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    Process for Producing Base Material for Forming Heat Shielding Film
    1.
    发明申请
    Process for Producing Base Material for Forming Heat Shielding Film 有权
    生产用于形成隔热膜的基材的制造方法

    公开(公告)号：US20090087573A1

    公开(公告)日：2009-04-02

    申请号：US12093702

    申请日：2006-09-21

    申请人： Masanori Saito ,  Shigeo Hamaguchi ,  Yoshinori Akamatsu ,  Soichi Kumon

    发明人： Masanori Saito ,  Shigeo Hamaguchi ,  Yoshinori Akamatsu ,  Soichi Kumon

    IPC分类号： B05D1/02 ,  E04B1/74

    CPC分类号： C09D5/32 ,  C03C17/008 ,  C03C17/009 ,  C03C17/30 ,  C03C2217/445 ,  C03C2217/452 ,  C03C2217/475 ,  C03C2217/476 ,  C03C2217/485 ,  C03C2218/113 ,  C08K3/22 ,  C09D1/00 ,  C09D7/20 ,  C09D7/47 ,  C09D7/61 ,  C09D183/04

    摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.

    摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。

    Coating Fluid Applicable by Hand for Sol-Gel Film Formation
    2.
    发明申请
    Coating Fluid Applicable by Hand for Sol-Gel Film Formation 有权
    适用于溶胶 - 凝胶膜形成的涂布液

    公开(公告)号：US20100143600A1

    公开(公告)日：2010-06-10

    申请号：US12598876

    申请日：2008-04-28

    申请人： Masanori Saito ,  Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu

    发明人： Masanori Saito ,  Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu

    IPC分类号： B05D1/28 ,  C08L83/06

    CPC分类号： C09D1/00 ,  C03C1/008 ,  C03C17/25 ,  C03C2217/213 ,  C03C2218/113 ,  C09D183/04

    摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.

    摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。

    Treatment For Forming Waterdrop Slidable Films And Process For Forming Waterdrop Slidable Films
    3.
    发明申请
    Treatment For Forming Waterdrop Slidable Films And Process For Forming Waterdrop Slidable Films 审中-公开
    用于形成水滴滑动膜的处理和用于形成水滴可滑动膜的方法

    公开(公告)号：US20080026163A1

    公开(公告)日：2008-01-31

    申请号：US11630687

    申请日：2005-08-01

    申请人： Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu ,  Masanori Saito

    发明人： Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu ,  Masanori Saito

    IPC分类号： B05D1/38 ,  B05D3/06 ,  C08F283/12

    CPC分类号： C03C17/3405 ,  C03C17/30 ,  C03C2217/76 ,  C03C2218/32 ,  C03C2218/33 ,  C08G77/24 ,  C08K5/5406 ,  C09D5/00 ,  C09D183/04 ,  C09D183/08 ,  C09D183/14 ,  C09K3/18

    摘要： The present invention relates to a treatment agent for obtaining a water slidable film, which is obtained by mixing a straight-chain polydimethylsiloxane having two or three of hydrolysable functional groups at at least one end and having 30-400 of dimethylsiloxane units (Si(CH3)2O), a fluoroalkylsilane having a hydrolysable functional group and having 6-12 of fluorocarbon units (CF2 or CF3), and a solution containing an organic solvent, an acid and water. This treatment agent is characterized in that, based on the total amount of the treatment agent, in terms of weight concentration, 0.2-3.0 wt % of the straight-chain polydimethylsiloxane, 0.2-2.0 wt % of the fluoroalkylsilane, and 0.5-3.5 wt % of the total amount of the straight-chain polydimethylsiloxane and the fluoroalkylsilane are mixed together.

    摘要翻译： 本发明涉及一种用于获得水滑动膜的处理剂，其通过在至少一端混合具有两个或三个可水解官能团的直链聚二甲基硅氧烷并具有30-400个二甲基硅氧烷单元（Si（CH 具有可水解官能团并且具有6-12个碳氟化合物单元的氟代烷基硅烷（CF 2 O 2或CF 3） 3N）和含有机溶剂，酸和水的溶液。 该处理剂的特征在于，基于处理剂的总量，以重量浓度计，0.2-3.0重量％的直链聚二甲基硅氧烷，0.2-2.0重量％的氟烷基硅烷和0.5-3.5重量％ 将直链聚二甲基硅氧烷和氟代烷基硅烷的总量的％混合在一起。

