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公开(公告)号：US11818745B2
公开(公告)日：2023-11-14
申请号：US17043637
申请日：2019-04-12
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaewon Kang , Hojoong Kwon , Soomin Ko , Byunggook Kim , Myungkwang Byun , Jaehee Cho
IPC: H04W72/543 , H04W4/70 , H04W72/23
CPC classification number: H04W72/543 , H04W4/70 , H04W72/23
Abstract: The present disclosure relates to a communication technique for converging a 5G communication system for supporting a higher data transfer rate beyond a 4G system with IoT technology, and a system therefor. The present disclosure may be applied to intelligent services (for example, smart homes, smart buildings, smart cities, smart cars or connected cars, health care, digital education, retail business, security and safety-related services, etc.) on the basis of 5G communication technology and IoT-related technology. The present disclosure relates to a method for assigning transmission resources including an uplink (UL)-dedicated region and a downlink (DL)-dedicated region, the method comprising: a step for identifying a ratio of the DL-dedicated region to the UL-dedicated region; a step for changing the ratio of the DL-dedicated region to the UL-dedicated region by using at least one of a utilization rate and electric field characteristic information of the transmission resources; and a step for assigning the UL-dedicated region and the DL-dedicated region according to the changed ratio of the DL-dedicated region to the UL-dedicated region.
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公开(公告)号：US10274820B2
公开(公告)日：2019-04-30
申请号：US15919653
申请日：2018-03-13
Applicant: Samsung Electronics Co., Ltd.
Inventor： Hwanchul Jeon , Munja Kim , Sungwon Kwon , Byunggook Kim , Roman Chalykh , Yongseok Jung , Jaehyuck Choi
Abstract: A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.
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3.发明授权公开(公告)号：US10115562B2
公开(公告)日：2018-10-30
申请号：US15252828
申请日：2016-08-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Suyoung Lee , Tamamushi Shuichi , Byunggook Kim , Byoungsup Ahn
IPC: H01J37/302 , H01J37/04 , H01J37/317
Abstract: A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.
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4.发明授权公开(公告)号：US09703186B2
公开(公告)日：2017-07-11
申请号：US14755693
申请日：2015-06-30
Applicant: Samsung Electronics Co., Ltd.
Inventor： Mun Ja Kim , Byunggook Kim , Jongju Park , Jaehyuck Choi
CPC classification number: G03F1/62
Abstract: Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.
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公开(公告)号：US20210026249A1
公开(公告)日：2021-01-28
申请号：US16593149
申请日：2019-10-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Byunghoon Lee , Changyoung Jeong , Byunggook Kim , Maenghyo Cho , Muyoung Kim , Junghwan Moon , Sungwoo Park , Hyungwoo Lee , Joonmyung Choi
IPC: G03F7/20 , G05B19/4097 , H01L21/027
Abstract: There are provided a lithography method capable of selecting best resist and a semiconductor device manufacturing method and exposure equipment based on the lithography method. The lithography method includes estimating a shape of a virtual resist pattern based on a multi-scale simulation for resist, forming a test resist pattern by performing exposure on selected resist based on the simulation result, comparing the test resist pattern with the virtual resist pattern, and forming a resist pattern on an object to be patterned by using the resist when an error between the test resist pattern and the virtual resist pattern is in an allowable range.
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Patent Agency Ranking
公开(公告)号：US10897749B2
公开(公告)日：2021-01-19
申请号：US16382911
申请日：2019-04-12
Applicant: Samsung Electronics Co., Ltd.
Inventor： Soomin Ko , Byunggook Kim , Jaewon Kang , Hojoong Kwon , Yongsang Kim , Myungkwang Byun , Jinbong Chang , Youngmin Cho , Jaehee Cho , Kiseob Hong
Abstract: Disclosed is a method of allocating time resources of a downlink (DL) physical control channel, including scheduling transmission of DL data in a first time resource, and scheduling transmission of uplink (UL) data in a second time resource starting after the first time resource ends, wherein an end time point of the first time resource is changed based on an amount of the DL data and is less than or equal to a first maximum value.
