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公开(公告)号：US07452605B2
公开(公告)日：2008-11-18
申请号：US10109007
申请日：2002-03-29
IPC分类号： B32B9/04
CPC分类号： C09K3/18 , C03C17/007 , C03C17/009 , C03C17/30 , C03C2217/45 , C09D183/02 , C09D183/04 , C09D183/06 , C09D183/14 , Y10T428/31612 , Y10T428/31663 , C08L83/00 , C08L2666/54
摘要： The invention relates to an article superior in slipping a waterdrop down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains (a) a silica matrix; and (b) a component for providing the slipping. This component is dispersed in the silica matrix and contains a special, alkoxy group-terminated, dimethyl silicone.
摘要翻译： 本发明涉及一种将水滴从制品的表面滑下来的优点。 本文包括底物; 以及形成在所述基板的表面上的功能膜。 该功能膜含有（a）二氧化硅基质; 和（b）用于提供滑动的部件。 该组分分散在二氧化硅基质中，并含有特殊的烷氧基封端的二甲基硅氧烷。
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2.发明授权Article superior in making waterdrops slip down surface thereof and process for producing such article 失效制造水滴在其表面下滑的制品优点和制造这种制品的方法公开(公告)号：US06884512B2
公开(公告)日：2005-04-26
申请号：US10628566
申请日：2003-07-29
申请人： Yoshinori Akamatsu , Soichi Kumon , Kaname Hatakenaka , Haruki Kuramashi , Hiroaki Arai , Shigeo Hamaguchi
发明人： Yoshinori Akamatsu , Soichi Kumon , Kaname Hatakenaka , Haruki Kuramashi , Hiroaki Arai , Shigeo Hamaguchi
IPC分类号： C03C17/00 , C03C17/245 , C03C17/30 , C03C19/00 , B32B9/04
CPC分类号： C03C19/00 , C03C17/002 , C03C17/009 , C03C17/25 , C03C17/30 , C03C2217/211 , C03C2217/213 , C03C2217/76 , C03C2218/113 , C09D183/04 , C09D183/08 , Y10T428/31663 , Y10T428/31667
摘要： The invention relates to an article superior in making a waterdrop slip down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains: (a) a silica forming a matrix of the functional film; (b) a silylated-terminal dimethyl silicone represented by the general formula [A], the dimethyl silicone being in an amount of from 0.1 wt % to 10 wt %, based on a total weight of the silica; and (c) a fluoroalkylsilane represented by the general formula [B] B(CF2)rCH2CH2Si(CH3)3-s(Os [B].
摘要翻译： 本发明涉及一种制造水滴从制品表面滑下的优点。 本文包括底物; 以及形成在所述基板的表面上的功能膜。 该功能膜包含：（a）形成功能膜基质的二氧化硅; （b）由通式[A]表示的甲硅烷基化的末端二甲基硅氧烷，所述二甲基硅氧烷的量为0.1重量％至10重量％，基于二氧化硅的总重量; （c）由通式[B]表示的氟代烷基硅烷<？in-line-formula description =“In-line Formulas”end =“lead”？> B（CF 2 2 < （CH 3）3 -S（CH 3）3 -S（CH 3）3 -S（CH 3）3 - SUB> s [B]。<？in-line-formula description =“In-line Formulas”end =“tail”？>
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公开(公告)号：US20090087573A1
公开(公告)日：2009-04-02
申请号：US12093702
申请日：2006-09-21
CPC分类号： C09D5/32 , C03C17/008 , C03C17/009 , C03C17/30 , C03C2217/445 , C03C2217/452 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2218/113 , C08K3/22 , C09D1/00 , C09D7/20 , C09D7/47 , C09D7/61 , C09D183/04
摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。
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公开(公告)号：US20100143600A1
公开(公告)日：2010-06-10
申请号：US12598876
申请日：2008-04-28
CPC分类号： C09D1/00 , C03C1/008 , C03C17/25 , C03C2217/213 , C03C2218/113 , C09D183/04
摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。
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5.发明申请Treatment For Forming Waterdrop Slidable Films And Process For Forming Waterdrop Slidable Films 审中-公开用于形成水滴滑动膜的处理和用于形成水滴可滑动膜的方法公开(公告)号：US20080026163A1
公开(公告)日：2008-01-31
申请号：US11630687
申请日：2005-08-01
IPC分类号： B05D1/38 , B05D3/06 , C08F283/12
CPC分类号： C03C17/3405 , C03C17/30 , C03C2217/76 , C03C2218/32 , C03C2218/33 , C08G77/24 , C08K5/5406 , C09D5/00 , C09D183/04 , C09D183/08 , C09D183/14 , C09K3/18
摘要： The present invention relates to a treatment agent for obtaining a water slidable film, which is obtained by mixing a straight-chain polydimethylsiloxane having two or three of hydrolysable functional groups at at least one end and having 30-400 of dimethylsiloxane units (Si(CH3)2O), a fluoroalkylsilane having a hydrolysable functional group and having 6-12 of fluorocarbon units (CF2 or CF3), and a solution containing an organic solvent, an acid and water. This treatment agent is characterized in that, based on the total amount of the treatment agent, in terms of weight concentration, 0.2-3.0 wt % of the straight-chain polydimethylsiloxane, 0.2-2.0 wt % of the fluoroalkylsilane, and 0.5-3.5 wt % of the total amount of the straight-chain polydimethylsiloxane and the fluoroalkylsilane are mixed together.
