摘要:
The invention provides a method of making optical fiber devices. The method includes providing an ultrashort subpicosecond laser pulse duration pulse laser for producing a laser output with a wavelength &lgr;, providing a laser output focussing lens having an air working distance ≧3 mm and a ≦1 NA numerical aperture for focussing said laser output, providing a controllable positioning translation stage for receiving an optical fiber device oxide bulk glass body, providing an optical fiber device oxide bulk glass body having a transparency at &lgr; of at least 90%/cm, positioning said oxide bulk glass body with said stage wherein said glass body is received by said stage, focussing said laser output through said laser output focussing lens to produce a subpicosecond laser pulse duration focus proximate the oxide bulk glass body and translating the oxide bulk glass body relative to said subpicosecond laser pulse duration focus wherein said focus traces a hole precursor track pattern through the oxide bulk glass body, acid etching the oxide bulk glass body in an agitated heated acid bath wherein the focussed traced hole precursor track pattern is etched into an optical fiber receiving hole, cleansing the acid etched oxide bulk glass body with the etched optical fiber receiving hole, and inserting an optical fiber into the optical fiber receiving hole to provide a hole contained optical fiber.
摘要:
The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380° K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.
摘要:
The present invention provides methods of generating short wavelength radiation, methods of transporting short wavelength radiation, and apparati used in these methods. One embodiment of the invention provides a method of transporting short wavelength radiation using a photonic band gap fiber. Another embodiment of the invention provides a method of transporting short wavelength radiation using a bundle of photonic band gap fibers. Another embodiment of the invention provides a method of generating ultraviolet radiation using high harmonic generation by pumping a noble gas-filled photonic band gap fiber with a pulsed laser source.
摘要:
A method of writing a pattern, such as a waveguide, in a bulk glass substrate. The bulk glass substrate can be formed from, for example, borosilicate or sulfide or lead glass. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.
摘要:
A birefringent glass composed of a phase-separated glass is provided. The phase-separated glass includes a borosilicate glass in which fluorine and a constituent that tends to crystallize into a high refractive index phase as a consequence of phase separation are included. In one embodiment, the constituent comprises TiO2.
摘要:
The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt % cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10−5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from silver halide-containing glass materials.
摘要:
A porous phosphorous glass composition, as calculated in weight percent on an oxide basis, including, for example: about 30-60 SiO2; about 2-25 P2O5; about 0-5 B2O3; about 20-50 Al2O3; about 0.01-20 Na2O; and about 0-20 K2O, the composition having porosity and pore size properties as defined herein. The disclosure also provides a method for making porous phosphorous glass compositions.
摘要翻译:以氧化物为基准的重量百分数计算的多孔磷硅玻璃组合物,包括例如:约30-60SiO 2; 约2-25 P 2 O 5; 约0-5 B 2 O 3 3; 约20-50 Al 2 O 3 3; 约0.01-20 Na 2 O; 和约0-20K 2 O,所述组合物具有如本文所定义的孔隙率和孔径特性。 本公开还提供了制备多孔磷光玻璃组合物的方法。
摘要:
The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies. One embodiment of the invention relates to an optical element including a transparent photosensitive bulk glass having formed therein a non-waveguiding Bragg grating; and a optical element optical surface for manipulating light. Desirably, the photosensitive bulk glass has a 250 nm absorption less than 10 dB/cm.
摘要:
The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies. The invention includes an optical communications wavelength device for use with wavelength range bands, with the device comprising an input optical waveguide collimator for collimating an input light beam out of an optical waveguide to provide an unguided input light beam including at least one reflective wavelength range band &lgr;R and at least one wavelengths range band &lgr;n; an internal bulk Bragg grating including a transparent photosensitive bulk optical grating medium with an internal modulated refractive index grating with a grating pattern for reflecting the at least one wavelength range band &lgr;R; at least one output coupler for outputting an at least one output wavelength range band; and a substrate structure for securing said bulk Bragg grating relative to the input collimator and the output coupler, with the bulk Bragg grating disposed in the unguided input light beam wherein the at least one wavelengths range band &lgr;n is transmitted through the bulk Bragg grating and the at least one wavelength range band &lgr;R is reflected by the bulk Bragg grating.
摘要:
Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.
摘要翻译:公开了平版印刷方法。 在一种这样的方法中,用于产生具有小于约300nm的波长的紫外光刻辐射的脉冲紫外辐射源,其注量小于10mJ / cm 2 /脉冲和高纯度熔融石英光刻 分子氢浓度在约0.02×10 18分子/ cm 3至约0.18×10 18分子/ cm 3之间的玻璃 SUP>。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成,还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。