公开(公告)号：US07800081B2

公开(公告)日：2010-09-21

申请号：US12173967

申请日：2008-07-16

申请人： Stephen Moffatt ,  Joseph M. Ranish

发明人： Stephen Moffatt ,  Joseph M. Ranish

IPC分类号： H01L21/26

CPC分类号： H01L21/67115 ,  H01L21/26513 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/324 ,  H01L29/66575

摘要： The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

摘要翻译： 本发明总体上描述了用于对衬底的期望区域进行退火处理的设备和方法。 在一个实施例中，使用闪光灯或激光装置将电磁能量的脉冲传送到基板。 脉冲可以是约1nsec至约10msec长，并且每个脉冲具有比熔化基底材料所需的能量更少的能量。 脉冲之间的间隔通常足够长以允许由每个脉冲施加的能量完全消散。 因此，每个脉冲完成微退火循环。 脉冲可以一次被输送到整个基板，或者一次被传送到基板的一部分。 另外的实施例提供了用于为辐射组件供电的装置，以及用于检测脉冲在衬底上的影响的装置。

公开(公告)号：US20090120924A1

公开(公告)日：2009-05-14

申请号：US12203696

申请日：2008-09-03

申请人： STEPHEN MOFFATT ,  Joseph M. Ranish

发明人： STEPHEN MOFFATT ,  Joseph M. Ranish

IPC分类号： F27D11/00

CPC分类号： H01L21/324 ,  B23K26/0626 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/02667 ,  H01L21/26506 ,  H01L21/2658 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/67115 ,  H01L29/66575

摘要： The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

公开(公告)号：US20100297856A1

公开(公告)日：2010-11-25

申请号：US12853155

申请日：2010-08-09

申请人： Stephen Moffatt ,  Joseph M. Ranish

发明人： Stephen Moffatt ,  Joseph M. Ranish

IPC分类号： H01L21/268 ,  B23K26/00

CPC分类号： H01L21/324 ,  H01L21/26513 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/67115 ,  H01L29/66575

摘要： The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

摘要翻译： 本发明总体上描述了用于对衬底的期望区域进行退火处理的设备和方法。 在一个实施例中，使用闪光灯或激光装置将电磁能量的脉冲传送到基板。 脉冲可以是约1nsec至约10msec长，并且每个脉冲具有比熔化基底材料所需的能量更少的能量。 脉冲之间的间隔通常足够长以允许由每个脉冲施加的能量完全消散。 因此，每个脉冲完成微退火循环。 脉冲可以一次被输送到整个基板，或者一次被传送到基板的一部分。 另外的实施例提供了用于为辐射组件供电的装置，以及用于检测脉冲在衬底上的影响的装置。

公开(公告)号：US20090121157A1

公开(公告)日：2009-05-14

申请号：US12173967

申请日：2008-07-16

申请人： STEPHEN MOFFATT ,  Joseph M. Ranish

发明人： STEPHEN MOFFATT ,  Joseph M. Ranish

IPC分类号： H01L21/00

CPC分类号： H01L21/67115 ,  H01L21/26513 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/324 ,  H01L29/66575

摘要： The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

摘要翻译： 本发明总体上描述了用于对衬底的期望区域进行退火处理的设备和方法。 在一个实施例中，使用闪光灯或激光装置将电磁能量的脉冲传送到基板。 脉冲可以是约1nsec至约10msec长，并且每个脉冲具有比熔化基底材料所需的能量更少的能量。 脉冲之间的间隔通常足够长以允许由每个脉冲施加的能量完全消散。 因此，每个脉冲完成微退火循环。 脉冲可以一次被输送到整个基板，或者一次被传送到基板的一部分。 另外的实施例提供了用于为辐射组件供电的装置，以及用于检测脉冲在衬底上的影响的装置。

公开(公告)号：US20140073145A1

公开(公告)日：2014-03-13

申请号：US13774741

申请日：2013-02-22

申请人： Stephen Moffatt ,  Joseph M. Ranish

发明人： Stephen Moffatt ,  Joseph M. Ranish

IPC分类号： H01L21/324 ,  H01L21/67 ,  B23K26/00 ,  H01L21/268

CPC分类号： H01L21/324 ,  B23K26/0626 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/02667 ,  H01L21/26506 ,  H01L21/2658 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/67115 ,  H01L29/66575

摘要： The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

摘要翻译： 本发明总体上描述了用于对衬底的期望区域进行退火处理的设备和方法。 在一个实施例中，使用闪光灯或激光装置将电磁能量的脉冲传送到基板。 脉冲可以是约1nsec至约10msec长，并且每个脉冲具有比熔化基底材料所需的能量更少的能量。 脉冲之间的间隔通常足够长以允许由每个脉冲施加的能量完全消散。 因此，每个脉冲完成微退火循环。 脉冲可以一次被输送到整个基板，或者一次被传送到基板的一部分。 另外的实施例提供了用于为辐射组件供电的装置，以及用于检测脉冲在衬底上的影响的装置。

公开(公告)号：US09905444B2

公开(公告)日：2018-02-27

申请号：US13785539

申请日：2013-03-05

申请人： Joseph M. Ranish

发明人： Joseph M. Ranish

IPC分类号： G02B17/00 ,  H01L21/02 ,  H01L21/67

CPC分类号： H01L21/02104 ,  G02B17/002 ,  H01L21/67115

摘要： Embodiments described herein generally relate to apparatus for heating substrates. The apparatus generally include a process chamber having a substrate support therein. A plurality of lamps is positioned to provide radiant energy through an optically transparent dome to a substrate positioned on the substrate support. A light focusing assembly is positioned within the chamber to influence heating and temperature distribution on the substrate and to facilitate formation of a film on a substrate having uniform properties, such as density. The light focusing assembly can include one or more reflectors, light pipes, or refractive lenses.

