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公开(公告)号:US10021773B2
公开(公告)日:2018-07-10
申请号:US15265515
申请日:2016-09-14
Applicant: KLA-Tencor Corporation
Inventor: Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
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公开(公告)号:US20170142817A1
公开(公告)日:2017-05-18
申请号:US15265515
申请日:2016-09-14
Applicant: KLA-Tencor Corporation
Inventor: Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
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公开(公告)号:US20170131129A1
公开(公告)日:2017-05-11
申请号:US15261639
申请日:2016-09-09
Applicant: KLA-Tencor Corporation
Inventor: Brian Ahr , Alexander Bykanov , Rudy F. Garcia , Layton Hale , Oleg Khodykin
CPC classification number: H05G2/008 , H05G2/006 , H05H2240/00
Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.
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公开(公告)号:US10893599B2
公开(公告)日:2021-01-12
申请号:US16030693
申请日:2018-07-09
Applicant: KLA-Tencor Corporation
Inventor: Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
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5.
公开(公告)号:US20190075641A1
公开(公告)日:2019-03-07
申请号:US16030693
申请日:2018-07-09
Applicant: KLA-Tencor Corporation
Inventor: Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
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6.
公开(公告)号:US09544984B2
公开(公告)日:2017-01-10
申请号:US14335442
申请日:2014-07-18
Applicant: KLA-Tencor Corporation
Inventor: Alexander Bykanov , Oleg Khodykin , Daniel C. Wack , Konstantin Tsigutkin , Layton Hale , Joseph Walsh , Frank Chilese , Rudy F. Garcia , Brian Ahr
IPC: G01J1/42 , H05G2/00 , G01J1/16 , G01N21/956 , G03F7/20
CPC classification number: H05G2/008 , G01J1/16 , G01N21/956 , G01N2021/95676 , G01N2201/061 , G03F1/84 , G03F7/70033 , G03F7/70891 , H05H2240/00
Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.
Abstract translation: EUV光源包括可旋转的圆柱对称元件,其具有涂覆有等离子体形成目标材料的表面;驱动激光源,被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料,一组聚焦光学元件,其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件,被配置为接收从所产生的等离子体发出的EUV光,并进一步配置 将照明引导到中间焦点,以及气体管理系统,其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。
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