公开(公告)号：US5106893A

公开(公告)日：1992-04-21

申请号：US652401

申请日：1991-02-07

申请人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Koji Egashira ,  Hiroyuki Wakabayashi ,  Fumio Kato

发明人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Koji Egashira ,  Hiroyuki Wakabayashi ,  Fumio Kato

IPC分类号： C08K5/00 ,  C08K7/04 ,  C08L23/02 ,  C08L77/00

CPC分类号： C08K7/04 ,  C08K5/00 ,  C08K5/005 ,  C08L23/02 ,  C08L77/00

摘要： A fiber-reinforced polymer composition containing resin components including (a) 30-90 weight % of a polyamide resin, and (b) 10-70 weight % of polyolefin+unsaturated carboxylic acid-modified polyolefin, based on the resin components; and, per 100 parts by weight of the total components, (c) 5-50 parts by weight of glass fibers, and (d) additives including the following set of additives: 0.1-1 parts by weight of N,N'-hexamethylene-bis (3,5-di-tert-butyl-4-hydroxy-hydrocinnamide); 0.1-1 parts by weight of triethylene glycol-bis [3-(3-tert-butyl-5-methyl-4-hydroxyphenyl) propionate]; and 0.1-1 parts by weight of pentaerythrityl-tetrakis [3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate]. An alternative set of additives are 0.1-2 parts by weight of N,N'-bis [3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionyl] hydrazine; 0.05-0.5 parts by weight of pentaerythrityl-tetrakis [3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate]; 0.05-0.5 parts by weight of distearyl-pentaerythritol diphosphite; and 0.15-1 parts by weight of distearyl-3,3'-thiodipropionate.

公开(公告)号：US5106564A

公开(公告)日：1992-04-21

申请号：US636028

申请日：1991-01-04

申请人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Kenichi Aoki ,  Yukihiko Yagi ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Fumio Kato ,  Koji Egashira ,  Hiroyuki Wakabayashi

发明人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Kenichi Aoki ,  Yukihiko Yagi ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Fumio Kato ,  Koji Egashira ,  Hiroyuki Wakabayashi

IPC分类号： C08K7/14 ,  C08L23/02 ,  C08L77/00

CPC分类号： C08K7/14 ,  B29C47/1045 ,  B29C47/1081 ,  C08L23/02 ,  C08L77/00 ,  B29C47/0004 ,  B29C47/0009 ,  B29C47/38 ,  B29C47/402 ,  B29C47/64 ,  B29C47/767 ,  B29K2077/00 ,  B29K2105/06 ,  B29K2105/12

摘要： Fiber-reinforced polymer compositions containing resin components including (a) 30-90 weight % of polyamide resins, and (b) 10-70 weight % of polyolefins+unsaturated carboxylic acid-modified polyolefins, based on the resin components; and (c) 5-50 parts by weight of glass fibers per 100 parts by weight of the total compositions, a molar ratio of end amino groups in the polyamide resins to carboxyl groups in the modified polyolefins being 10-1000. The compositions have a morphology in which polyolefin domains having an average size of 0.5-5 .mu.m are uniformly dispersed in polyamide matrix phases. They are produced by a double-screw extruder having a length/inner diameter (L/D) ratio of 25 or more and having a first hopper for introducing the resin components, a second hopper for introducing the glass fibers, a vent and a die exit in this order, and further having at least one first kneading zone for strongly kneading the resin components, and at least one second kneading zone disposed between the second hopper and the vent for strongly kneading the resin components and the glass fibers.