公开(公告)号：US08821643B2

公开(公告)日：2014-09-02

申请号：US13674737

申请日：2012-11-12

申请人： Balasubramanian Ramachandran ,  Tae Jung Kim ,  Jung Hoon Sun ,  Joung Woo Lee ,  Hwa Joong Lim ,  Sang Phil Lee ,  Joseph M. Ranish

发明人： Balasubramanian Ramachandran ,  Tae Jung Kim ,  Jung Hoon Sun ,  Joung Woo Lee ,  Hwa Joong Lim ,  Sang Phil Lee ,  Joseph M. Ranish

IPC分类号： B08B7/00

CPC分类号： B08B5/00 ,  B08B7/00 ,  B08B7/0071 ,  H01L21/324

摘要： A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.

摘要翻译： 一种清洗用于退火掺杂晶圆基板的室的方法。 在一个实施方案中，该方法提供了在通过使一种或多种挥发气体进入退火室中的掺杂衬底的退火处理之后去除在退火室中沉积的掺杂剂，施加热量以挥发退火室中沉积的掺杂剂，并将该室排出 从退火室中除去挥发的掺杂剂。

公开(公告)号：US08765618B2

公开(公告)日：2014-07-01

申请号：US13485699

申请日：2012-05-31

申请人： Dean Jennings ,  Haifan Liang ,  Mark Yam ,  Vijay Parihar ,  Abhilash J. Mayur ,  Aaron Muir Hunter ,  Bruce E. Adams ,  Joseph M. Ranish

发明人： Dean Jennings ,  Haifan Liang ,  Mark Yam ,  Vijay Parihar ,  Abhilash J. Mayur ,  Aaron Muir Hunter ,  Bruce E. Adams ,  Joseph M. Ranish

IPC分类号： H01L21/268

CPC分类号： B23K26/0608 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/073 ,  B23K26/0732 ,  B23K26/0736 ,  B23K26/0738 ,  B23K26/352 ,  H01L21/02675 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/324

摘要： A thermal processing apparatus and method in which a first laser source, for example, a CO2 emitting at 10.6 μm is focused onto a silicon wafer as a line beam and a second laser source, for example, a GaAs laser bar emitting at 808 nm is focused onto the wafer as a larger beam surrounding the line beam. The two beams are scanned in synchronism in the direction of the narrow dimension of the line beam to create a narrow heating pulse from the line beam when activated by the larger beam. The energy of GaAs radiation is greater than the silicon bandgap energy and creates free carriers. The energy of the CO2 radiation is less than the silicon bandgap energy so silicon is otherwise transparent to it, but the long wavelength radiation is absorbed by the free carriers.

公开(公告)号：USRE44712E1

公开(公告)日：2014-01-21

申请号：US13288586

申请日：2011-11-03

申请人： Joseph M. Ranish ,  Khurshed Sorabji

发明人： Joseph M. Ranish ,  Khurshed Sorabji

IPC分类号： H01J5/48

CPC分类号： H01K1/58 ,  H01K1/46 ,  H01L21/67115

摘要： A lamp assembly adapted for use in a substrate thermal processing chamber to heat the substrate to temperatures up to at least about 1100° C. is disclosed. In one embodiment, the lamp assembly comprises a bulb enclosing at least one radiation generating filament attached to a pair of leads, a lamp base configured to receive the pair of leads, a sleeve having a wall thickness of at least about 0.013 inches and a potting compound having a thermal conductivity greater than about 100 W/(K-m).

摘要翻译： 公开了适用于基板热处理室以将基板加热至高达至少约1100℃的温度的灯组件。 在一个实施例中，灯组件包括封闭连接到一对引线的至少一个辐射生成细丝的灯泡，被配置为容纳一对引线的灯座，具有至少约0.013英寸的壁厚的套管和一个灌封 具有大于约100W /（Km）的热导率的化合物。

公开(公告)号：US20140004716A1

公开(公告)日：2014-01-02

申请号：US14012473

申请日：2013-08-28

申请人： Blake R. Koelmel ,  Norman L. Tam ,  Joseph M. Ranish

发明人： Blake R. Koelmel ,  Norman L. Tam ,  Joseph M. Ranish

IPC分类号： H01L21/263

CPC分类号： H01L21/2636 ,  H01L21/67098 ,  H01L21/67115

摘要： Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.

摘要翻译： 描述了用于处理衬底和控制衬底的加热和冷却的方法和设备。 提供在第一波长范围内的辐射的辐射源将衬底加热到​​预定温度范围内，所述衬底吸收第一波长范围内的第二波长范围内且在预定温度范围内的辐射。 滤光器防止第二波长范围内的至少一部分辐射到达基板。