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公开(公告)号：US20190320418A1
公开(公告)日：2019-10-17
申请号：US16382911
申请日：2019-04-12
Applicant: Samsung Electronics Co., Ltd.
Inventor： Soomin Ko , Byunggook Kim , Jaewon Kang , Hojoong Kwon , Yongsang Kim , Myungkwang Byun , Jinbong Chang , Youngmin Cho , Jaehee Cho , Kiseob Hong
Abstract: Disclosed is a method of allocating time resources of a downlink (DL) physical control channel, including scheduling transmission of DL data in a first time resource, and scheduling transmission of uplink (UL) data in a second time resource starting after the first time resource ends, wherein an end time point of the first time resource is changed based on an amount of the DL data and is less than or equal to a first maximum value.
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公开(公告)号：US12072637B2
公开(公告)日：2024-08-27
申请号：US17971297
申请日：2022-10-21
Applicant: Samsung Electronics Co., Ltd.
Inventor： Byunghoon Lee , Changyoung Jeong , Byunggook Kim , Maenghyo Cho , Muyoung Kim , Junghwan Moon , Sungwoo Park , Hyungwoo Lee , Joonmyung Choi
IPC: G03F7/00 , G05B19/4097 , H01L21/027
CPC classification number: G03F7/705 , G05B19/4097 , H01L21/0273 , G05B2219/45028
Abstract: There are provided a lithography method capable of selecting best resist and a semiconductor device manufacturing method and exposure equipment based on the lithography method. The lithography method includes estimating a shape of a virtual resist pattern based on a multi-scale simulation for resist, forming a test resist pattern by performing exposure on selected resist based on the simulation result, comparing the test resist pattern with the virtual resist pattern, and forming a resist pattern on an object to be patterned by using the resist when an error between the test resist pattern and the virtual resist pattern is in an allowable range.
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公开(公告)号：US11985653B2
公开(公告)日：2024-05-14
申请号：US17609228
申请日：2020-05-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sungnam Hong , Byunggook Kim , Okyoung Choi , Hojoong Kwon , Myungkwang Byun , Jiyun Seol , Kiseob Hong
IPC: H04W72/1263 , H04W72/0446 , H04W72/0453 , H04W72/542
CPC classification number: H04W72/1263 , H04W72/0446 , H04W72/0453 , H04W72/542
Abstract: The present disclosure relates to a 5th (5G) generation or pre-5G communication system for supporting a higher data transmission rate beyond a 4th (4G) generation communication system such as long term evolution (LTE). An operating method of a base station in a wireless communication system may include identifying a resource for transmitting at least one sequence for interference measurement of another base station, based on information received from a management device, and transmitting the at least one sequence through the resource, the information received from the management device may include information of the at least one sequence and the resource, and the information of the at least one sequence and the resource may be generated based on a grouping result of base stations based on an operating frequency.
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公开(公告)号：US11617083B2
公开(公告)日：2023-03-28
申请号：US16868999
申请日：2020-05-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Byunggook Kim , Okyoung Choi , Sungnam Hong , Hojoong Kwon , Myungkwang Byun , Jiyun Seol , Kiseob Hong
IPC: H04W12/12 , H04W12/122 , H04W24/10 , H04L5/14 , H04W72/0446 , H04W72/04 , H04L5/00
Abstract: The disclosure relates to a pre-5th-generation (5G) or 5G communication system to be provided for supporting higher data rates beyond 4th-generation (4G) communication system, such as long term evolution (LTE). A method for operating a management device in a wireless communication system is provided. The method includes obtaining measurement results of a plurality of cells respectively, identifying an aggressor cell and a victim cell by atmospheric interference among the plurality of the cells, based on the measurement results, and performing interference control on at least one of the aggressor cell or the victim cell, wherein the measurement results include interference information related to a downlink signal of at least one other cell measured in an uplink resource duration of a measurement cell and cell information of the at least one other cell.
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