    Heat Ray Shielding Glass for Vehicle and Process for Producing the Same
    5.
    发明申请
    Heat Ray Shielding Glass for Vehicle and Process for Producing the Same 有权
    用于车辆的热射线屏蔽玻璃及其制造方法

    公开(公告)号：US20100227159A1

    公开(公告)日：2010-09-09

    申请号：US12377439

    申请日：2007-08-22

    申请人： Soichi Kumon ,  Shigeo Hamaguchi ,  Masanori Saito ,  Yoshinori Akamatsu

    发明人： Soichi Kumon ,  Shigeo Hamaguchi ,  Masanori Saito ,  Yoshinori Akamatsu

    IPC分类号： B32B17/06 ,  B32B5/00 ,  B05D5/06

    CPC分类号： C09D183/06 ,  C03C1/008 ,  C03C17/008 ,  C03C17/009 ,  C03C2217/213 ,  C03C2217/231 ,  C03C2217/445 ,  C03C2217/475 ,  C03C2217/476 ,  C03C2217/485 ,  C03C2217/948 ,  C03C2218/113 ,  C08L83/04 ,  C09D1/00 ,  C09D5/004 ,  C09D5/24 ,  C09D183/04 ,  Y10T428/256 ,  Y10T428/259 ,  Y10T428/265 ,  Y10T428/31612

    摘要： [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement.[Means for Solving Problems] A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane. In the heat ray shielding film, a ratio between the solid content made from the tetraalkoxysilane and the solid content made from the trialkoxysilane is within a range of from 55:45 to 85:15 on a weight percentage basis, and a ratio between the conductive oxide ultrafine particles and the silica binder is within a range of from 35:65 to 70:30 on a weight percentage basis.

    摘要翻译： [问题]为了开发可用作具有上下功能的车辆玻璃的热射线屏蔽玻璃，该热射线屏蔽玻璃具有膜硬度并且由于上下运动而不产生由摩擦产生的异常噪声。 解决问题的手段一种车辆用热线屏蔽玻璃，其特征在于，包括形成在玻璃基板的至少一个面上的玻璃基板和热射线屏蔽膜，其中，所述热射线屏蔽膜包括：导电性氧化物超微粒分散在 这个电影; 以及用于将超细颗粒彼此粘合的二氧化硅粘合剂，所述二氧化硅粘合剂包括通过四烷氧基硅烷和三烷氧基硅烷的水解和缩聚产生的固体内容物。 在热射线屏蔽膜中，由四烷氧基硅烷制成的固体含量与由三烷氧基硅烷制成的固体含量之间的比例以重量百分数计为55:45至85:15，导电性 氧化物超细颗粒和二氧化硅粘合剂的重量百分数在35:65至70:30的范围内。

    Coating fluid applicable by hand for sol-gel film formation
    6.
    发明授权
    Coating fluid applicable by hand for sol-gel film formation 有权
    用于溶胶 - 凝胶成膜的涂布液

    公开(公告)号：US08299169B2

    公开(公告)日：2012-10-30

    申请号：US12598876

    申请日：2008-04-28

    申请人： Masanori Saito ,  Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu

    发明人： Masanori Saito ,  Shigeo Hamaguchi ,  Soichi Kumon ,  Yoshinori Akamatsu

    IPC分类号： C08L83/04 ,  B05D3/02 ,  B05D1/02 ,  B05D1/28

    CPC分类号： C09D1/00 ,  C03C1/008 ,  C03C17/25 ,  C03C2217/213 ,  C03C2218/113 ,  C09D183/04

    摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.

    摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。

    Process for producing base material for forming heat shielding film
    7.
    发明授权
    Process for producing base material for forming heat shielding film 有权
    用于制造形成隔热膜的基材的方法

    公开(公告)号：US08246848B2

    公开(公告)日：2012-08-21

    申请号：US12093702

    申请日：2006-09-21

    申请人： Masanori Saito ,  Shigeo Hamaguchi ,  Yoshinori Akamatsu ,  Soichi Kumon

    发明人： Masanori Saito ,  Shigeo Hamaguchi ,  Yoshinori Akamatsu ,  Soichi Kumon

    IPC分类号： E04B1/74

    CPC分类号： C09D5/32 ,  C03C17/008 ,  C03C17/009 ,  C03C17/30 ,  C03C2217/445 ,  C03C2217/452 ,  C03C2217/475 ,  C03C2217/476 ,  C03C2217/485 ,  C03C2218/113 ,  C08K3/22 ,  C09D1/00 ,  C09D7/20 ,  C09D7/47 ,  C09D7/61 ,  C09D183/04

    摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.

    摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。