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1.发明授权Vacuum coating system comprising a transport unit for transporting substrates 失效真空镀膜系统，包括用于输送基材的输送单元公开(公告)号：US08127712B2
公开(公告)日：2012-03-06
申请号：US12280931
申请日：2007-07-09
申请人： Reinhardt Bauer , Frank Hupka , Andreas Heisig , Johannes Struempfel , Hans-Christian Hecht , Wolfgang Erbkamm
发明人： Reinhardt Bauer , Frank Hupka , Andreas Heisig , Johannes Struempfel , Hans-Christian Hecht , Wolfgang Erbkamm
CPC分类号： B65G37/005 , B65G15/24 , C23C14/568
摘要： A vacuum coating unit having a pair of side by side transport devices for transporting substrates in a transport direction. Each transport device includes at least one first endless conveyor running in the transport direction and having a conveying element guided around at least two guide rollers or pulleys. The conveying element is located at a distance from a guide device extending in the transport direction parallel to the conveying element in such a way that the ends of the substrates can be introduced into the gap between the conveying element and the guide device of the transport devices and can be moved in the transport direction by the displacement of the conveying elements.
摘要翻译： 一种真空镀膜装置，具有一对并排运送装置，用于在输送方向上输送基材。 每个输送装置包括至少一个在输送方向上运行的第一环形输送机，并具有围绕至少两个导辊或滑轮引导的输送元件。 输送元件位于与沿输送方向平行于输送元件延伸的引导装置一定距离处，使得基板的端部能够被引入到输送元件和输送装置的引导装置之间的间隙中 并且可以通过输送元件的位移在输送方向上移动。
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2.发明申请VACUUM COATING SYSTEM COMPRISING A TRANSPORT UNIT FOR TRANSPORTING SUBSTRATES 失效包括用于运输基材的运输单元的真空涂料系统公开(公告)号：US20090173280A1
公开(公告)日：2009-07-09
申请号：US12280931
申请日：2007-07-09
申请人： Reinhardt Bauer , Frank Hupka , Andreas Heisig , Johannes Struempfel , Hans-Christian Hecht , Wolfgang Erbkamm
发明人： Reinhardt Bauer , Frank Hupka , Andreas Heisig , Johannes Struempfel , Hans-Christian Hecht , Wolfgang Erbkamm
IPC分类号： C23C16/54
CPC分类号： B65G37/005 , B65G15/24 , C23C14/568
摘要： A vacuum coating unit with a transport device for transporting substrates in a transport direction, comprises at least one first endless conveyor running in the transport direction and having a conveyor device guided around at least two deflection rollers. The conveyor device is located at a distance from a guide device extending in the transport direction parallel to the conveyor device of the first endless conveyor in such a way that the substrates can be introduced into the gap between the conveyor device and the guide device and can be moved in the transport direction by the displacement of the conveyor device.
摘要翻译： 具有用于沿输送方向输送基材的输送装置的真空涂布单元包括至少一个在输送方向上运行的第一环形输送机，并具有围绕至少两个偏转辊引导的输送装置。 输送装置位于与沿着平行于第一环形输送机的输送装置的输送方向延伸的引导装置的距离上，使得基板可以被引入到输送装置和引导装置之间的间隙中， 通过输送装置的位移沿输送方向移动。
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3.发明授权Transport device, loading device and method for loading and unloading the transport device 失效运输装置，装载装置和运输装置的装卸方法公开(公告)号：US08007223B2
公开(公告)日：2011-08-30
申请号：US11870014
申请日：2007-10-10
申请人： Johannes Struempfel , Reinhardt Bauer , Andreas Heisig , Hans-Christian Hecht , Hartmut Freitag , Heiko Richter , André Ulbricht , Falk Schwerdtfeger
发明人： Johannes Struempfel , Reinhardt Bauer , Andreas Heisig , Hans-Christian Hecht , Hartmut Freitag , Heiko Richter , André Ulbricht , Falk Schwerdtfeger
CPC分类号： C23C14/56 , Y10S414/123
摘要： A transport device for transporting elongated substrates through a vacuum coating system comprises an essentially rectangular frame and two groups of holding elements, which are rotatably mounted on opposite sides of the frame in such a manner that any pair of opposite holding elements can be connected to both ends of a substrate. Furthermore, at least one retainer bar is provided that is operatively connected to a group of holding elements in such a manner that the holding elements of this group are moveable in order to increase or decrease by choice their distance from the holding elements of the other group. Also provided are a loading and unloading device for loading and unloading the transport device, and a method for loading and unloading the transport device.
