确性。

公开(公告)号：US20150268164A1

公开(公告)日：2015-09-24

申请号：US14734687

申请日：2015-06-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Nuriel AMIR

IPC: G01N21/47 ,  G01N21/01 ,  B05D1/32

CPC classification number: G01N21/4785 ,  B05D1/32 ,  G01N21/01 ,  G03F7/70466 ,  G03F7/70633 ,  G03F7/70683

Abstract: Multiply patterned metrology targets and target design methods are provided to enable pitch walk measurements using overlay measurements. Multiply patterned structures having single features or spacers produced simultaneously and sharing a common pitch with the paired features or spacers are used to express pitch walk as a measurable overlay between the structures. For example, targets are provided which comprise a first multiply patterned structure having a single left-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers, and a second multiply patterned structure having a single right-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers.

Abstract translation: 提供乘法图案计量目标和目标设计方法，以使用覆盖测量来进行俯仰测量。 使用具有同时产生的单个特征或间隔物的共同图案化结构并与配对特征或间隔物共享共同的间距以表示俯仰行走作为结构之间的可测量的覆盖。 例如，提供了包括具有同时产生的单个左手特征或间隔物的第一多重图案化结构的目标，并且与相应的成对特征或间隔物共享共同的间距，以及具有单个右手特征的第二多重图案化结构 或间隔件同时制造并且与相应的成对特征或间隔物共享共同的间距。