公开(公告)号：US4990550A

公开(公告)日：1991-02-05

申请号：US325812

申请日：1989-03-20

申请人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Kenichi Aoki ,  Yukihiko Yagi ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Fumio Kato ,  Koji Egashira ,  Hiroyuki Wakabayashi

发明人： Kunio Iwanami ,  Kissho Kitano ,  Kiyotada Narukawa ,  Kenichi Aoki ,  Yukihiko Yagi ,  Masato Sakuma ,  Takashi Mikami ,  Masami Esaki ,  Fumio Kato ,  Koji Egashira ,  Hiroyuki Wakabayashi

IPC分类号： C08K7/14 ,  C08L23/02 ,  C08L77/00

CPC分类号： C08K7/14 ,  B29C47/1045 ,  B29C47/1081 ,  C08L23/02 ,  C08L77/00 ,  B29C47/0004 ,  B29C47/0009 ,  B29C47/38 ,  B29C47/402 ,  B29C47/64 ,  B29C47/767 ,  B29K2077/00 ,  B29K2105/06 ,  B29K2105/12

摘要： Fiber-reinforced polymer compositions containing resin components including (a) 30-90 weight % of polyamide resins, and (b) 10-70 weight % of polyolefins+unsaturated carboxylic acid-modified polyolefins, based on the resin components; and (c) 5-50 parts by weight of glass fibers per 100 parts by weight of the total compositions, a molar ratio of end amino groups in the polyamide resins to carboxyl groups in the modified polyolefins being 10-1000. The compositions have a morphology in which polyolefin domains having an average size of 0.5-5 .mu.m are uniformly dispersed in polyamide matrix phases. They are produced by a double-screw extruder having a length/inner diameter (L/D) ratio of 25 or more and having a first hopper for introducing the resin components, a second hopper for introducing the glass fibers, a vent and a die exit in this order, and further having at least one first kneading zone for strongly kneading the resin components, and at least one second kneading zone disposed between the second hopper and the vent for strongly kneading the resin components and the glass fibers.

公开(公告)号：US07412981B2

公开(公告)日：2008-08-19

申请号：US11545471

申请日：2006-10-11

申请人： Koji Egashira ,  Yuji Kamikawa

发明人： Koji Egashira ,  Yuji Kamikawa

IPC分类号： B08B3/02

CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902

摘要： A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in order to perform a liquid process. The nozzles 54, 56 are respectively equipped with a plurality of ejecting orifices 53, 55 capable of ejecting the processing liquid in a plane manner, allowing the substrates W to be processed uniformly and effectively.

摘要翻译： 液体处理装置包括容纳多个晶片W的处理室51,52的容器26,27,26a，26b和用于向基板W供给处理液体以进行液体处理的喷嘴54,56。 喷嘴54,56分别配备有能够以平面方式喷射处理液的多个喷射孔53,55，从而能够均匀有效地对基板W进行加工。

公开(公告)号：US07240680B2

公开(公告)日：2007-07-10

申请号：US10446438

申请日：2003-05-28

申请人： Koji Egashira

发明人： Koji Egashira

IPC分类号： B08B3/00

CPC分类号： H01L21/68728 ,  B08B3/02 ,  H01L21/673 ,  H01L21/68707 ,  H01L21/68771 ,  Y10S134/902

摘要： A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. The rotor 45 has holding members 95, 96, 97, 98, 99 for holding the peripheries of the wafers W in parallel arrangement and a press member 100 for holding the wafers W while applying a pressure on their peripheries. Irrespective of rotation of the rotor 45, the press member 100 always applies a pressure on the peripheries of the wafers W so as to prevent the peripheries from sifting with respect to the holding members 95, 96, 97, 98, 99. With the action of the press member 100, it becomes possible to prevent the peripheries of the wafers W from being worn and also possible to elongate the span of life of the holding members 95, 96, 97, 98, 99 while performing a chemical processing.

