公开(公告)号：US20150303053A1

公开(公告)日：2015-10-22

申请号：US14439126

申请日：2013-10-10

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroto TOKOSHIMA ,  Hiroshi MORITA

IPC: H01L21/02 ,  C02F1/78

CPC classification number: H01L21/02052 ,  C02F1/20 ,  C02F1/78 ,  C02F2103/346

Abstract: A method for producing ozone gas-dissolved water includes a process in which a mixed gas of an ozone gas and an oxygen gas and degassed water are supplied to an ozone-dissolving section and the mixed gas is dissolved in the degassed water. The amount of the mixed gas supplied to the ozone-dissolving section is controlled such that the sum of the dissolved oxygen gas concentration of the degassed water and the increment of the dissolved oxygen gas concentration calculated from the amount of the oxygen gas in the mixed gas and the amount of the degassed water on the assumption that ozone in the mixed gas entirely decomposes into oxygen is less than or equal to the saturated solubility of the oxygen gas under conditions using the obtained ozone gas-dissolved water.

Abstract translation: 生产臭氧气体溶解水的方法包括将臭氧气体和氧气和脱气水的混合气体供给到臭氧溶解部分并将混合气体溶解在脱气水中的方法。 控制向臭氧溶解部供给的混合气体的量，使得脱气水的溶解氧气体浓度与溶解氧气体浓度的增加量之和由混合气体中的氧气量计算 假定混合气体中的臭氧完全分解为氧气的脱气水的量小于或等于氧气在使用得到的臭氧气体溶解水的条件下的饱和溶解度。

公开(公告)号：US20180257066A1

公开(公告)日：2018-09-13

申请号：US15760507

申请日：2016-09-12

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Toshimasa KATO ,  Shigeyuki HOSHI

IPC: B01J39/04 ,  B01J41/04 ,  B01J47/12 ,  C02F1/42 ,  C02F1/62

CPC classification number: B01J39/04 ,  B01J41/04 ,  B01J47/12 ,  C02F1/42 ,  C02F1/444 ,  C02F1/62 ,  C02F2101/20 ,  C02F2103/04 ,  H01L21/02052 ,  H01L21/67057

Abstract: The present invention reduces adhesion of trace metals in ultrapure water for cleaning products, and inhibits the metal contamination of an object to be cleaned. Provided is a metal contamination inhibitor that contains a polymer having an ion-exchange group, such as a polystyrene sulfonate having a molecular weight of at least 100,000. Trace metals in ultrapure water are adsorbed through an ion-exchange reaction of the polymer having the ion-exchange group, and can thus be inhibited from adhering to products. Also provided is a method for cleaning a product with ultrapure water to which the metal contamination inhibitor has been added. Preferably, the ultrapure water to which the metal contamination inhibitor has been added flows through a separation membrane module, and the products are cleaned with permeated water.

公开(公告)号：US20170356891A1

公开(公告)日：2017-12-14

申请号：US15540807

申请日：2016-01-06

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Yuichi OGAWA ,  Yuya SASAKI

IPC: G01N31/12 ,  B08B3/08 ,  B08B3/14 ,  H01L21/67

CPC classification number: G01N31/12 ,  B08B3/08 ,  B08B3/10 ,  B08B3/12 ,  B08B3/14 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67276

Abstract: To measure the concentration of an oxidant in an oxidative cleaning liquid used in a process of cleaning an electronic material in a simple, easy, consistent, and accurate manner without being affected by impurities included in the cleaning liquid, such as metals. A method for measuring the concentration of an oxidant in a sample liquid used as a cleaning liquid in a process of cleaning an electronic material includes decomposing at least part of an oxidant included in the sample liquid by heating or the like; measuring the amount of oxygen gas generated by decomposition of the oxidant; and determining the concentration of the oxidant in the sample liquid on the basis of the amount of the oxygen gas.

公开(公告)号：US20160220958A1

公开(公告)日：2016-08-04

申请号：US15021178

申请日：2014-09-30

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Takeo FUKUI ,  Hiroshi MORITA ,  Yoichi TANAKA ,  Hideaki IINO ,  Satoshi YAMADA

IPC: B01D61/58 ,  B01D61/02 ,  C02F1/44 ,  B01D61/14

CPC classification number: B01D61/58 ,  B01D61/025 ,  B01D61/04 ,  B01D61/142 ,  B01D61/145 ,  B01D61/147 ,  B01D2311/04 ,  B01D2311/06 ,  B01D2311/2619 ,  B01D2311/2623 ,  B01D2311/2634 ,  B01D2311/2657 ,  B01D2317/025 ,  B01D2317/04 ,  C02F1/441 ,  C02F1/444 ,  C02F2103/04 ,  C02F2209/105 ,  C02F2301/08

Abstract: Provided is an ultrapure water production apparatus capable of producing high-quality ultrapure water from which microparticles have been removed at a high level. An ultrapure water production apparatus comprising a subsystem that produces ultrapure water from primary pure water, the subsystem including a membrane unit disposed at the end of the subsystem, wherein the membrane unit is constituted by a plurality of membrane devices arranged in series, the first of the membrane devices being a UF membrane device, an MF membrane device, or an RO membrane device, the last of the membrane devices being a UF membrane device or an MF membrane that is not modified with an ion-exchange group.

Abstract translation: 本发明提供一种超高纯水制造装置，其能够高精度地制造高质量的超纯水。 一种超纯水生产设备，包括从初级纯水产生超纯水的子系统，子系统包括设置在子系统端部的膜单元，其中膜单元由串联布置的多个膜装置构成，第一 膜装置是UF膜装置，MF膜装置或RO膜装置，最后的膜装置是不用离子交换基团改性的UF膜装置或MF膜。

公开(公告)号：US20200152488A1

公开(公告)日：2020-05-14

申请号：US16603444

申请日：2018-03-20

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Nobuko GAN

IPC: H01L21/67 ,  C02F1/66 ,  C02F1/68 ,  C02F1/00 ,  B08B3/08

Abstract: A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a storage tank for the cleaning water, cleaning machines to which the cleaning water is supplied from the storage tank, and a controller that controls the cleaning water production unit so that a water level in the storage tank is in a predetermined range.

公开(公告)号：US20200039854A1

公开(公告)日：2020-02-06

申请号：US16603417

申请日：2018-03-20

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Nobuko GAN

IPC: C02F1/68 ,  C02F1/42 ,  C02F1/66 ,  C02F1/469 ,  H01L21/67

Abstract: A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a cleaning water line for causing the cleaning water to flow, cleaning machines to which the cleaning water is supplied from the cleaning water line, a solute removal unit into which excess cleaning water is introduced from the cleaning water line, and a collecting line for returning collected water from which the solute is removed to a tank and the like.