公开(公告)号：US12278121B2

公开(公告)日：2025-04-15

申请号：US16986418

申请日：2020-08-06

Applicant: SEMES CO., LTD.

Inventor： Kangseop Yun ,  Seung Hoon Oh ,  Ye Jin Choi ,  Youngil Lee ,  Byungsun Bang ,  Jungbong Choi ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/687

Abstract: The inventive concept provides a support unit for supporting a substrate. The support unit includes a support plate that has an interior space and on which the substrate is placed, a heating member that is provided in the interior space and that heats the substrate placed on the support plate, a heat insulating plate provided in the interior space and disposed under the heating member, a reflective plate provided in the interior space and disposed under the heat insulating plate, and a heat dissipation plate provided in the interior space and disposed under the a reflective plate.

公开(公告)号：US11845113B2

公开(公告)日：2023-12-19

申请号：US17403063

申请日：2021-08-16

Applicant: SEMES Co., Ltd.

Inventor： Ye Jin Choi ,  Byung Sun Bang ,  Tae Ho Kang ,  Jong Won Moon

IPC: H01L21/67 ,  B08B3/10 ,  B08B3/04 ,  B08B3/08 ,  B08B3/02

CPC classification number: B08B3/10 ,  B08B3/022 ,  B08B3/041 ,  B08B3/08 ,  H01L21/67051

Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

公开(公告)号：US20220168784A1

公开(公告)日：2022-06-02

申请号：US17403063

申请日：2021-08-16

Applicant: SEMES Co., Ltd.

Inventor： Ye Jin Choi ,  Byung Sun Bang ,  Tae Ho Kang ,  Jong Won Moon

IPC: B08B3/10 ,  B08B3/02 ,  B08B3/08 ,  B08B3/04

Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

公开(公告)号：US11798822B2

公开(公告)日：2023-10-24

申请号：US17061629

申请日：2020-10-02

Applicant: SEMES CO., LTD.

Inventor： Ye Jin Choi ,  Daehun Kim ,  Kangseop Yun

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  H01L21/6715 ,  H01L21/67109

Abstract: Disclosed is a support unit for supporting a substrate. The support unit includes a support plate having an inner space defined therein, a heating member disposed in the inner space and emitting light for heating the substrate supported on the support unit, and a reflective member disposed along an edge region of the support plate and reflecting thermal energy of the light to an edge region of the substrate supported on the support unit.

公开(公告)号：US11765793B2

公开(公告)日：2023-09-19

申请号：US16932286

申请日：2020-07-17

Applicant: SEMES CO., LTD.

Inventor： Muhyeon Lee ,  Gui Su Park ,  Byungsun Bang ,  Jungbong Choi ,  Youngil Lee ,  Kangseop Yun ,  Seung Eun Na ,  Ye Jin Choi ,  Kyounghwan Kim

IPC: H05B3/06 ,  H01L21/683 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687

CPC classification number: H05B3/0047 ,  H01L21/6708 ,  H01L21/683 ,  H01L21/68714 ,  H05B3/06 ,  H01L21/67 ,  H01L21/67005 ,  H01L21/67115

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.