摘要翻译： 用于通过真空涂覆系统传送细长基材的输送装置包括基本上矩形的框架和两组保持元件，这些保持元件可旋转地安装在框架的相对侧上，使得任何一对相对的保持元件可以连接到两个 底物的末端。 此外，提供了至少一个保持杆，其以这样的方式可操作地连接到一组保持元件，使得该组的保持元件可移动，以便通过选择它们与另一组的保持元件的距离来增加或减少 。 还提供了用于装载和卸载运输装置的装载和卸载装置，以及用于装载和卸载运输装置的方法。
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公开(公告)号：US08033781B2
公开(公告)日：2011-10-11
申请号：US12730683
申请日：2010-03-24
申请人： Johannes Struempfel , Reinhardt Bauer , Andrewas Heisig , Hans-Christian Hecht , Hartmut Freitag , Heiko Richter , Andre Ulbricht , Falk Schwerdtfeger
发明人： Johannes Struempfel , Reinhardt Bauer , Andrewas Heisig , Hans-Christian Hecht , Hartmut Freitag , Heiko Richter , Andre Ulbricht , Falk Schwerdtfeger
IPC分类号： B65G47/34
CPC分类号： C23C14/56 , Y10S414/123
摘要： A transport device for transporting elongated substrates through a vacuum coating system comprises an essentially rectangular frame and two groups of holding elements, which are rotatably mounted on opposite sides of the frame in such a manner that any pair of opposite holding elements can be connected to both ends of a substrate. Furthermore, at least one retainer bar is provided that is operatively connected to a group of holding elements in such a manner that the holding elements of this group are moveable in order to increase or decrease by choice their distance from the holding elements of the other group. Also provided are a loading and unloading device for loading and unloading the transport device, and a method for loading and unloading the transport device.
摘要翻译： 用于通过真空涂覆系统传送细长基材的输送装置包括基本上矩形的框架和两组保持元件，这些保持元件可旋转地安装在框架的相对侧上，使得任何一对相对的保持元件可以连接到两个 底物的末端。 此外，提供了至少一个保持杆，其以这样的方式可操作地连接到一组保持元件，使得该组的保持元件可移动，以便通过选择它们与另一组的保持元件的距离来增加或减少 。 还提供了用于装载和卸载运输装置的装载和卸载装置，以及用于装载和卸载运输装置的方法。
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公开(公告)号：US06942768B2
公开(公告)日：2005-09-13
申请号：US10259973
申请日：2002-09-27
CPC分类号： C23C14/564 , C23C14/562 , C23C14/568
摘要： A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.
摘要翻译： 用于涂覆带状材料的系统，其中带状材料穿过其中存在真空的至少一个处理室，以及至少一个冷却辊。 每个冷却辊的圆周表面上至少有两个磁控溅射源，这些磁控溅射源在磁控管腔室中彼此分开设置，这些磁控管是通过单独的磁控管壁形成的，并允许每个腔室被抽真空，因此磁控管腔中的压力可以 保持比处理室高。 磁控管室壁和磁控溅射源可以安装在平行于冷却辊轴线移动的公共托架上。 结果是在磁控管室壁的清洁中降低了维护成本，同时改善了磁控管室和处理室之间的气体分离。
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公开(公告)号：US20050145488A1
公开(公告)日：2005-07-07
申请号：US10508819
申请日：2003-03-24
CPC分类号： H01J37/3405
摘要： A tube magnetron for a vacuum coating applications such as plasma sputtering is provided with a hollow rotating tube target arrangement and a magnet system. The hollow rotating tube target arrangement has longitudinally extended target plates that are fixed to a target support. The target plates in cross section are arranged adjacent to each other to form a polygon. The magnet system generates a magnetic field which extends through the tube target arrangement. The magnet system is configured so that generated magnet field has in cross section two maxima arranged in the axial longitudinal direction of the tube target arrangement. The tube magnetron is configured for use with sputtering targets that are in the form of target plates. The target plates may be made from ceramics, ceramic-like and/or high-melting point materials. Materials such as ITO, zinc oxide, silicon can be efficiently and uniformly sputter coated on substrates.
