公开(公告)号：US11786990B2

公开(公告)日：2023-10-17

申请号：US16747490

申请日：2020-01-20

Applicant: Samsung Display Co., Ltd.

Inventor： Jooseob Ahn ,  Taekil Oh ,  Gyoowan Han ,  Yeonghwan Ko ,  Yoongyeong Bae

IPC: B23K26/06 ,  B23K26/073 ,  B23K26/382 ,  B23K26/082 ,  B23K26/362 ,  B23K103/00

CPC classification number: B23K26/0604 ,  B23K26/0648 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/362 ,  B23K26/382 ,  B23K2103/50

Abstract: A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.

公开(公告)号：US11752577B2

公开(公告)日：2023-09-12

申请号：US16680148

申请日：2019-11-11

Applicant: Samsung Display Co., Ltd.

Inventor： Yeonghwan Ko ,  Taekil Oh ,  Gyoowan Han ,  Jooseob Ahn ,  Yoongyeong Bae

IPC: B23K26/36 ,  B23K26/06 ,  B23K26/362 ,  G02B27/10 ,  G02B19/00 ,  G02B27/28 ,  B23K26/0622 ,  B23K26/073 ,  B23K26/067

CPC classification number: B23K26/362 ,  B23K26/0604 ,  B23K26/067 ,  B23K26/0622 ,  B23K26/0626 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/073 ,  G02B19/0009 ,  G02B27/1093 ,  G02B27/283

Abstract: A laser apparatus may include a laser generator generating at least one a laser beam, which is used as an input light, an optical system converting the input light, which is provided from the laser generator, into a plurality of pattern lights, and a stage, on which a target object is loaded. The output light may be irradiated onto the target object. The optical system may divide the input light into a plurality of divided lights, and the pattern lights may be produced by constructive interference of the plurality of divided lights. A diameter of each of the pattern lights may be smaller than a diameter of the input light.

公开(公告)号：US20200230740A1

公开(公告)日：2020-07-23

申请号：US16747490

申请日：2020-01-20

Applicant: Samsung Display Co., Ltd.

Inventor： Jooseob AHN ,  Taekil Oh ,  Gyoowan Han ,  Yeonghwan Ko ,  Yoongyeong Bae

IPC: B23K26/06 ,  B23K26/073 ,  B23K26/362 ,  B23K26/382 ,  B23K26/082

Abstract: A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.

公开(公告)号：US11358240B2

公开(公告)日：2022-06-14

申请号：US15973462

申请日：2018-05-07

Applicant: Samsung Display Co., Ltd.

Inventor： Taekil Oh ,  Gyoowan Han ,  Wonyong Kim ,  Seungho Myoung ,  Jaeseok Park ,  Alexander Voronov ,  Jinhong Jeun

IPC: B23K26/362 ,  C22C38/08 ,  B23K26/067 ,  B23K26/082 ,  B23K26/06 ,  B23K26/382 ,  B23K103/02

Abstract: A method of manufacturing a deposition mask includes: a splitting process in which a laser beam irradiated from a light source is split into a plurality of laser beams; a scanning process in which the plurality of laser beams are simultaneously scanned onto the mask substrate; and a tuning process in which irradiation states of the plurality of laser beams are finely changed to correspond to shapes of the plurality of pattern holes while the plurality of laser beams are scanned.

公开(公告)号：US20190148641A1

公开(公告)日：2019-05-16

申请号：US16138710

申请日：2018-09-21

Applicant: Samsung Display Co., Ltd.

Inventor： Wonyong Kim ,  Gyoowan Han ,  Taekkyo Kang ,  Seungho Myoung ,  Taekil Oh

IPC: H01L51/00 ,  H01L51/56 ,  C23C16/04 ,  B23K26/364

Abstract: An apparatus for manufacturing a mask is provided. The apparatus includes a stage on which a pre-mask is disposed, and a laser irradiation device including a laser generation member, an optical system for controlling a shape of a laser beam, and a scanner for adjusting a path of a laser beam that has the shape controlled by the optical system. The pre-mask includes a first pattern groove defined on a front surface and a second pattern groove defined on a rear surface that corresponds to the front surface. A first portion and a second portion are defined in a first direction that is a thickness direction of the pre-mask. The laser beam with the controlled shape is irradiated to the second portion of the pre-mask in a second direction crossing the first direction, a mask having an opening, in which the second portion is removed, is provided.