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公开(公告)号：US07282319B2
公开(公告)日：2007-10-16
申请号：US11141736
申请日：2005-05-31
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/122
摘要： A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.
摘要翻译： 公开了一种用于防止暴露故障的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物优选包含约0.1重量％至约0.5重量％的光酸产生剂和约2重量％至约10重量％的聚合物树脂，该PAG包括单苯基锍化合物，三苯基锍化合物或混合物 其中。 充分防止了基础现象和图案的最大损失。
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公开(公告)号：US20050266342A1
公开(公告)日：2005-12-01
申请号：US11141736
申请日：2005-05-31
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/122
摘要： A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.
摘要翻译： 公开了一种用于防止暴露故障的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物优选包含约0.1重量％至约0.5重量％的光酸产生剂和约2重量％至约10重量％的聚合物树脂，该PAG包括单苯基锍化合物，三苯基锍化合物或混合物 其中。 充分防止了基础现象和图案的最大损失。
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公开(公告)号：US20050277056A1
公开(公告)日：2005-12-15
申请号：US11138360
申请日：2005-05-27
申请人： Kyoung-Mi Kim , Jae-Ho Kim , Yeu-Young Youn , Youn-Kyung Wang
发明人： Kyoung-Mi Kim , Jae-Ho Kim , Yeu-Young Youn , Youn-Kyung Wang
CPC分类号： G03F7/0048 , G03F7/0045 , G03F7/0392 , Y10S430/105 , Y10S430/106 , Y10S430/115 , Y10S430/128
摘要： The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.
摘要翻译： 本发明的光致抗蚀剂组合物包括溶剂混合物，树脂，光酸产生剂和猝灭剂，所述溶剂混合物包含含有醚化合物的第一溶剂和极性强于第一溶剂的第二溶剂，其中 第一溶剂的量在约61重量％至约79重量％的范围内，并且第二溶剂的量在溶剂混合物的总重量的约21重量％至约39重量％的范围内 。
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公开(公告)号：US20050266343A1
公开(公告)日：2005-12-01
申请号：US11142777
申请日：2005-05-31
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
CPC分类号： G03F7/0392 , G03F7/0395
摘要： In a photoresist composition including a blocking group less sensitive to a temperature during a PEB process, the photoresist composition comprising from about 2% to about 10% by weight of a photosensitive resin, from about 0.1% to about 0.5% by weight of a photoacid generator, and a residual amount of a solvent, the photosensitive resin including a blocking group having a weight average molecular weight of from about 70 to about 130.
摘要翻译： 在包含对PEB过程中对温度不太敏感的阻挡基团的光致抗蚀剂组合物中，光致抗蚀剂组合物包含约2％至约10％重量的光敏树脂，约0.1％至约0.5％重量的光酸 发生器和残留量的溶剂，所述感光性树脂包括重均分子量为约70至约130的封闭基团。
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公开(公告)号：US07419759B2
公开(公告)日：2008-09-02
申请号：US11138360
申请日：2005-05-27
申请人： Kyoung-Mi Kim , Jae-Ho Kim , Yeu-Young Youn , Youn-Kyung Wang
发明人： Kyoung-Mi Kim , Jae-Ho Kim , Yeu-Young Youn , Youn-Kyung Wang
CPC分类号： G03F7/0048 , G03F7/0045 , G03F7/0392 , Y10S430/105 , Y10S430/106 , Y10S430/115 , Y10S430/128
摘要： The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.
摘要翻译： 本发明的光致抗蚀剂组合物包括溶剂混合物，树脂，光酸产生剂和猝灭剂，所述溶剂混合物包含含有醚化合物的第一溶剂和极性强于第一溶剂的第二溶剂，其中 第一溶剂的量在约61重量％至约79重量％的范围内，并且第二溶剂的量在溶剂混合物的总重量的约21重量％至约39重量％的范围内 。
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6.发明申请公开(公告)号：US20050176607A1
公开(公告)日：2005-08-11
申请号：US11049751
申请日：2005-02-04
申请人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
发明人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
IPC分类号： G03F7/42 , C09D9/00 , C09D9/04 , C11D1/00 , C11D7/26 , C11D11/00 , G03F7/38 , H01L21/027 , H01L21/304
CPC分类号： C11D7/266 , C11D11/0047
摘要： A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
摘要翻译： 较薄的组合物包括丙二醇醚乙酸酯，2-羟基-2-甲基丙酸甲酯和酯化合物如乳酸乙酯，3-乙氧基丙酸乙酯或它们的混合物。
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公开(公告)号：US07070910B2
公开(公告)日：2006-07-04
申请号：US11033300
申请日：2005-01-12
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Jae-Ho Kim , Young-Ho Kim , Shi-Yong Yi
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Jae-Ho Kim , Young-Ho Kim , Shi-Yong Yi
IPC分类号： G03C5/00
CPC分类号： G03F7/0752 , C07F7/12 , G03F7/0751
摘要： An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.
摘要翻译： 还公开了与光致抗蚀剂一起使用的粘合剂化合物，根据以下化学式表示的化合物，A，使用该粘合剂形成光致抗蚀剂图案的方法。
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8.发明授权公开(公告)号：US07863231B2
公开(公告)日：2011-01-04
申请号：US12118778
申请日：2008-05-12
申请人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
发明人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
IPC分类号： C11D7/50
CPC分类号： C11D7/266 , C11D11/0047
摘要： A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
摘要翻译： 较薄的组合物包括丙二醇醚乙酸酯，2-羟基-2-甲基丙酸甲酯和酯化合物如乳酸乙酯，3-乙氧基丙酸乙酯或它们的混合物。
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9.发明授权公开(公告)号：US07387988B2
公开(公告)日：2008-06-17
申请号：US11049751
申请日：2005-02-04
申请人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
发明人： Seung-Hyun Ahn , Eun-Mi Bae , Baik-Soon Choi , Sang-Mun Chon , Dae-Joung Kim , Kwang-Sub Yoon , Sang-Kyu Park , Jae-Ho Kim , Shi-Yong Yi , Kyoung-Mi Kim , Yeu-Young Youn
IPC分类号： C11D7/50
CPC分类号： C11D7/266 , C11D11/0047
摘要： A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
摘要翻译： 较薄的组合物包括丙二醇醚乙酸酯，2-羟基-2-甲基丙酸甲酯和酯化合物如乳酸乙酯，3-乙氧基丙酸乙酯或它们的混合物。
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公开(公告)号：US20050164126A1
公开(公告)日：2005-07-28
申请号：US11033300
申请日：2005-01-12
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Jae-Ho Kim , Young-Ho Kim , Shi-Yong Yi
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Jae-Ho Kim , Young-Ho Kim , Shi-Yong Yi
CPC分类号： G03F7/0752 , C07F7/12 , G03F7/0751
摘要： An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.
摘要翻译： 还公开了与光致抗蚀剂一起使用的粘合剂化合物，根据以下化学式表示的化合物，A，使用该粘合剂形成光致抗蚀剂图案的方法。
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