摘要翻译： 本发明涉及一种用于获得水滑动膜的处理剂，其通过在至少一端混合具有两个或三个可水解官能团的直链聚二甲基硅氧烷并具有30-400个二甲基硅氧烷单元（Si（CH 具有可水解官能团并且具有6-12个碳氟化合物单元的氟代烷基硅烷（CF 2 O 2或CF 3） 3N）和含有机溶剂，酸和水的溶液。 该处理剂的特征在于，基于处理剂的总量，以重量浓度计，0.2-3.0重量％的直链聚二甲基硅氧烷，0.2-2.0重量％的氟烷基硅烷和0.5-3.5重量％ 将直链聚二甲基硅氧烷和氟代烷基硅烷的总量的％混合在一起。
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公开(公告)号：US08299169B2
公开(公告)日：2012-10-30
申请号：US12598876
申请日：2008-04-28
CPC分类号： C09D1/00 , C03C1/008 , C03C17/25 , C03C2217/213 , C03C2218/113 , C09D183/04
摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。
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公开(公告)号：US08246848B2
公开(公告)日：2012-08-21
申请号：US12093702
申请日：2006-09-21
IPC分类号： E04B1/74
CPC分类号： C09D5/32 , C03C17/008 , C03C17/009 , C03C17/30 , C03C2217/445 , C03C2217/452 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2218/113 , C08K3/22 , C09D1/00 , C09D7/20 , C09D7/47 , C09D7/61 , C09D183/04
摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。
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公开(公告)号：US09053924B2
公开(公告)日：2015-06-09
申请号：US12898185
申请日：2010-10-05
申请人： Soichi Kumon , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
发明人： Soichi Kumon , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
CPC分类号： H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要： A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要翻译： 一种用于硅晶片（第一清洁剂）的清洁剂至少含有一种水基清洗液和一种防水清洗液，用于在清洁过程中至少提供具有防水性的凹凸图案的凹陷部分。 水性清洗液是将具有与硅晶片中的Si元素和疏水性基团化学结合的反应性部分的防水化合物和至少含有醇溶剂的有机溶剂混合并包含的液体。 利用该清洁剂，可以提高倾向于引起图案塌陷的清洁处理。
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公开(公告)号：US08216670B2
公开(公告)日：2012-07-10
申请号：US12377439
申请日：2007-08-22
CPC分类号： C09D183/06 , C03C1/008 , C03C17/008 , C03C17/009 , C03C2217/213 , C03C2217/231 , C03C2217/445 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2217/948 , C03C2218/113 , C08L83/04 , C09D1/00 , C09D5/004 , C09D5/24 , C09D183/04 , Y10T428/256 , Y10T428/259 , Y10T428/265 , Y10T428/31612
摘要： A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.
摘要翻译： 一种车辆用热线屏蔽玻璃，其特征在于，包括形成在所述玻璃基板的至少一个面上的玻璃基板和热射线屏蔽膜，其中，所述热射线屏蔽膜包括：分散在所述膜中的导电氧化物超微粒子; 以及用于将超细颗粒彼此粘合的二氧化硅粘合剂，所述二氧化硅粘合剂包括通过四烷氧基硅烷和三烷氧基硅烷的水解和缩聚产生的固体内容物。
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公开(公告)号：US20110214685A1
公开(公告)日：2011-09-08
申请号：US12898185
申请日：2010-10-05
申请人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
发明人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
CPC分类号： H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要： A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要翻译： 一种用于硅晶片（第一清洁剂）的清洁剂至少含有一种水基清洗液和一种防水清洗液，用于在清洁过程中至少提供具有防水性的凹凸图案的凹陷部分。 水性清洗液是将具有与硅晶片中的Si元素和疏水性基团化学结合的反应性部分的防水化合物和至少含有醇溶剂的有机溶剂混合并包含的液体。 利用该清洁剂，可以提高倾向于引起图案塌陷的清洁处理。
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