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公开(公告)号:US10266390B2
公开(公告)日:2019-04-23
申请号:US14925345
申请日:2015-10-28
发明人: Shang-Ying Tsai , Hsin-Ting Huang , Lung Yuan Pan , Jung-Huei Peng , Hung-Hua Lin , Yao-Te Huang
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
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公开(公告)号:US20220311357A1
公开(公告)日:2022-09-29
申请号:US17842101
申请日:2022-06-16
发明人: Chiao-Chun Hsu , Chih-Ming Chen , Chung-Yi Yu , Lung Yuan Pan
IPC分类号: H02N1/00
摘要: In some embodiments, the present disclosure relates to a microelectromechanical system (MEMS) comb actuator including a comb structure. The comb structure includes a support layer having a first material and a plurality of protrusions extending away from a first surface of the support layer in a first direction. The plurality of protrusions are also made of the first material. The plurality of protrusions are separated along a second direction parallel to the first surface of the support layer. The MEMS comb actuator may further include a dielectric liner structure that continuously and completely covers the first surface of the support layer and outer surfaces of the plurality of protrusions. The dielectric liner structure includes a connective portion that continuously connects topmost surfaces of at least two of the plurality of protrusions.
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公开(公告)号:US20190248646A1
公开(公告)日:2019-08-15
申请号:US16390149
申请日:2019-04-22
发明人: Shang-Ying Tsai , Hung-Hua Lin , Hsin-Ting Huang , Lung Yuan Pan , Jung-Huei Peng , Yao-Te Huang
IPC分类号: B81B7/00 , H01G5/18 , G01P15/125 , B81C1/00 , G01P15/08
CPC分类号: B81B7/0006 , B81B2203/0307 , B81C1/00039 , B81C1/00134 , B81C1/00166 , B81C1/00341 , G01P15/0802 , G01P15/125 , G01P2015/0871 , H01G5/18 , H01L28/60
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
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公开(公告)号:US20230275012A1
公开(公告)日:2023-08-31
申请号:US17682238
申请日:2022-02-28
发明人: Lung Yuan Pan
IPC分类号: H01L23/498 , H01L23/00 , H01L21/768
CPC分类号: H01L23/49827 , H01L23/49838 , H01L24/16 , H01L21/76898 , H01L2224/16146
摘要: Various embodiments of the present disclosure are directed towards an apparatus comprising a semiconductor substrate. A conductive pillar is disposed in the semiconductor substrate. An isolation region is disposed in the semiconductor substrate and extends laterally around the conductive pillar. The isolation region is configured to electrically isolate the conductive pillar from a surrounding portion of the semiconductor substrate. An opening is disposed in the isolation region. A dielectric anchor is disposed in the isolation region. The dielectric anchor extends vertically through the semiconductor substrate along a side of the opening. The dielectric anchor anchors the conductive pillar to the semiconductor substrate.
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公开(公告)号:US11130670B2
公开(公告)日:2021-09-28
申请号:US16390149
申请日:2019-04-22
发明人: Shang-Ying Tsai , Hung-Hua Lin , Hsin-Ting Huang , Lung Yuan Pan , Jung-Huei Peng , Yao-Te Huang
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
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公开(公告)号:US09181083B2
公开(公告)日:2015-11-10
申请号:US14484540
申请日:2014-09-12
发明人: Shang-Ying Tsai , Hung-Hua Lin , Lung Yuan Pan , Yao-Te Huang , Hsin-Ting Huang , Jung-Huei Peng
CPC分类号: B81B7/0006 , B81B2203/0307 , B81C1/00039 , B81C1/00134 , B81C1/00166 , B81C1/00341 , G01P15/0802 , G01P15/125 , G01P2015/0871 , H01G5/18 , H01L28/60
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
摘要翻译: 器件包括衬底,衬底上的布线导线,路由导线上的电介质层以及介电层上的蚀刻停止层。 微机电系统(MEMS)器件具有超过蚀刻停止层的部分。 接触插塞穿过蚀刻停止层和电介质层。 接触插头将MEMS器件的部分连接到布线导线。 保护环设置在蚀刻停止层上方和MEMS器件下方,其中护送环环绕接触插塞。
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公开(公告)号:US20230282476A1
公开(公告)日:2023-09-07
申请号:US17683567
申请日:2022-03-01
发明人: Lung Yuan Pan , Chen-Hao Chiang , Chih-Ming Chen
IPC分类号: H01L21/02 , H01L21/762 , H01L31/0352 , H01L31/105 , H01L31/18
CPC分类号: H01L21/02532 , H01L21/76251 , H01L21/0262 , H01L31/035281 , H01L31/105 , H01L31/1808
摘要: In some embodiments, the present disclosure relates to a semiconductor device, including a substrate including a first semiconductor material and a semiconductor layer extending into an upper surface of the substrate and including a second semiconductor material with a different band gap than the first semiconductor material. The semiconductor device also includes a passive cap including a first dielectric material and disposed along the upper surface of the substrate and on opposite sides of the semiconductor layer, and a photodetector in the semiconductor layer. The first dielectric material includes silicon nitride.
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公开(公告)号:US20160046482A1
公开(公告)日:2016-02-18
申请号:US14925345
申请日:2015-10-28
发明人: Hung-Hua Lin , Hsin-Ting Huang , Lung Yuan Pan , Jung-Huei Peng , Shang-Ying Tsai , Yao-Te Huang
CPC分类号: B81B7/0006 , B81B2203/0307 , B81C1/00039 , B81C1/00134 , B81C1/00166 , B81C1/00341 , G01P15/0802 , G01P15/125 , G01P2015/0871 , H01G5/18 , H01L28/60
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
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公开(公告)号:US20150031159A1
公开(公告)日:2015-01-29
申请号:US14484540
申请日:2014-09-12
发明人: Shang-Ying Tsai , Hung-Hua Lin , Lung Yuan Pan , Yao-Te Huang , Hsin-Ting Huang , Jung-Huei Peng
IPC分类号: B81C1/00
CPC分类号: B81B7/0006 , B81B2203/0307 , B81C1/00039 , B81C1/00134 , B81C1/00166 , B81C1/00341 , G01P15/0802 , G01P15/125 , G01P2015/0871 , H01G5/18 , H01L28/60
摘要: A device includes a substrate, a routing conductive line over the substrate, a dielectric layer over the routing conductive line, and an etch stop layer over the dielectric layer. A Micro-Electro-Mechanical System (MEMS) device has a portion over the etch stop layer. A contact plug penetrates through the etch stop layer and the dielectric layer. The contact plug connects the portion of the MEMS device to the routing conductive line. An escort ring is disposed over the etch stop layer and under the MEMS device, wherein the escort ring encircles the contact plug.
摘要翻译: 器件包括衬底,衬底上的布线导线,路由导线上的电介质层以及介电层上的蚀刻停止层。 微机电系统(MEMS)器件具有超过蚀刻停止层的部分。 接触插塞穿过蚀刻停止层和电介质层。 接触插头将MEMS器件的部分连接到布线导线。 保护环设置在蚀刻停止层上方和MEMS器件下方,其中护送环环绕接触插塞。
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