摘要翻译： 基板处理装置包括用于以适当的间隔使彼此并联的多个晶片W旋转的转子45。 当通过转子45旋转晶片W时，将化学液体供应到晶片W进行处理。 转子45具有用于保持平行布置的晶片W的周边的保持构件95,96,97,98,99，以及用于保持晶片W并在其周边施加压力的压力构件100。 不管转子45的旋转如何，压力构件100总是对晶片W的周边施加压力，以防止周边相对于保持构件95,96,97,98,99进行筛选。 通过按压部件100的作用，可以防止晶片W的周边磨损，并且也可以延长保持部件95,96,97,98,99的寿命，同时进行化学处理 。

公开(公告)号：US06725868B2

公开(公告)日：2004-04-27

申请号：US09987369

申请日：2001-11-14

申请人： Yuji Kamikawa ,  Koji Egashira

发明人： Yuji Kamikawa ,  Koji Egashira

IPC分类号： B08B302

CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902

摘要： A cleaning processing apparatus, which is one embodiment of a liquid processing apparatus for performing a liquid processing by supplying a predetermined process liquid to a target object to be processed such as a semiconductor wafer while rotating the target object, comprises a rotor for holding wafers W, a slidable process section for housing the rotor, and a cleaning liquid spurting nozzle for supplying a predetermined cleaning liquid to the wafers W. A housing for housing the slidable process section is of a hermetic structure so as to be substantially shielded from the outside.

摘要翻译： 一种清洁处理装置，其是通过在旋转目标物体的同时向诸如半导体晶片的目标被处理物体提供预定处理液来进行液体处理的一个实施例，包括用于保持晶片W的转子 ，用于容纳转子的可滑动工艺部分和用于将预定清洁液体供应到晶片W的清洗液喷射喷嘴。用于容纳可滑动处理部分的壳体是密封结构，以便基本上与外部隔绝。

公开(公告)号：US08851819B2

公开(公告)日：2014-10-07

申请号：US12706958

申请日：2010-02-17

申请人： Yuji Kamikawa ,  Takafumi Tsuchiya ,  Koji Egashira

发明人： Yuji Kamikawa ,  Takafumi Tsuchiya ,  Koji Egashira

IPC分类号： B65G65/00 ,  H01L21/677

CPC分类号： H01L21/67775 ,  H01L21/67727 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67769 ,  H01L21/67778 ,  H01L21/687 ,  H01L2221/68368 ,  Y10S414/14

摘要： A substrate processing apparatus, which utilizes a first transfer apparatus and a second transfer apparatus which are configured to transfer a transfer container containing a plurality of substrates, along a first transfer path and a second transfer path whose lateral positions differ from each other, respectively, including a first load port where the transfer container is loaded and unloaded by the first transfer apparatus, and a second load port that is arranged stepwise with respect to the first load port, with the transfer container being loaded to and unloaded from the second load port by the second transfer apparatus.

摘要翻译： 一种基板处理装置，其利用第一传送装置和第二传送装置，所述第一传送装置和第二传送装置分别沿着第一传送路径和横向位置彼此不同的第二传送路径传送包含多个基板的传送容器， 包括第一装载口，其中所述转运容器由所述第一转运装置装载和卸载;以及第二装载端口，其相对于所述第一装载端口逐步布置，所述转运容器被装载到所述第二装载端口并从所述第二装载端口卸载 通过第二传送装置。

公开(公告)号：US08567417B2

公开(公告)日：2013-10-29

申请号：US12896029

申请日：2010-10-01

申请人： Yuji Kamikawa ,  Hiroaki Inadomi ,  Hideyuki Yamamoto ,  Hiroshi Komiya ,  Koji Egashira

发明人： Yuji Kamikawa ,  Hiroaki Inadomi ,  Hideyuki Yamamoto ,  Hiroshi Komiya ,  Koji Egashira

IPC分类号： B08B3/12

CPC分类号： B08B3/12 ,  B08B3/048 ,  H01L21/67057 ,  H01L21/67313 ,  H01L21/67757

摘要： An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object.

