System and method for generation of extreme ultraviolet light
    6.
    发明授权
    System and method for generation of extreme ultraviolet light 有权
    用于产生极紫外光的系统和方法

    公开(公告)号:US09544984B2

    公开(公告)日:2017-01-10

    申请号:US14335442

    申请日:2014-07-18

    Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

    Abstract translation: EUV光源包括可旋转的圆柱对称元件,其具有涂覆有等离子体形成目标材料的表面;驱动激光源,被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料,一组聚焦光学元件,其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件,被配置为接收从所产生的等离子体发出的EUV光,并进一步配置 将照明引导到中间焦点,以及气体管理系统,其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

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