ULTRAPURE WATER PRODUCTION SYSTEM, ULTRAPURE WATER PRODUCTION FEED SYSTEM, AND METHOD FOR CLEANING THEREOF
    2.
    发明申请
    ULTRAPURE WATER PRODUCTION SYSTEM, ULTRAPURE WATER PRODUCTION FEED SYSTEM, AND METHOD FOR CLEANING THEREOF 审中-公开
    超声波水生产系统,超声波水生产系统及其清洁方法

    公开(公告)号:US20160159672A1

    公开(公告)日:2016-06-09

    申请号:US14906441

    申请日:2014-07-22

    Abstract: Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a short period of time. An ultrapure water production system is provided with a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, a first microparticle removal membrane device, and a second microparticle removal membrane device. Parts of sterilization water and flush water are fed into the first microparticle removal membrane device and discharged from a feedwater-side potion to a concentrated-water-side portion without permeating through a microparticle removal membrane thereof, and the remaining part of the water is passed through the second microparticle removal membrane device.

    Abstract translation: 存在于超纯水生产系统内的污染物被防止进入连接到使用点的进料管中,并且在灭菌清洁之后,防止在灭菌清洁期间系统被捕获在微粒去除膜上的污染物污染。 因此,优质的超纯水在短时间内供给到使用点。 超纯水生产系统设置有罐,泵,热交换器,紫外线装置,离子交换装置,第一微粒除去膜装置和第二微粒除去膜装置。 灭菌水和冲洗水的一部分被供给到第一微粒去除膜装置中,并且从给水侧部分排出到浓缩水侧部分而不渗透通过其除去微粒膜,并且剩余部分的水通过 通过第二微粒去除膜装置。

    PARTICULATE-MEASURING METHOD, PARTICULATE-MEASURING SYSTEM, AND SYSTEM FOR MANUFACTURING ULTRAPURE WATER
    3.
    发明申请
    PARTICULATE-MEASURING METHOD, PARTICULATE-MEASURING SYSTEM, AND SYSTEM FOR MANUFACTURING ULTRAPURE WATER 审中-公开
    颗粒测量方法,颗粒测量系统和制造超声波水的系统

    公开(公告)号:US20160047730A1

    公开(公告)日:2016-02-18

    申请号:US14778872

    申请日:2014-03-13

    Inventor: Yoichi TANAKA

    Abstract: An object of the invention is to provide a technology that can timely collects particulates in sample water even when abnormality is observed in the result obtained by a measurement unit for measuring particulates in sample water. Provided is a particulate-measuring method comprising filtering sample water continuously, even when a measurement unit for measuring particulates in sample water and a filtration unit of filtering the sample water and collecting the particulates for analysis by direct microscopic method are both in operation and abnormality is observed in the result obtained by the measurement unit.

    Abstract translation: 本发明的目的是提供即使在通过用于测量样品水中的微粒的测量单元获得的结果中观察到异常的情况下,也能够及时收集样品水中的微粒的技术。 本发明提供一种颗粒测定方法,即使在用于测量样品水的微粒的测量单元和过滤样品水并通过直接显微镜方法收集微粒以进行分析的过程中,也连续地对样品水进行过滤,均处于运行状态,异常是 在由测量单元获得的结果中观察到。

    APPARATUS FOR REMOVING FINE PARTICLE AND METHOD FOR REMOVING FINE PARTICLE

    公开(公告)号:US20220212145A1

    公开(公告)日:2022-07-07

    申请号:US17441041

    申请日:2020-03-12

    Abstract: There is provided an apparatus for removing fine particles having membranes for removing fine particles in a liquid, wherein a microfiltration membrane or ultrafiltration membrane having a positive charge and a microfiltration membrane or ultrafiltration membrane having a negative charge are arranged in series. There is also provided a method for removing fine particles using the apparatus. Liquids may be passed through the membrane having a negative charge and the membrane having a positive charge in order; thereby, extrafine particles having a particle size of 50 nm or smaller, especially of 10 nm or smaller, in the liquids can be removed highly. The liquid passing may be carried out in the order reverse thereto.

    ORGANIC SOLVENT TREATMENT METHOD
    5.
    发明申请

    公开(公告)号:US20220184596A1

    公开(公告)日:2022-06-16

    申请号:US17442573

    申请日:2020-03-10

    Abstract: An organic solvent treatment method for removing particulates from an organic solvent used in a manufacturing step of electronic components is characterized by comprising a step of bringing the organic solvent into contact with a treatment material that has a positive or negative electric charge in water and has a moisture content of 3% by mass or more. An organic solvent treatment material, which is to be used in the manufacturing step of electronic components and which is for removing particulates from an organic solvent by coming into contact with the organic solvent used in the manufacturing step of electronic components, has a positive or negative electric charge in water.

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