摘要翻译： 一种超声波清洗装置，包括：清洗槽，用于储存清洗液; 用于插入到清洁槽中的被处理物体的保持器，保持被处理物体并将物体浸入清洗液中的保持器; 设置在清洗槽底部的振动器; 以及配置成使振动器超声波振动的超声波振荡器。 在清洗槽中设置有用于保持物体的侧面保持构件。 保持器构造成由驱动装置横向移动。 所述控制装置被构造成控制所述驱动装置，使得所述保持器在所述物体被所述侧向保持构件保持之后横向移动，并且所述控制装置被配置为控制所述超声波振荡器，使得所述振动器被制成超声波振动 来自振动器的超声波振动传播到物体。

公开(公告)号：US20110079240A1

公开(公告)日：2011-04-07

申请号：US12896029

申请日：2010-10-01

申请人： Yuji KAMIKAWA ,  Hiroaki Inadomi ,  Hideyuki Yamamoto ,  Hiroshi Komiya ,  Koji Egashira

发明人： Yuji KAMIKAWA ,  Hiroaki Inadomi ,  Hideyuki Yamamoto ,  Hiroshi Komiya ,  Koji Egashira

IPC分类号： B08B3/12

CPC分类号： B08B3/12 ,  B08B3/048 ,  H01L21/67057 ,  H01L21/67313 ,  H01L21/67757

摘要： An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object.

摘要翻译： 一种超声波清洗装置，包括：清洗槽，用于储存清洗液; 用于插入到清洁槽中的被处理物体的保持器，保持被处理物体并将物体浸入清洗液中的保持器; 设置在清洗槽底部的振动器; 以及配置成使振动器超声波振动的超声波振荡器。 在清洗槽中设置有用于保持物体的侧面保持构件。 保持器构造成由驱动装置横向移动。 所述控制装置被构造成控制所述驱动装置，使得所述保持器在所述物体被所述侧向保持构件保持之后横向移动，并且所述控制装置被配置为控制所述超声波振荡器，使得所述振动器被制成超声波振动 来自振动器的超声波振动传播到物体。

公开(公告)号：US20090010748A1

公开(公告)日：2009-01-08

申请号：US11585337

申请日：2006-10-24

申请人： Yuji Kamikawa ,  Koji Egashira

发明人： Yuji Kamikawa ,  Koji Egashira

IPC分类号： B65G59/00

CPC分类号： H01L21/67739 ,  H01L21/67718 ,  H01L21/67763 ,  H01L21/67778 ,  H01L21/67781 ,  Y10S414/138

摘要： A batch forming apparatus forms a batch of substrates by combining a plurality of substrates that have been taken out from a plurality of carriers each containing therein the substrates in a stacked manner. The batch forming apparatus includes: a substrate transfer mechanism that takes out the substrates from each carrier and transfer the substrates; a substrate relative positional relationship changing mechanism that rearranges one or more substrates out of the substrates transferred by the substrate transfer mechanism one by one relative to other substrates to change positional relationships of the substrates relative to each other; and a batch forming mechanism that forms a batch of substrates out of the substrates that have been transferred thereto by the substrate transfer mechanism, with positional relationships of the substrates having been changed relative to each other by the substrate relative positional relationship changing mechanism. A substrate processing system includes such a batch forming apparatus, and a substrate processing apparatus that process the batch of substrates formed by the batch forming apparatus.

摘要翻译： 批量形成装置通过组合从多个载体中取出的多个基板形成一批基板，每个载体以堆叠的方式包含在其中的基板。 批量形成装置包括：基板转印机构，其从每个载体取出基板并转印基板; 基板相对位置关系改变机构，用于相对于其它基板逐一地将由基板传送机构转印的基板中的一个或多个基板重新布置，以改变基板相对于彼此的位置关系; 以及批量形成机构，其通过基板传送机构在已经被转印到基板之外形成一批基板，基板的位置关系通过基板相对位置关系改变机构而相对于彼此改变。 一种基板处理系统包括这样的分批成型装置，以及处理由批量形成装置形成的一批基板的基板处理装置。