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1.再颁专利Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查公开(公告)号：USRE44216E1
公开(公告)日：2013-05-14
申请号：US12604821
申请日：2009-10-23
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译： 用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。
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2.发明授权Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查公开(公告)号：US07286284B2
公开(公告)日：2007-10-23
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译： 用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。
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3.发明申请Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查公开(公告)号：US20060012873A1
公开(公告)日：2006-01-19
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B21/06
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.
摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。
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4.发明授权公开(公告)号：US06894837B2
公开(公告)日：2005-05-17
申请号：US10626130
申请日：2003-07-24
申请人： Hans-Juergen Dobschal , Thomas Scheruebl , Robert Brunner , Norbert Rosenkranz , Joern Greif-Wuestenbecker
发明人： Hans-Juergen Dobschal , Thomas Scheruebl , Robert Brunner , Norbert Rosenkranz , Joern Greif-Wuestenbecker
摘要： Imaging system for a microscope based on extreme ultraviolet (EUV) radiation. The present invention is directed to a reflective imaging system for an x-ray microscope for examining and object in an object plane, wherein the object is illuminated by rays of a wavelength of less than 100 nm, particularly less than 30 nm, and is imaged in a magnified manner in an image plane. In the imaging system, according to the invention, for a microscope based on extreme ultraviolet (EUV) radiation with wavelengths in the range of less than 100 nm, with a magnification of 0.1× to 1000× and a structural length of less than 5 m, at least one of the imaging optical elements 2 and 3 in the beam path has a diffractive-reflective structure which is arranged on a spherical or plane area and has a non-rotationally symmetric, asymmetric shape. The arrangement according to the invention provides an imaging system which avoids the disadvantages of the prior art and ensures a high imaging quality. The manufacturing cost remains reasonable due to the exclusive use of spherical mirrors.
摘要翻译： 基于极紫外（EUV）辐射的显微镜成像系统。 本发明涉及一种用于检查和物体在物平面中的X射线显微镜的反射成像系统，其中物体被小于100nm，特别是小于30nm的波长的光照射，并被成像 在图像平面中以放大的方式。 在成像系统中，根据本发明，对于具有波长在小于100nm，具有0.1x至1000x的放大倍数和小于5μm的结构长度的基于极紫外（EUV）辐射的显微镜， 光束路径中的成像光学元件2和3中的至少一个具有布置在球形或平面区域上并具有非旋转对称的不对称形状的衍射反射结构。 根据本发明的装置提供了一种避免现有技术的缺点并确保高成像质量的成像系统。 由于专门使用球面镜，制造成本仍然是合理的。
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公开(公告)号：US08970951B2
公开(公告)日：2015-03-03
申请号：US13391996
申请日：2010-08-28
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译： 在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。 因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。 为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。 本发明涉及一种用于可变地设定照明的掩模检查显微镜。 其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。 它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑 光束路径（3,87,88），其相对于物平面光学共轭。 根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。
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公开(公告)号：US08264535B2
公开(公告)日：2012-09-11
申请号：US12597247
申请日：2008-07-11
IPC分类号： H04N7/18
摘要： The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.
摘要翻译： 本发明涉及一种用于分析用于光刻的一组至少两个掩模的方法，其中每个掩模包括总结构的子结构，其将在光刻工艺中被引入晶片的层中，并且总共 通过依次引入子结构，在晶片层中引入结构。 在该方法中，将至少两个掩模中的第一个的第一空间图像记录，数字化并存储在数据结构中。 然后，将至少两个掩模中的第二个的第二个空间图像记录，数字化并存储在数据结构中。 从第一和第二空间图像的数据生成组合图像，该组合图像被表示和/或评估。
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公开(公告)号：US20100157046A1
公开(公告)日：2010-06-24
申请号：US12597247
申请日：2008-07-11
摘要： The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.
摘要翻译： 本发明涉及一种用于分析用于光刻的一组至少两个掩模的方法，其中每个掩模包括总结构的子结构，其将在光刻工艺中被引入晶片的层中，并且总共 通过依次引入子结构，在晶片层中引入结构。 在该方法中，将至少两个掩模中的第一个的第一空间图像记录，数字化并存储在数据结构中。 然后，将至少两个掩模中的第二个的第二个空间图像记录，数字化并存储在数据结构中。 从第一和第二空间图像的数据生成组合图像，该组合图像被表示和/或评估。
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公开(公告)号：US20120162755A1
公开(公告)日：2012-06-28
申请号：US13391996
申请日：2010-08-28
IPC分类号： G02B21/06
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译： 在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。 因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。 为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。 本发明涉及一种用于可变地设定照明的掩模检查显微镜。 其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。 它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑 光束路径（3,87,88），其相对于物平面光学共轭。 根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。
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9.发明申请公开(公告)号：US20070070502A1
公开(公告)日：2007-03-29
申请号：US10554332
申请日：2004-04-20
申请人： Robert Brunner , Hans-Jurgen Dobschal , Jorn Greif-Wustenbecker , Norbert Rosenkranz , Thomas Scherubl
发明人： Robert Brunner , Hans-Jurgen Dobschal , Jorn Greif-Wustenbecker , Norbert Rosenkranz , Thomas Scherubl
CPC分类号： G03F7/70158 , G02B17/00 , G02B19/0019 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G02B21/12 , G02B21/16 , G02B27/1086 , G02B27/14
摘要： The invention relates to an imaging system in which a diffractive optical element is used by both the illumination beam path and the imaging beam path. Said diffractive element operates in the reflection mode or transmission mode according to the specifications of the system design. At least one of the imaging optical elements provided in the beam path of the inventive diffractive beam splitter for imaging systems is used for both the illumination beam path and the imaging beam path. Said element represents a diffractive optical element (DOE) and requires no spatial separation between the imaging beam path and the illumination beam path in the object space by using different diffraction arrays. The number of reflective optical elements can be decreased by using diffractive optical elements, resulting in the cost of the system being reduced and the service life of the optical components being increased by using a low-power EUV source.
摘要翻译： 本发明涉及一种成像系统，其中衍射光学元件由照明光束路径和成像光束路径两者使用。 所述衍射元件根据系统设计的规格在反射模式或透射模式下工作。 设置在本发明的用于成像系统的衍射光束分离器的光束路径中的成像光学元件中的至少一个被用于照明光束路径和成像光束路径。 所述元件表示衍射光学元件（DOE），并且通过使用不同的衍射阵列，不需要成像光束路径和对象空间中的照明光束路径之间的空间分隔。 可以通过使用衍射光学元件来减少反射光学元件的数量，从而降低系统的成本，并且通过使用低功率EUV源来增加光学部件的使用寿命。
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