摘要翻译： 用于诸如等离子体溅射的真空涂覆应用的管磁控管设置有中空旋转管目标装置和磁体系统。 中空旋转管目标装置具有固定到目标支撑件的纵向延伸的目标板。 横截面中的目标板彼此相邻地布置以形成多边形。 磁体系统产生延伸穿过管目标装置的磁场。 磁体系统构造成使得所产生的磁场在管目标装置的轴向方向上具有两个最大值的横截面。 管磁控管配置为与目标板形式的溅射靶配合使用。 目标板可以由陶瓷，陶瓷样和/或高熔点材料制成。 诸如ITO，氧化锌，硅的材料可以有效地均匀地溅射涂覆在基片上。
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公开(公告)号：US20060225652A1
公开(公告)日：2006-10-12
申请号：US11400856
申请日：2006-04-10
IPC分类号： C23C16/00
CPC分类号： C23C14/566
摘要： The invention concerns an apparatus for vacuum coating of substrates of various sizes that consists of lock chambers at the entrance and at the exit and several processing chambers arranged one behind the other as well as of a conveying system for the sequential transport of substrates with a certain substrate width through the lock chambers and for their continuous transport through the coating chambers. The lock and processing chambers each have a chamber width that corresponds to the substrate width, and the lock chamber is characterized by a loading area AL having a width b and a length l that indicates the size of substrate that can be accommodated. The object of the apparatus according to the invention is to better utilize the coatable area of each processing chamber so that less coating material is wasted. The object is solved by making the ratio R of width to length R=w/l greater than a minimum ratio Rmin where Rmin =0.95−0.019 AL.
摘要翻译： 本发明涉及一种用于真空涂覆各种尺寸的基板的设备，其包括在入口处和出口处的锁定室以及一个彼此相邻布置的多个处理室以及用于以一定的顺序输送基板的输送系统 衬底宽度通过锁定室并且连续地通过涂覆室传送。 锁和处理室各自具有对应于基板宽度的室宽度，并且锁定室的特征在于具有宽度b的负载区域A和表示基板尺寸的长度l 可以容纳。 根据本发明的装置的目的是更好地利用每个处理室的可涂覆区域，从而浪费较少的涂层材料。 通过使宽度与长度R的比R大于最小比R min min来解决该目的，其中R min min = 0.95-0.019A L 。
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8.发明授权公开(公告)号：US08911231B2
公开(公告)日：2014-12-16
申请号：US13376465
申请日：2010-06-18
申请人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
发明人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
CPC分类号： C23C14/541 , C23C14/56
摘要： A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.
摘要翻译： 基板处理装置包括真空室，真空室内的基板处理装置，真空室内的基板输送装置，用于沿着基板输送面中的长度方向引导基板通过基板处理装置;以及装置， 控制基板温度。 衬底温度控制装置包括在衬底传送平面的一侧上的吸热冷却器和可在至少两个不同位置之间选择性移位的绝缘构件，以通过相对于衬底传送平面来改变热吸收冷却器的热屏蔽程度 绝缘构件。
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公开(公告)号：US20120118541A1
公开(公告)日：2012-05-17
申请号：US13376465
申请日：2010-06-18
申请人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
发明人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
IPC分类号： F28F13/00
CPC分类号： C23C14/541 , C23C14/56
摘要： A device for controlling the temperature of substrates in a substrate-treatment system, in which a substrate can be guided in the longitudinal extension of the substrate-treatment system in a substrate transport plane within a vacuum chamber past a treatment device, solves the problem of dynamically shaping a dynamic change of the thermal insulation to control the heat transfer in the substrate and thereby, reduce, in particular, thermal inertias by providing a heat-absorbing cooler side of the substrate transport plane. The heat-absorbing cooler can be shielded, at least partially from the substrate transport plane, using an insulation member.
摘要翻译： 用于控制基板处理系统中的基板的温度的装置，其中基板可以在基板处理系统的纵向延伸中在通过处理装置的真空室内的基板输送平面中被引导，解决了 动态地塑造热绝缘的动态变化以控制衬底中的热传递，从而通过提供衬底传输平面的吸热冷却器侧，特别地减少热惯性。 使用绝缘构件，可以至少部分地从基板输送平面屏蔽吸热式冷却器。
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公开(公告)号：US20100291393A1
公开(公告)日：2010-11-18
申请号：US12842497
申请日：2010-07-23
CPC分类号： C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C17/3694 , C23C14/027 , C23C14/08 , C23C14/352 , Y10T428/31504 , Y10T428/31663
摘要： A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.
摘要翻译： 可退火的层系统包括透明衬底，优选玻璃衬底，以及直接施加到衬底或沉积到衬底上的一个或多个底层的第一层序列。 层序列包括基底近端阻挡层，选择层和底物远侧阻断层。 还提供了即使在临界气候条件和/或基板的未定义条件下也可以进行退火并具有足够质量的层系统的制造方法。 在热处理（退火，弯曲）期间，层系统的颜色位置保持基本稳定，并且颜色位置可以在层系统的低发射率下广泛变化。 为此，第一电介质中间层介于基底近端阻挡层和选择层之间，并被构造为亚化学计量梯度层。
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