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公开(公告)号：US12205833B2
公开(公告)日：2025-01-21
申请号：US18202396
申请日：2023-05-26
Applicant: SEMES CO., LTD.
Inventor： Sun Mi Kim , Jisu Hong , Moonsik Choi , Oh Jin Kwon
IPC: H01L21/67 , H01L21/027
Abstract: The inventive concept provides an apparatus and method for removing a film formed on a substrate. A method for treating the substrate includes a primary solvent dispensing step of dispensing an organic solvent onto the substrate to remove a photoresist film on the substrate and an ozone dispensing step of dispensing a liquid containing ozone onto the substrate to remove organic residue on the substrate, after the primary solvent dispensing step.
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2.发明授权公开(公告)号：US11897005B2
公开(公告)日：2024-02-13
申请号：US17987062
申请日：2022-11-15
Applicant: SEMES CO., LTD.
Inventor： Sunmi Kim , Oh Jin Kwon , Sehyeong Choi
Abstract: The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
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公开(公告)号：US11520245B2
公开(公告)日：2022-12-06
申请号：US17404240
申请日：2021-08-17
Applicant: SEMES Co., Ltd.
Inventor： Oh Jin Kwon , Ji Su Hong , Sun Mi Kim
IPC: G03F7/20
Abstract: A substrate processing apparatus and method for effectively removing an organic material such as a photoresist without using sulfuric acid are provided. The substrate processing apparatus includes a support module, in which a substrate is inverted and seated, and an ultraviolet light source is installed, wherein the substrate is arranged so that one surface of the substrate faces the support module, and the ultraviolet light source irradiates ultraviolet rays to one surface of the substrate; a nozzle installed in the support module; and a fluid supply module for supplying a fluid to one surface of the substrate through the nozzle.
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公开(公告)号：US11735437B2
公开(公告)日：2023-08-22
申请号：US17132008
申请日：2020-12-23
Applicant: SEMES CO., LTD.
Inventor： Boong Kim , Oh Jin Kwon , Sungho Jang , Joo Jib Park
IPC: H01L21/67 , F26B25/14 , H01L21/677 , H01L21/687
CPC classification number: H01L21/67028 , F26B25/14 , H01L21/6719 , H01L21/67034 , H01L21/67051 , H01L21/67109 , H01L21/67126 , H01L21/67178 , H01L21/67748 , H01L21/6875
Abstract: Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.
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公开(公告)号：US09975151B2
公开(公告)日：2018-05-22
申请号：US14749010
申请日：2015-06-24
Applicant: Semes Co., Ltd.
Inventor： Tae Keun Kim , Oh Jin Kwon , Ki Hoon Choi
CPC classification number: B08B3/10 , B08B3/12 , B08B7/028 , H01L21/67017 , H01L21/67051
Abstract: Embodiments of the inventive concepts provide an apparatus and a method for treating a substrate. The apparatus includes a substrate support unit supporting the substrate, and a liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle discharging the treatment solution to the substrate, a liquid supply line supplying the treatment solution to the nozzle, a mixing member installed on the liquid supply line, a mixing space formed within the mixing member, and a gas supply line connected to the mixing member to supply a gas into the mixing space. The mixing member includes a body within which the mixing space is formed, and an inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles.
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Patent Agency Ranking
公开(公告)号：US20180102263A1
公开(公告)日：2018-04-12
申请号：US15834512
申请日：2017-12-07
Applicant: SEMES CO., LTD.
Inventor： Boong Kim , Oh Jin Kwon , Sungho Jang , Joo Jib Park
IPC: H01L21/67 , H01L21/687 , H01L21/677
CPC classification number: H01L21/67028 , F26B25/14 , H01L21/67034 , H01L21/67051 , H01L21/67109 , H01L21/67126 , H01L21/67178 , H01L21/6719 , H01L21/67748 , H01L21/6875
Abstract: Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.
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公开(公告)号：US09275852B2
公开(公告)日：2016-03-01
申请号：US13905754
申请日：2013-05-30
Applicant: Semes Co., Ltd.
Inventor： KiBong Kim , Boong Kim , Gil Hun Song , Oh Jin Kwon
CPC classification number: H01L21/02101 , B08B7/0021 , F26B21/12 , F26B21/14 , H01L21/67017 , H01L21/67034 , H01L21/67051
Abstract: Provided is an apparatus for treating a substrate using a supercritical fluid. The substrate treating apparatus includes a housing, a support member disposed within the housing to support the substrate, a supercritical fluid supply unit in which the supercritical fluid is stored, a supply tube connecting the supercritical fluid supply unit to the housing to adjust an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing, and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube. A switching valve opening or closing the vent tube is disposed in the vent tube.
Abstract translation: 提供了一种使用超临界流体处理基板的装置。 基板处理装置包括壳体，设置在壳体内以支撑基板的支撑构件，超临界流体供应单元，超临界流体被储存在该超临界流体供应单元中，供应管将超临界流体供应单元连接到壳体以调节 从超临界流体供给单元供给到壳体中的超临界流体和从供给管分支以排出残留在供给管中的超临界流体的通气管。 打开或关闭排气管的切换阀设置在排气管中。
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公开(公告)号：US09922850B2
公开(公告)日：2018-03-20
申请号：US14744563
申请日：2015-06-19
Applicant: SEMES CO., LTD.
Inventor： Oh Jin Kwon , Seong-Soo Kim
IPC: H01L21/67
CPC classification number: H01L21/67051
Abstract: Disclosed is a substrate treating apparatus which includes a treating container having a treating space therein and including a plurality of collecting vessels surrounding the treating space and provided such that inlets for inputting a fluid in the treating space are vertically stacked on each other, a support unit supporting a substrate in the treating space, a solution supply unit supplying a treating solution to the substrate supported by the support unit, and elevation units respectively joined with the collecting vessels and lifting up and down the collecting vessels. Each of the elevation units includes a base having a ring shape and joined with a corresponding collecting vessel, an elevation load joined with the base, and a driver lifting up and down the elevation load.
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公开(公告)号：US20130318812A1
公开(公告)日：2013-12-05
申请号：US13905676
申请日：2013-05-30
Applicant: SEMES CO., LTD.
Inventor： Boong Kim , Ki Bong Kim , Gil Hun Song , Oh Jin Kwon
IPC: F26B21/12
CPC classification number: F26B21/12 , F26B5/005 , H01L21/67017 , H01L21/67034
Abstract: Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.
Abstract translation: 提供了一种用于干燥基板的装置和方法。 该装置包括壳体，基板支撑构件，流体供应构件和排出构件。 壳体提供进行干燥处理的空间。 衬底支撑构件设置在壳体中以支撑衬底。 流体供给构件包括用于将超临界状态的处理流体供给到壳体的供给管线。 排出构件包括用于从壳体排出工艺流体的排出管线。 这里，供应管线包括用于以第一供应流量将工艺流体供应到壳体的第一供应管线和设置成以第二供应流量将工艺流体供应到壳体的第二供应管线。
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10.发明授权公开(公告)号：US11529655B2
公开(公告)日：2022-12-20
申请号：US17009051
申请日：2020-09-01
Applicant: SEMES CO., LTD.
Inventor： Sunmi Kim , Oh Jin Kwon , Sehyeong Choi
Abstract: The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
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