公开(公告)号：US09466490B2

公开(公告)日：2016-10-11

申请号：US14740779

申请日：2015-06-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sanghyun Kim ,  Chalykh Roman ,  Jongju Park ,  Donggun Lee ,  Seongsue Kim

IPC: H01L21/268 ,  H01L21/324 ,  B23K26/352 ,  B23K26/354 ,  H01L21/027 ,  B23K26/00 ,  B23K26/06 ,  B23K26/073 ,  G03F1/24 ,  G02B27/09 ,  H01L21/033

CPC classification number: H01L21/268 ,  B23K26/037 ,  B23K26/06 ,  B23K26/064 ,  B23K26/073 ,  B23K26/352 ,  B23K26/354 ,  G02B27/0927 ,  G02B27/0955 ,  G02B27/0977 ,  G02B27/0988 ,  G03F1/24 ,  H01L21/0274 ,  H01L21/0275 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/324

Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.